Patents by Inventor Yu-Bin Zhao

Yu-Bin Zhao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10325964
    Abstract: The present disclosure relates to an organic light emitting device including a logic device that comprises a dummy pattern and a merged spacer, and an associated fabrication method. In some embodiments, the organic light emitting device is disposed over a substrate. The logic device is coupled to the organic light emitting device, and comprises a pair of source/drain regions disposed within the substrate and separated by a channel region. A gate structure overlies the channel region and comprises a gate electrode and a dummy pattern separated from the gate electrode by a merged spacer. By arranging the dummy pattern and the merged spacer between the gate electrode and the source/drain regions, a distance between the gate electrode and the source/drain region is enlarged, and therefore reducing the gate induced drain leakage (GIDL) effect.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: June 18, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Huan Chen, Fu-Jier Fan, Kong-Beng Thei, Ker-Hsiao Huo, Li-Hsuan Yeh, Yu-Bin Zhao
  • Patent number: 10164037
    Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate having a top surface, a source region, and a drain region. The semiconductor device structure includes a gate structure over the top surface and extending into the semiconductor substrate. The gate structure in the semiconductor substrate is between the source region and the drain region and separates the source region from the drain region. The semiconductor device structure includes an isolation structure in the semiconductor substrate and surrounding the source region, the drain region, and the gate structure in the semiconductor substrate.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: December 25, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ker-Hsiao Huo, Kong-Beng Thei, Chih-Wen Albert Yao, Fu-Jier Fan, Chen-Liang Chu, Ta-Yuan Kung, Yi-Huan Chen, Yu-Bin Zhao, Ming-Ta Lei, Li-Hsuan Yeh
  • Publication number: 20180286960
    Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate having a top surface, a source region, and a drain region. The semiconductor device structure includes a gate structure over the top surface and extending into the semiconductor substrate. The gate structure in the semiconductor substrate is between the source region and the drain region and separates the source region from the drain region. The semiconductor device structure includes an isolation structure in the semiconductor substrate and surrounding the source region, the drain region, and the gate structure in the semiconductor substrate.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 4, 2018
    Inventors: Ker-Hsiao HUO, Kong-Beng THEI, Chih-Wen Albert YAO, Fu-Jier FAN, Chen-Liang CHU, Ta-Yuan KUNG, Yi-Huan CHEN, Yu-Bin ZHAO, Ming-Ta LEI, Li-Hsuan YEH
  • Publication number: 20180138250
    Abstract: The present disclosure relates to an organic light emitting device including a logic device that comprises a dummy pattern and a merged spacer, and an associated fabrication method. In some embodiments, the organic light emitting device is disposed over a substrate. The logic device is coupled to the organic light emitting device, and comprises a pair of source/drain regions disposed within the substrate and separated by a channel region. A gate structure overlies the channel region and comprises a gate electrode and a dummy pattern separated from the gate electrode by a merged spacer. By arranging the dummy pattern and the merged spacer between the gate electrode and the source/drain regions, a distance between the gate electrode and the source/drain region is enlarged, and therefore reducing the gate induced drain leakage (GIDL) effect.
    Type: Application
    Filed: November 15, 2016
    Publication date: May 17, 2018
    Inventors: Yi-Huan Chen, Fu-Jier Fan, Kong-Beng Thei, Ker-Hsiao Huo, Li-Hsuan Yeh, Yu-Bin Zhao
  • Patent number: 9577078
    Abstract: Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a source structure in a semiconductor substrate. The semiconductor device structure also includes a channel layer over the semiconductor substrate. A first portion of the channel layer covers a portion of the source structure. A second portion of the channel layer laterally extends away from the source structure. The semiconductor device structure further includes a drain structure over the semiconductor substrate. The drain structure and the source structure have different conductivity types. The drain structure adjoins the second portion of the channel layer.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: February 21, 2017
    Assignees: Taiwan Semiconductor Manufacturing Co., Ltd., National Chiao Tung University
    Inventors: Steve S. Chung, E-Ray Hsieh, Yu-Bin Zhao, Samuel C. Pan