Patents by Inventor Yuee Liu

Yuee Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9111723
    Abstract: Embodiments of the present application disclose a linear plasma source applied to the field of solar cell production. A linear plasma source comprising a housing which forms a reaction chamber having an outlet; a gas intake system comprising an internal pipeline which is mounted on the housing and located inside the reaction chamber for releasing reaction gas into the reaction chamber; an electrode system comprising at least two electrode plates which are mounted on the housing and located around the internal pipeline within the reaction chamber; and an electromagnetism system comprising an electromagnetic coil, and the electromagnetic coil is mounted at the outlet of the reaction chamber of the housing and has a plasma outlet. The embodiments of the present application have a simple structure, a low production cost, a good uniformity and a high film compactness.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: August 18, 2015
    Assignee: SHENZHEN JT AUTOMATION EQUIPMENT CO., LTD
    Inventors: Jiexin Chen, Zhiming Xu, Yuee Liu
  • Publication number: 20140217894
    Abstract: Embodiments of the present application disclose a linear plasma source applied to the field of solar cell production. A linear plasma source comprising a housing which forms a reaction chamber having an outlet; a gas intake system comprising an internal pipeline which is mounted on the housing and located inside the reaction chamber for releasing reaction gas into the reaction chamber; an electrode system comprising at least two electrode plates which are mounted on the housing and located around the internal pipeline within the reaction chamber; and an electromagnetism system comprising an electromagnetic coil, and the electromagnetic coil is mounted at the outlet of the reaction chamber of the housing and has a plasma outlet. The embodiments of the present application have a simple structure, a low production cost, a good uniformity and a high film compactness.
    Type: Application
    Filed: February 22, 2013
    Publication date: August 7, 2014
    Applicant: Shenzhen JT Automation Equipment Co., Ltd
    Inventors: Jiexin Chen, Zhiming Xu, Yuee Liu