Patents by Inventor Yuan Yan

Yuan Yan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210341306
    Abstract: A navigation system for a motor vehicle is provided. A display interface is located in a vehicle. A is processor in communication with a vehicle sensor and a server. The processor is configured to receive vehicle information and road information, predict a traveling direction of the vehicle based on the vehicle information, and highlight the road information associated with the traveling direction on the display interface. A corresponding vehicle and method is also provided. A user of a navigation map can obtain auxiliary information to drive on the current route from a navigation interface more conveniently during the process of using the navigation map, thus providing the user an improved driving experience.
    Type: Application
    Filed: April 30, 2021
    Publication date: November 4, 2021
    Applicant: FORD GLOBAL TECHNOLOGIES, LLC
    Inventors: Zhiqiang HE, Yuan Yan ZHANG, Qinchao ZHOU
  • Publication number: 20210335855
    Abstract: A display panel and method of manufacturing the same are provided. The method of manufacturing the display panel includes the steps of providing a substrate, forming a gate on the substrate, forming a gate insulating layer on the gate and the substrate, forming a polysilicon layer on the gate insulating layer, performing a first gray-scale mask process on the polysilicon layer to form a source region, a drain region and an active region located between the source region and the drain region by the polysilicon layer, forming an interlayer dielectric layer on the gate insulating layer and the polysilicon layer, forming a first electrode layer on the interlayer dielectric layer, performing a second gray-scale mask process on the first electrode layer and the interlayer dielectric layer.
    Type: Application
    Filed: September 25, 2018
    Publication date: October 28, 2021
    Inventors: Chao WANG, Guanghui LIU, Yuan YAN
  • Publication number: 20210327909
    Abstract: An array substrate, a manufacturing method of the array substrate, and a display device are provided. A first metal layer of the array substrate includes first gate lines arranged in parallel and spaced relationship. A second metal layer includes data lines arranged in parallel and spaced relationship and at least one second gate line spaced from the data lines. The first gate lines are vertical to the data lines and intersect them. Each second gate line is above a corresponding one of the first gate lines. Each via hole set of the insulating layer is arranged corresponding to each second gate line. Each via hole set includes at least two via holes spaced from each other. Each second gate line contacts the first gate line under it via a corresponding via hole set.
    Type: Application
    Filed: June 12, 2019
    Publication date: October 21, 2021
    Applicants: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Yuan Yan
  • Publication number: 20210270489
    Abstract: A system for delivering power and data over a single wire via a hub, wherein the hub can control and power multiple low-power Class 2 circuits. The hub can be controlled remotely through a computing device such as a mobile phone or a computer.
    Type: Application
    Filed: February 15, 2021
    Publication date: September 2, 2021
    Inventors: James Armand Baldwin, Gladys Yuan Yan Wong, Hedley C. Davis, Peter Ian Macdonald, Andrew Walters
  • Patent number: 11101387
    Abstract: A low temperature polysilicon layer, a thin film transistor, and a method for manufacturing same are provided. The low temperature polysilicon layer includes a substrate, at least one buffer layer, and a polysilicon layer. The polysilicon layer is disposed on the at least one buffer layer. The polysilicon layer includes a channel region, two low doped regions disposed on two sides of the channel region, and two high doped regions disposed on an outer side of the low doped regions. Thicknesses of an edge of the channel region and at least one portion of the low doped regions are less than a thickness of another position of the polysilicon layer.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: August 24, 2021
    Inventors: Lisheng Li, Peng He, Yuan Yan
  • Publication number: 20210184050
    Abstract: A low temperature polysilicon layer, a thin film transistor, and a method for manufacturing same are provided. The low temperature polysilicon layer includes a substrate, at least one buffer layer, and a polysilicon layer. The polysilicon layer is disposed on the at least one buffer layer. The polysilicon layer includes a channel region, two low doped regions disposed on two sides of the channel region, and two high doped regions disposed on an outer side of the low doped regions. Thicknesses of an edge of the channel region and at least one portion of the low doped regions are less than a thickness of another position of the polysilicon layer.
    Type: Application
    Filed: November 19, 2018
    Publication date: June 17, 2021
    Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Lisheng LI, Peng HE, Yuan YAN
  • Patent number: 11018165
    Abstract: A manufacturing method of an array substrate and the array substrate are provided. The method comprises: forming an active layer on a substrate; forming an insulation layer on the active layer; forming a first metal layer on the insulation layer; forming an interlayer dielectric layer and a pixel electrode layer on the first metal layer by a same mask; forming a second metal layer on the interlayer dielectric layer, wherein the second metal layer comprises a source electrode, a drain electrode, and a touch signal line; and forming a patterned protective layer and a patterned common electrode layer on the second metal layer.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: May 25, 2021
    Inventors: Yuan Yan, Fei Ai, Peng He, Peng Lu
  • Publication number: 20210098582
    Abstract: The present invention teaches a TFT substrate manufacturing method and a TFT substrate. The method configures contact region vias in the source/drain contact regions at two ends of the active layer, provides buffer layer troughs in the buffer layer beneath the contact region vias, and forms undercut structure between the buffer layer troughs and the active layer around the contact region vias, thereby separating the transparent conductive layer at the contact region vias, and extending the source/drain electrodes to contact the source/drain contact regions of the active layer from below through the buffer layer troughs. The present invention therefore prevents the occurrence of Schottky contact barrier resulted from the contact between poly-Si and ITO in the 7-mask process by letting the source/drain electrodes to directly contact and form ohmic contact with the source/drain contact regions of the active layer, thereby enhancing the electronic mobility of TFT devices.
    Type: Application
    Filed: September 14, 2018
    Publication date: April 1, 2021
    Inventors: Yuan Yan, Lisheng Li, Dewei Song
  • Patent number: 10964790
    Abstract: The present invention teaches a TFT substrate manufacturing method and a TFT substrate. The method configures contact region vias in the source/drain contact regions at two ends of the active layer, provides buffer layer troughs in the buffer layer beneath the contact region vias, and forms undercut structure between the buffer layer troughs and the active layer around the contact region vias, thereby separating the transparent conductive layer at the contact region vias, and extending the source/drain electrodes to contact the source/drain contact regions of the active layer from below through the buffer layer troughs. The present invention therefore prevents the occurrence of Schottky contact barrier resulted from the contact between poly-Si and ITO in the 7-mask process by letting the source/drain electrodes to directly contact and form ohmic contact with the source/drain contact regions of the active layer, thereby enhancing the electronic mobility of TFT devices.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: March 30, 2021
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Yuan Yan, Lisheng Li, Dewei Song
  • Publication number: 20210080783
    Abstract: A polarization grating having a light-shielding layer and a manufacturing method for the same are disclosed. The method includes steps of: forming a metal layer on a substrate, forming a shielding layer on the metal layer, wherein the shielding layer includes a light-shielding pattern layer and a polarization grating pattern layer and etching the metal layer 20 according to the shielding layer to form a polarization grating, wherein the polarization grating includes a polarization section and a light-shielding section directly connected to the polarization section. The present invention improves the compactness of the display panel.
    Type: Application
    Filed: May 2, 2018
    Publication date: March 18, 2021
    Inventor: Yuan YAN
  • Publication number: 20210074742
    Abstract: A manufacturing method of an array substrate and the array substrate are provided. The method comprises: forming an active layer on a substrate; forming an insulation layer on the active layer; forming a first metal layer on the insulation layer; forming an interlayer dielectric layer and a pixel electrode layer on the first metal layer by a same mask; forming a second metal layer on the interlayer dielectric layer, wherein the second metal layer comprises a source electrode, a drain electrode, and a touch signal line; and forming a patterned protective layer and a patterned common electrode layer on the second metal layer.
    Type: Application
    Filed: November 6, 2019
    Publication date: March 11, 2021
    Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Yuan YAN, Fei A1, Peng HE, Peng LU
  • Patent number: 10896921
    Abstract: A manufacturing method of a display panel is provided and includes providing a substrate; and forming a buffer layer, a polysilicon layer, a gate electrode, an interlayer insulating layer, a first transparent electrode layer, a source electrode and drain electrode line, and a touch control line on the substrate in sequence. A masking process is omitted using a planarization layer as a photoresist layer of the interlayer insulating layer. One more masking process is omitted by forming the pixel electrode, the source electrode and drain electrode line and the touch control line in a same masking process.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: January 19, 2021
    Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Guanghui Liu, Xin Zhang, Yuan Yan
  • Patent number: 10884273
    Abstract: A display panel and a display device are provided, which the display panel including a display substrate, a counter substrate, and a backlight. The display substrate includes a first thin film transistor layer, a touch electrode, and a pixel definition layer. The substrate includes a second thin film transistor layer and a photosensitive component. The second thin film transistor layer has a plurality of thin film transistors. The photosensitive component is connected to an underside of the second thin film transistor layer. The photosensitive component receives a reflected light of a user's fingerprint to identify an identification of the user.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: January 5, 2021
    Inventors: Juncheng Xiao, Fei Ai, Yuan Yan
  • Publication number: 20200209694
    Abstract: An array substrate and a manufacturing method thereof in the embodiment of the present invention can complete the process of the array substrate with the touch function by using six photolithography processes, thereby simplifying the production process, saving cost, and shortening the production cycle.
    Type: Application
    Filed: April 16, 2019
    Publication date: July 2, 2020
    Inventors: Yuan YAN, Jiyue SONG
  • Patent number: 10684778
    Abstract: Various embodiments of the present invention are generally directed to an apparatus and associated method for updating data in a non-volatile memory array. In accordance with some embodiments, a memory block is formed with a plurality of types of memory cell sectors arranged in data pages of a first type and log pages of a second type that can be updated in-place. A first updated sector is written to a first log page while maintaining an outdated sector in an original data page, and overwritten with a second updated sector.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: June 16, 2020
    Assignee: Seagate Technology LLC
    Inventors: Yiran Chen, Hai Li, Wenzhong Zhu, Xiaobin Wang, Yuan Yan, Harry Hongyue Liu
  • Publication number: 20200104008
    Abstract: A display panel and a manufacturing method thereof are provided. The display panel comprises a glass substrate, an insulating layer, a polysilicon layer, a gate insulating layer, a gate layer, an interlayer insulating layer, and a source-drain contacting layer, wherein the polysilicon layer is defined with a first doped region, a second doped region, and a third doped region. The source-drain contacting layer contacts the first doped region and the third doped region. A doping type of the first doped region and a doping type of the third doped region are different so that the first doped region and the third doped region form a PN structure. Doping type of the first doped region and a doping type of the second doped region are same.
    Type: Application
    Filed: November 1, 2018
    Publication date: April 2, 2020
    Inventor: Yuan YAN
  • Publication number: 20190333945
    Abstract: A manufacturing method of a display panel is provided and includes providing a substrate; and forming a buffer layer, a polysilicon layer, a gate electrode, an interlayer insulating layer, a first transparent electrode layer, a source electrode and drain electrode line, and a touch control line on the substrate in sequence. A masking process is omitted using a planarization layer as a photoresist layer of the interlayer insulating layer. One more masking process is omitted by forming the pixel electrode, the source electrode and drain electrode line and the touch control line in a same masking process.
    Type: Application
    Filed: August 1, 2018
    Publication date: October 31, 2019
    Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Guanghui LIU, Xin ZHANG, Yuan YAN
  • Publication number: 20180143941
    Abstract: A method of solving a stress based on force boundary and balance condition, the method including: 1) measuring a macro-geometric feature of a research object, and establishing a geometric feature description equation corresponding to the macro-geometric feature; 2) analyzing a specific gravity distribution feature of the research object, and establishing a specific gravity distribution equation of the research object in a research area; 3) analyzing a feature of boundary condition stress of the research object, and establishing a boundary condition stress equation corresponding to the feature of boundary condition stress; 4) selecting a stress expression equation satisfying corresponding balance equation and a boundary condition equation of a force; and 5) analyzing a stress feature of the research object in detail according to an existing strength criterion; and performing comparative analysis on a deformation feature of the research object, and determining a behavior feature of the research object.
    Type: Application
    Filed: November 21, 2017
    Publication date: May 24, 2018
    Inventors: Yingfa Lu, Defu Liu, Yuan Yan, Lai Zhan
  • Publication number: 20150378607
    Abstract: Various embodiments of the present invention are generally directed to an apparatus and associated method for updating data in a non-volatile memory array. In accordance with some embodiments, a memory block is formed with a plurality of types of memory cell sectors arranged in data pages of a first type and log pages of a second type that can be updated in-place. A first updated sector is written to a first log page while maintaining an outdated sector in an original data page, and overwritten with a second updated sector.
    Type: Application
    Filed: September 4, 2015
    Publication date: December 31, 2015
    Inventors: Yiran Chen, Hai Li, Wenzhong Zhu, Xiaobin Wang, Yuan Yan, Harry Hongyue Liu
  • Patent number: 9128821
    Abstract: Various embodiments of the present invention are generally directed to an apparatus and associated method for updating data in a non-volatile memory array. In accordance with some embodiments, a memory block is formed with a plurality of types of memory cell sectors arranged in data pages of a first type and log pages of a second type that can be updated in-place. A first updated sector is written to a first log page while maintaining an outdated sector in an original data page, and overwritten with a second updated sector.
    Type: Grant
    Filed: June 11, 2009
    Date of Patent: September 8, 2015
    Assignee: Seagate Technology LLC
    Inventors: Yiran Chen, Hai Li, Wenzhong Zhu, Xiaobin Wang, Yuan Yan, Harry Hongyue Liu