Patent number: 8388861
Abstract: A LC compound and a LC mixture are provided. The LC mixture includes a compound represented by (I) and at least one compound selected from a group consisting of compounds represented by (II) to (IV): in which X1 is F, —Cl, —CF3, or —OCF3; R, R11, and R12 are independently H, a C1-C15 alkyl group, or a C2-C15 alkenyl group; A1 is 1,4-phenylene; A11, A12, A13, and A14 are independently selected from a group consisting of 1,4-phenylene, 1,4-cyclohexylene, and 2,5-tetrahydropyranylene; at least one of A2, A3, and A4 is 2,5-indanylene, and the others are independently selected from a group consisting of 1,4-phenylene, 1,4-cyclohexylene, and 2,5-tetrahydropyranylene; L1 is —F2CO—; Z11, Z12, and Z13 are independently a single bond, —O—, —F2CO—, or —COO—; m is 1; n, o and p are independently 0, 1, 2 or 3, and n+o+p?3.
Type:
Grant
Filed:
March 17, 2011
Date of Patent:
March 5, 2013
Inventors:
Chun-Chih Wang, Wen-Chung Chu, Ren-Jie Chiou, Shi-Zhi You, Hong-Wei Zhang, Yu-Dong Tan
Publication number: 20120132854
Abstract: A LC compound and a LC mixture are provided. The LC mixture includes a compound represented by (I) and at least one compound selected from a group consisting of compounds represented by (II) to (IV): in which X1 is F, —Cl, —CF3, or —OCF3; R, R11, and R12 are independently H, a C1-C15 alkyl group, or a C2-C15 alkenyl group; A1 is 1,4-phenylene; A11, A12, A13, and A14 are independently selected from a group consisting of 1,4-phenylene, 1,4-cyclohexylene, and 2,5-tetrahydropyranylene; at least one of A2, A3, and A4 is 2,5-indanylene, and the others are independently selected from a group consisting of 1,4-phenylene, 1,4-cyclohexylene, and 2,5-tetrahydropyranylene; L1 is —F2CO—; Z11, Z12, and Z13 are independently a single bond, —O—, —F2CO—, or —COO—; m is 1; n, o and p are independently 0, 1, 2 or 3, and n+o+p?3.
Type:
Application
Filed:
March 17, 2011
Publication date:
May 31, 2012
Applicants:
JIANGSU HECHENG CHEMICAL MATERIALS CO., LTD., DAXIN MATERIALS CORPORATION
Inventors:
Chun-Chih Wang, Wen-Chung Chu, Ren-Jie Chiou, Shi-Zhi You, Hong-Wei Zhang, Yu-Dong Tan