Patents by Inventor Yuanfang Lu

Yuanfang Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for eliminating interlayer dielectric dishing and controlling gate height uniformity
    Patent number: 9589807
    Abstract: A method for eliminating interlayer dielectric (ILD) dishing and controlling gate height uniformity is provided. Embodiments include forming a plurality of polysilicon gates over a substrate, each gate having spacers formed on sides of the polysilicon gates and a nitride cap formed on an upper surface; forming a gapfill material between adjacent polysilicon gates; forming an oxide over the gapfill material between the adjacent polysilicon gates; removing the nitride caps; removing a portion of the oxide between the adjacent polysilicon gates, forming a recess; and forming an ILD cap layer in the recess between the adjacent polysilicon gates.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: March 7, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Haigou Huang, Jinping Liu, Huang Liu, Yuanfang Lu