Patents by Inventor Yuchang GUI

Yuchang GUI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11119418
    Abstract: A focus compensation method and apparatus thereof are provided. The focusing compensation method includes steps of: (S11) providing an exposure lens set; (S12) providing an object, measuring line-widths of the object at points of line segments along an axial direction by different focusing conditions, to obtain measured values, and obtaining at least one line-width curve from the measured values; and (S13) calibrating a focusing operation of the exposure lens set according to the at least one line-width curve. Line-widths of a product are measured, and fed back to an exposure machine to calibrate the focusing operations of the exposure machine, thereby improving the focusing accuracy of the exposure machine.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: September 14, 2021
    Assignee: Wuhan China Star Optoelectonics Technology Co., Ltd.
    Inventor: Yuchang Gui
  • Publication number: 20200218168
    Abstract: A focus compensation method and apparatus thereof are provided. The focusing compensation method includes steps of: (S11) providing an exposure lens set; (S12) providing an object, measuring line-widths of the object at points of line segments along an axial direction by different focusing conditions, to obtain measured values, and obtaining at least one line-width curve from the measured values; and (S13) calibrating a focusing operation of the exposure lens set according to the at least one line-width curve. Line-widths of a product are measured, and fed back to an exposure machine to calibrate the focusing operations of the exposure machine, thereby improving the focusing accuracy of the exposure machine.
    Type: Application
    Filed: June 14, 2019
    Publication date: July 9, 2020
    Inventor: Yuchang GUI
  • Publication number: 20200133138
    Abstract: A method and a device for improving exposure accuracy are provided. After an exposure area is defined on a substrate, a plurality of exposure points from the exposure area are acquired to obtain a set of the exposure points, and then a plurality of exposure offset values corresponding to the exposure points in the set of the exposure points are detected respectively, to obtain a set of the exposure offset values. Then, based on the set of the exposure offset values, the exposure points corresponding to each of the exposure offset values are corrected.
    Type: Application
    Filed: April 26, 2019
    Publication date: April 30, 2020
    Inventor: Yuchang GUI