Patents by Inventor Yudai ABE

Yudai ABE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-Sensitive Composition, Pattern Formation Method, and Photo-Degradable Base
    Publication number: 20250004375
    Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), A1 represents a (m+n+2)-valent aromatic ring group. Both —OH and —COO? are bound to a common benzene ring in A1. Atom to which —OH is bound is located next to an atom to which —COO31 is bound. R1 represents a monovalent group comprising a cyclic (thio)acetal structure. m is an integer of ?0. n is an integer of ?0. M+ represents a monovalent organic cation.
    Type: Application
    Filed: September 10, 2024
    Publication date: January 2, 2025
    Applicant: JSR CORPORATION
    Inventors: Ryuichi NEMOTO, Masayuki MIYAKE, Michihiro MITA, Yudai ABE, Kazuya KIRIYAMA