Patents by Inventor Yuan Yu G. Chen

Yuan Yu G. Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive image formation utilizing resist material with carbazole diazonium salt acid generator
    Patent number: 5219711
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.
    Type: Grant
    Filed: May 18, 1992
    Date of Patent: June 15, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Albert G. Anderson, Walter R. Hertler, Robert C. Wheland, Yuan Yu G. Chen
  • Resist material with carbazole diazonium salt acid generator and process for use
    Patent number: 4985332
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: January 15, 1991
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Albert G. Anderson, Walter R. Hertler, Robert C. Wheland, Yuan Yu G. Chen