Abstract: A display panel detecting device is provided which includes a base, a fixing structure for mounting a display panel to be detected being on the base; a backlight source for providing backlight to the display panel to be detected, the backlight source being on the base; an information storage module; and a touch sensing device adapted to cover the display panel to be detected, and adapted to collect touch sensing information concerning a touch action being applied thereon and to send touch sensing information to the information storage module.

Abstract: An enhanced sputtering target is provided for use in a magnetron sputtering system. The sputtering target includes an active surface from which target material is sputtered and a back surface opposite the active surface. At least one magnet is embedded in the back surface of the target and is oriented to increase the magnetic field passing through the active surface of the target.

Abstract: A method of manufacturing a magnetic recording medium, including the step of reactively or non-reactively sputtering at least a first data storing thin film layer over a substrate from a sputter target. The sputter target is comprised of cobalt (Co), platinum (Pt), a first metal oxide further comprised of a first metal and oxygen (O) and, when non-reactively sputtering, a second metal oxide. The first data storing thin film layer is comprised of cobalt (Co), platinum (Pt), and a stoichiometric third metal oxide comprising the first metal and oxygen (O). During sputtering, any non-stoichiometry of the third metal oxide in the first data storing thin film layer is compensated for using oxygen (O) from the second metal oxide in the sputter target, or using oxygen (O) from the oxygen-rich gas atmosphere.

Abstract: A magnetic recording medium, including a substrate, and a data-storing thin film layer formed over the substrate. The data-storing thin film layer is comprised of cobalt (Co), platinum (Pt), and a multi-component oxide. The multi-component oxide has cations with a reduction potential of less than ?0.03 electron volts, and atomic radii of less than 0.25 nanometers. Additionally, the multi-component oxide is diamagnetic, paramagnetic, or magnetic with a permeability of less than 10?6 m3/kg. The multi-component oxide has a dielectric constant greater than 5.0. The sputter target is further comprised of chromium (Cr) and/or boron (B).

Abstract: A sputter target composed of a ferromagnetic alloy having a base metal, and X, where X is a metal having an atomic diameter of less than 0.266 nm and an oxidation potential greater than the base metal. The base metal may be Fe, Co, or any other ferromagnetic material, and may be further comprised of elements such as Pt, Ta and/or Cr to enhance its coercivity. X may be a metal selected from the group consisting of Al, Ba, Be, Ca, Cd, Ce, Cr, Cs, Dy, Er, Eu, Ga, Gd, Hf, Ho, K, La, Li, Mg, Mn, Na, Nb, Nd, Pm, Pr, Rb, Sc, Sm, Sr, Ta, Th, Te, Th, Ti, V, Y, Zn, and Zr. The sputter target may comprise more than 0 less than 15 atomic percent X. The sputter target is reactively sputtered to form a granular medium with optimized magnetic grain size and grain-to-grain separation.

Abstract: A sputter target, where the sputter target is comprised of cobalt (Co), greater than 0 and as much as 24 atomic percent chromium (Cr), greater than 0 and as much as 20 atomic percent platinum (Pt), greater than 0 and as much as 20 atomic percent boron (B), and greater than 0 and as much as 10 atomic percent gold (Au). The sputter target is further comprised of X1, where X1 is selected from the group consisting of tungsten (W), yttrium (Y), manganese (Mn), and molybdenum (Mo). The sputter target is further comprised of 0 to 7 atomic percent X2, wherein X2 is an element selected from the group consisting of titanium (Ti), vanadium (V), zirconium (Zr), niobium (Nb), ruthenium (Ru), rhodium (Rh), palladium (Pd), hafnium (Hf), tantalum (Ta), and iridium (Ir).

Abstract: A sputter target, where the sputter target is comprised of Co, greater than 0 and as much as 24 atomic percent Cr, greater than 0 and as much as 20 atomic percent Pt, greater than 0 and as much as 20 atomic percent B, and greater than 0 and as much as 10 atomic percent X1, where X1 is an element selected from the group consisting of Ag, Ce, Cu, Dy, Er, Eu, Gd, Ho, In, La, Lu, Mo, Nd, Pr, Sm, Tl, W, and Yb. The sputter target is further comprised of X2, wherein X2 is selected from the group consisting of W, Y, Mn, and Mo. Moreover, the sputter target is further comprised of 0 to 7 atomic percent X3, wherein X3 is an element selected from the group consisting of Ti, V, Zr, Nb, Ru, Rh, Pd, Hf, Ta, and Ir. The thin film sputtered by the sputter target has a coercivity value between 1000 Oersted and 4000 Oersted.

Abstract: A method for manufacturing a magnetic recording medium. The method includes the steps of sputtering at least a first underlayer over a substrate layer, where the first underlayer is comprised of a Cr-based alloy, and sputtering at least a first interlayer over the first underlayer, where the first interlayer is comprised of a Co-based alloy. The method further includes the step of sputtering at least a first overlayer over the first interlayer, where the first overlayer is comprised of a Co-based alloy. At least one of the first underlayer, the first interlayer and/or the first overlayer are doped with X, where X is a metal with an oxidation potential of less than ?0.6 eV. The at least one of the first underlayer, the first interlayer and/or the first overlayer are reactively sputtered in the presence of oxygen.

Abstract: A method for manufacturing a sputter target in which cooling rates are selectively controlled, by generating a sputter surface and a backside surface obverse to the sputter surface. The backside surface includes at least a first textured region. The first textured region aids in cooling a region of the sputter target adjacent to the first textured region, by effectuating heat dissipation.

Abstract: A novel method of manufacturing a novel recording media is disclosed. The manufacturing method includes obtaining a substrate having an inside diameter and an outside diameter and creating a radial profile of an intensive property, such as Hc, of a multilayer magnetic layer containing at least a first magnetic layer and a second magnetic layer deposited on the substrate, from the inside diameter to the outside diameter by forming a radial profile of an extensive property, such as MrT or T, of either the first magnetic layer or the second magnetic layer from the inside diameter to the outside diameter.

Abstract: The effects of sputter re-deposition are reduced by macroscopically roughening the non-sputter areas of the sputter target. The macroscopic roughening is obtained by forming a macroscopic trough pattern in the non-sputter areas of the sputter target. A variety of patterns may be used for the trough pattern. In addition to macroscopically roughing the non-sputter areas of the sputter target, microscopic roughening of the trough patterns may be performed using conventional shot, bead or grit blasting techniques.

Abstract: A magnetic recording media having a CrMo underlayer provides improved performance characteristics. In one embodiment, the recording media comprises a rigid substrate and an underlayer disposed over the substrate, in which the underlayer comprises CrMo. Preferably, the Mo crystals in the CrMo underlayer are at least about 140 Å in the film growth direction for the 002 crystal plane. Advantageously, recording media with such a 002 crystal size, when used in conjunction with a magnetic layer, such as CoCrTaPtNi, exhibits significantly higher parametric qualities than underlayers using other materials. Typically, Mo in the range between about 7% and 16% in the CrMo alloy, more preferably between about 9% and 11%, will provide the recited 002 crystal size.

Abstract: A magnetic recording media having a CrMo underlayer provides improved performance characteristics. In one embodiment, the recording media comprises a rigid substrate and an underlayer disposed over the substrate, in which the underlayer comprises CrMo. Preferably, the Mo crystals in the CrMo underlayer are at least about 140 Å in the film growth direction for the 002 crystal plane. Advantageously, recording media with such a 002 crystal size, when used in conjunction with a magnetic layer, such as CoCrTaPtNi, exhibits significantly higher parametric qualities than underlayers using other materials. Typically, Mo in the range between about 7% and 16% in the CrMo alloy, more preferably between about 9% and 11%, will provide the recited 002 crystal size.

Abstract: Magnetic recording media comprise non-metallic substrates which are coated with a seedlayer of carbon or silicon. The seedlayer improves the magnetic recording characteristics of a subsequent magnetic layer. The effect of the seedlayer is further enhanced by use of an underlayer, preferably a chromium or chrome alloy ground layer, between the seedlayer and magnetic layer.

Abstract: A magnetic recording medium comprising a non-metallic substrate having a seedlayer thereon of carbon or silicon. The seedlayer improves the magnetic recording characteristics of a subsequent magnetic layer by smoothing out irregularities on the non-metallic substrate surface such that a surface of the seedlayer adjacent the magnetic layer is smoother than the surface of the substrate.