Abstract: A plasma jet electrode device includes an orientation base, a ceramic pipe, a round plate having a plurality of tilted through holes thereon and a high-voltage metal electrode. A dielectric discharging plasma area is formed between the high-voltage metal electrode and the ceramic pipe. The plasma jet electrode device further has a rotating base, a bottom plate, and a grounding electrode. A low-temperature non-equilibrium plasma area is formed between the grounding electrode and the high-voltage metal electrode. The round plate has a spray head praying low-temperature non-equilibrium plasma. The plasma treatment area is increased, and the uniformity is improved. The present plasma jet electrode system has a frame for fixing at least one plasma jet electrode device. It evidently increases the effective plasma treatment area. The system can also provide additional functions of cooling, guiding, plating and etching, etc.