Patents by Inventor Yucel Kok

Yucel Kok has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
    Patent number: 9268236
    Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: February 23, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen
  • Lithographic apparatus and method
    Patent number: 8451423
    Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: May 28, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph Janssen, Siebe Landheer, Yücel Kök, Marcel Beckers, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100245791
    Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
    Type: Application
    Filed: June 11, 2010
    Publication date: September 30, 2010
    Inventors: Johannes Henricus Wilhelmus JACOBS, Igor Petrus Maria Bouchoms, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Fraciscus Johannes Joseph Janssen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7751027
    Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: July 6, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20090316121
    Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.
    Type: Application
    Filed: June 17, 2009
    Publication date: December 24, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Johannes Joseph JANSSEN, Siebe Landheer, Yucel Kok, Marcel Beckers, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070070315
    Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
    Type: Application
    Filed: June 16, 2006
    Publication date: March 29, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobs, Igor Bouchoms, Nicolaas Kate, Nicolaas Kemper, Martinus Leenders, Erik Loopstra, Joost Ottens, Martinus Verhagen, Yucel Kok, Johannes Van Es, Herman Boom, Franciscus Janssen