Patents by Inventor Yuanhong Guo
Yuanhong Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11932950Abstract: A method includes machining a raw surface of a metal component to remove first native oxide from a metal base of the metal component to generate an as-machined surface of the metal component. A second native oxide is formed on the metal base of the as-machined surface of the metal component subsequent to the machining. The method further includes, subsequent to the machining, performing operations to generate a finished surface of the metal component. The operations include a surface machining of the as-machined surface of the metal component to remove the second native oxide.Type: GrantFiled: January 13, 2023Date of Patent: March 19, 2024Assignee: Applied Materials, Inc.Inventors: Yuanhong Guo, Sheng Michael Guo, Marek W. Radko, Steven Victor Sansoni, Nagendra Madiwal, Matvey Farber, Pingping Gou, Song-Moon Suh, Jeffrey C. Hudgens, Yuji Murayama, Anurag Bansal, Shaofeng Chen, Michael Kuchar
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Publication number: 20240062999Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.Type: ApplicationFiled: November 2, 2023Publication date: February 22, 2024Inventors: Yuanhong Guo, Sheng Guo, Marek Radko, Steve Sansoni, Xiaoxiong Yuan, See-Eng Phan, Yuji Murayama, Pingping Gou, Song-Moon Suh
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Patent number: 11854773Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.Type: GrantFiled: March 26, 2021Date of Patent: December 26, 2023Assignee: Applied Materials, Inc.Inventors: Yuanhong Guo, Sheng Guo, Marek Radko, Steve Sansoni, Xiaoxiong Yuan, See-Eng Phan, Yuji Murayama, Pingping Gou, Song-Moon Suh
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Patent number: 11735420Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.Type: GrantFiled: September 8, 2020Date of Patent: August 22, 2023Assignee: Applied Materials, Inc.Inventors: Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo, Liqi Wu, Michael S. Jackson, Ludovic Godet, Tobin Kaufman-Osborn, Erica Chen, Paul F. Ma
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Publication number: 20230151497Abstract: A method includes machining a raw surface of a metal component to remove first native oxide from a metal base of the metal component to generate an as-machined surface of the metal component. A second native oxide is formed on the metal base of the as-machined surface of the metal component subsequent to the machining. The method further includes, subsequent to the machining, performing operations to generate a finished surface of the metal component. The operations include a surface machining of the as-machined surface of the metal component to remove the second native oxide.Type: ApplicationFiled: January 13, 2023Publication date: May 18, 2023Inventors: Yuanhong Guo, Sheng Michael Guo, Marek W. Radko, Steven Victor Sansoni, Nagendra Madiwal, Matvey Farber, Pingping Gou, Song-Moon Suh, Jeffrey C. Hudgens, Yuji Murayama, Anurag Bansal, Shaofeng Chen, Michael Kuchar
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Publication number: 20230048337Abstract: Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.Type: ApplicationFiled: August 12, 2022Publication date: February 16, 2023Inventors: Robert A. Medure, Raechel Chu-Hui Tan, Changgong Wang, Yuanhong Guo, Sai Padhy, Ashley M. Okada, Kenneth Le, Atilla Kilicarslan, Dean C. Hruzek
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Patent number: 11555250Abstract: A method includes receiving a metal component including a raw surface that includes a metal base, a first native oxide disposed on the metal base, and hydrocarbons disposed on the metal base. The method further includes machining the raw surface of the metal component to remove the first native oxide and a first portion of the hydrocarbons from the metal base. The machining generates an as-machined surface of the metal component including the metal base without the first native oxide and without the first portion of the hydrocarbons. The method further includes performing a surface machining of the as-machined surface of the metal component to remove a second portion of the hydrocarbons. The method further includes surface treating the metal component to remove a third portion of the hydrocarbons. The method further includes performing a cleaning of the metal component and drying the metal component.Type: GrantFiled: April 27, 2021Date of Patent: January 17, 2023Assignee: Applied Materials, Inc.Inventors: Yuanhong Guo, Sheng Michael Guo, Marek W Radko, Steven Victor Sansoni, Nagendra Madiwal, Matvey Farber, Pingping Gou, Song-Moon Suh, Jeffrey C. Hudgens, Yuji Murayama, Anurag Bansal, Shaofeng Chen, Michael Kuchar
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Patent number: 11508610Abstract: Methods and apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support to support a substrate having a given diameter includes: a base ring having an inner diameter less than the given diameter, the base ring having a support surface configured to contact a first surface of the substrate and to form a seal between the support surface and the first surface of the substrate, when disposed atop the base ring; and a clamp ring having an inner diameter less than the given diameter, wherein the clamp ring includes a contact surface proximate the inner diameter configured to contact an upper surface of the substrate, when present, and wherein the clamp ring and the base ring are further configured to provide a bias force toward each other to clamp the substrate in the substrate support.Type: GrantFiled: April 18, 2019Date of Patent: November 22, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Chang Ke, Bonnie Chia, Song-Moon Suh, Cheng-Hsiung Tsai, Yuanhong Guo, Lei Zhou, David Langtry
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Publication number: 20210339354Abstract: A method includes receiving a metal component including a raw surface that includes a metal base, a first native oxide disposed on the metal base, and hydrocarbons disposed on the metal base. The method further includes machining the raw surface of the metal component to remove the first native oxide and a first portion of the hydrocarbons from the metal base. The machining generates an as-machined surface of the metal component including the metal base without the first native oxide and without the first portion of the hydrocarbons. The method further includes performing a surface machining of the as-machined surface of the metal component to remove a second portion of the hydrocarbons. The method further includes surface treating the metal component to remove a third portion of the hydrocarbons. The method further includes performing a cleaning of the metal component and drying the metal component.Type: ApplicationFiled: April 27, 2021Publication date: November 4, 2021Inventors: Yuanhong Guo, Sheng Michael Guo, Marek W. Radko, Steven Victor Sansoni, Nagendra Madiwal, Matvey Farber, Pingping Gou, Song-Moon Suh, Jeffrey C. Hudgens, Yuji Murayama, Anurag Bansal, Shaofeng Chen, Michael Kuchar
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Publication number: 20210305028Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.Type: ApplicationFiled: March 26, 2021Publication date: September 30, 2021Inventors: Yuanhong Guo, Sheng Guo, Marek Radko, Steve Sansoni, Xiaoxiong Yuan, See-Eng Phan, Yuji Murayama, Pingping Gou, Song-Moon Suh
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Publication number: 20200402792Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.Type: ApplicationFiled: September 8, 2020Publication date: December 24, 2020Inventors: Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo, Liqi Wu, Michael S. Jackson, Ludovic Godet, Tobin Kaufman-Osborn, Erica Chen, Paul F. Ma
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Patent number: 10770292Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.Type: GrantFiled: June 14, 2018Date of Patent: September 8, 2020Assignee: Applied Materials, Inc.Inventors: Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo, Liqi Wu, Michael S. Jackson, Ludovic Godet, Tobin Kaufman-Osborn, Erica Chen, Paul F. Ma
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Publication number: 20190326152Abstract: Methods and apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support to support a substrate having a given diameter includes: a base ring having an inner diameter less than the given diameter, the base ring having a support surface configured to contact a first surface of the substrate and to form a seal between the support surface and the first surface of the substrate, when disposed atop the base ring; and a clamp ring having an inner diameter less than the given diameter, wherein the clamp ring includes a contact surface proximate the inner diameter configured to contact an upper surface of the substrate, when present, and wherein the clamp ring and the base ring are further configured to provide a bias force toward each other to clamp the substrate in the substrate support.Type: ApplicationFiled: April 18, 2019Publication date: October 24, 2019Inventors: CHANG KE, BONNIE CHIA, SONG-MOON SUH, CHENG-HSIUNG TSAI, YUANHONG GUO, LEI ZHOU, DAVID LANGTRY
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Publication number: 20180366317Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.Type: ApplicationFiled: June 14, 2018Publication date: December 20, 2018Inventors: Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo, Liqi Wu, Michael S. Jackson, Ludovic Godet, Tobin Kaufman-Osborn, Erica Chen, Paul F. Ma
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Patent number: 9925639Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.Type: GrantFiled: July 18, 2014Date of Patent: March 27, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Song-Moon Suh, Yuanhong Guo, Guangchi Xuan, Pulkit Agarwal
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Publication number: 20160016286Abstract: Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.Type: ApplicationFiled: July 18, 2014Publication date: January 21, 2016Inventors: Song-Moon Suh, Yuanhong Guo, Guangchi Xuan, Pulkit Agarwal
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Publication number: 20080105201Abstract: A support component comprises a support structure having a support surface with one or more quartz contact tips. In one version, the support component comprises a robot blade capable of transferring a substrate into and out of a chamber. The robot blade comprises a plate having a plurality of raised mesas, each raised mesa comprising a quartz contact tip which minimizes contact with the substrate thereby generating fewer contaminant particles during substrate transportation. Other versions of the support component include a heat exchange pedestal, lift pin assembly, and lifting fin assembly.Type: ApplicationFiled: October 29, 2007Publication date: May 8, 2008Inventors: TIMOTHY RONAN, Yuanhong Guo, Robert Decottignies, Todd W. Martin, Darryl K. Angelo, Song-Moon Suh, Nitin Khurana, Edward Ng