Patents by Inventor Yuanyang MA

Yuanyang MA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11346986
    Abstract: A method of manufacturing a color filter and a color filter are provided. The method includes steps of manufacturing a color resist layer and an inorganic barrier layer on a base substrate. The step of manufacturing the color resist layer includes sequentially forming a first color resist, a second color resist, and a third color resist, and the first color resist, the second color resist, and the third color resist are repeatedly arranged in order in a direction along a surface of the base substrate. The step of manufacturing the inorganic barrier layer includes forming a first inorganic barrier layer covering the first color resist after the first coloder resist is formed and before the second color resist is formed. By setting the inorganic barrier layer to separate different color resists, it is possible to avoid diffusion pollution between different color resists and ensure a display performance.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: May 31, 2022
    Assignee: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventors: Yuanyang Ma, Miao Zhou
  • Publication number: 20210199861
    Abstract: A method of manufacturing a color filter and a color filter are provided. The method includes steps of manufacturing a color resist layer and an inorganic barrier layer on a base substrate. The step of manufacturing the color resist layer includes sequentially forming a first color resist, a second color resist, and a third color resist, and the first color resist, the second color resist, and the third color resist are repeatedly arranged in order in a direction along a surface of the base substrate. The step of manufacturing the inorganic barrier layer includes forming a first inorganic barrier layer covering the first color resist after the first coloder resist is formed and before the second color resist is formed. By setting the inorganic barrier layer to separate different color resists, it is possible to avoid diffusion pollution between different color resists and ensure a display performance.
    Type: Application
    Filed: November 12, 2019
    Publication date: July 1, 2021
    Applicant: TCL China Star Optoelectronics Technology Co., Ltd.
    Inventors: Yuanyang MA, Miao ZHOU
  • Patent number: 11036105
    Abstract: A method and apparatus for improving display contrast, the method includes: providing a display array substrate having a metal layer; forming a photoresist layer on a surface of the metal layer; performing an exposure and development processes on the photoresist layer to expose a portion of the metal layer; performing an etching process on the portion of the metal layer to form metal wires; and subjecting an oxidation treatment to sidewalls of the metal wires to generate an oxide on the sidewalls of the metal wires.
    Type: Grant
    Filed: January 2, 2019
    Date of Patent: June 15, 2021
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Yuanyang Ma, Lixuan Chen, Xulin Lin
  • Publication number: 20200341338
    Abstract: A method and apparatus for improving display contrast, the method includes: providing a display array substrate having a metal layer; forming a photoresist layer on a surface of the metal layer; performing an exposure and development processes on the photoresist layer to expose a portion of the metal layer; performing an etching process on the portion of the metal layer to form metal wires; and subjecting an oxidation treatment to sidewalls of the metal wires to generate an oxide on the sidewalls of the metal wires.
    Type: Application
    Filed: January 2, 2019
    Publication date: October 29, 2020
    Inventors: Yuanyang MA, Lixuan CHEN, Xulin LIN
  • Publication number: 20200192136
    Abstract: The present invention provides a method for manufacturing an array substrate, including a metal oxidation process after a step of removing a photoresist layer and before a step of forming an insulating film by a CVD device to form metallic oxides on side surfaces of patterned metal lines. Oxidation of metals is completed by the CVD device, thereby reducing the leakage of light to improve the contrast of an LCD panel, and improving the production efficiency and productivity of the LCD panel.
    Type: Application
    Filed: November 19, 2018
    Publication date: June 18, 2020
    Inventors: Yuanyang MA, Lixuan CHEN, Xulin LIN