Abstract: Direct pixel-by-pixel phase engineering in a SLM is an effective method for the holographic fabrication of graded photonic super-quasi-crystals with desired disorder and graded photonic super-crystals with rectangular unit-cells. Multiple levels of filling fractions of dielectric in the crystal have been created in the graded regions. Fabrication of these graded photonic super-crystals and super-quasi-crystals with small feature size is possible, using a laser projection system consisting of integrated spatial light modulator and reflective optical element.

Abstract: Direct pixel-by-pixel phase engineering in a SLM is an effective method for the holographic fabrication of graded photonic super-quasi-crystals with desired disorder and graded photonic super-crystals with rectangular unit-cells. Multiple levels of filling fractions of dielectric in the crystal have been created in the graded regions. Fabrication of these graded photonic super-crystals and super-quasi-crystals with small feature size is possible, using a laser projection system consisting of integrated spatial light modulator and reflective optical element.

Abstract: A single reflective optical element is constructed for use in interference lithography. The single reflective optical element is generally made up of at least two, and preferably four, polished reflective strips arranged to have particular angles relative to a laser beam passing through the optical element. A laser beam passing through the optical element will be partially reflected by the reflective strips to generate additional linearly polarized beams. The additional reflected beams overlap with the central laser beam and form an interference pattern as the beams pass out of the optical element. The generated polarized beams and interference pattern can be directed onto a photosensitive material to produce photonic crystals or photonic crystal templates.

Abstract: A single reflective optical element is constructed for use in interference lithography. The single reflective optical element is generally made up of at least two, and preferably four, polished reflective strips arranged to have particular angles relative to a laser beam passing through the optical element. A laser beam passing through the optical element will be partially reflected by the reflective strips to generate additional linearly polarized beams. The additional reflected beams overlap with the central laser beam and form an interference pattern as the beams pass out of the optical element. The generated polarized beams and interference pattern can be directed onto a photosensitive material to produce photonic crystals or photonic crystal templates.

Abstract: A method of fabricating a two-layer phase mask comprises subjecting a photoresist material to two overlapping laser beams that create light and dark fringes in the overlapping beam regions. The photoresist can comprise a liquid crystal and a photo-sensitive material, including, for example, a photo-sensitive monomer and/or polymer. The two laser beams can be first directed towards one side of the photoresist. In the areas subjected to lighter fringes, the polymer molecules can link together and force the liquid crystal into the areas subjected to the darker fringes. This can leave an alternating pattern of linear strips of polymer-rich and liquid crystal-rich regions. The exposure time can be limited so that the strips are formed only partially through the thickness of the photoresist. The photoresist can be then rotated 90 degrees and the overlapping laser beams directed towards the opposite side of the photoresist.