Abstract: Methods of vulcanization using a high content sulfur polymer, instead of elemental sulfur, have been developed. These high sulfur content polymers are referred to as Chalcogenide Hybrid Inorganic/Organic Polymers (CHIP) materials and have good polymer compatibility in that they are soluble in a number of polymers. Furthermore, CHIP materials may have weaker bonds than the S—S bonds of elemental sulfur and thus provide for a higher crosslinking efficiency vulcanization.

Abstract: Methods of vulcanization using a high content sulfur polymer, instead of elemental sulfur, have been developed. These high sulfur content polymers are referred to as Chalcogenide Hybrid Inorganic/Organic Polymers (CHIP) materials and have good polymer compatibility in that they are soluble in a number of polymers. Furthermore, CHIP materials may have weaker bonds than the S—S bonds of elemental sulfur and thus provide for a higher crosslinking efficiency vulcanization.

Abstract: An iterative approach to dynamic covalent polymerizations of elemental sulfur with functional comonomers to prepare sulfur prepolymers that can further react with other conventional, commercially available comonomers to prepare a wider class of functional sulfur polymers. This iterative method improves handling, miscibility and solubility of the elemental sulfur, and further enables tuning of the sulfur polymer composition. The sulfur polymers may be a thermoplastic or a thermoset for use in elastomers, resins, lubricants, coatings, antioxidants, cathode materials for electrochemical cells, and polymeric articles such as polymeric films and free-standing substrates.

Abstract: An iterative approach to dynamic covalent polymerizations of elemental sulfur with functional comonomers to prepare sulfur prepolymers that can further reacted with other conventional, commercially available comonomers to prepare a wider class of functional sulfur polymers. This iterative method improves handling, miscibility and solubility of the elemental sulfur, and further enables tuning of the sulfur polymer composition. The sulfur polymers may be a thermoplastic or a thermoset for use in elastomers, resins, lubricants, coatings, antioxidants, cathode materials for electrochemical cells, and polymeric articles such as polymeric films and free-standing substrates.

Abstract: Methods of vulcanization using a high content sulfur polymer, instead of elemental sulfur, have been developed. These high sulfur content polymers are referred to as Chalcogenide Hybrid Inorganic/Organic Polymers (CHIP) materials and have good polymer compatibility in that they are soluble in a number of polymers. Furthermore, CHIP materials may have weaker bonds than the S—S bonds of elemental sulfur and thus provide for a higher crosslinking efficiency vulcanization.

Abstract: A liquid crystal panel comprises an end product area and a test area, wherein a RGB test block, a blank block and three monochrome blocks are provided in the test area, the monochrome blocks comprises a red test block, a green test block and a blue test block, the RGB test block is compounded with a red light resistance, a green light resistance and a blue light resistance, the electric resistance and the metal ionic concentration of the RGB test block is equal to that of the end product area, the electric resistance and the metal ionic concentration can be determine whether the related target parameters of the liquid crystal panel on the end product area will reach the standard or not. Detection method on image sticking of the liquid crystal panel, the detecting efficiency will be obviously improved and the defect rate will be reduced.

Abstract: The present invention provides a photoresist composition and a color filter manufacturing method. The photoresist composition of the present invention includes a first solvent, a second solvent, a photo initiator, a monomer, a polymer, an additive, and a pigment. After heating, phase separation occurs between the first solvent and the second solvent. After the phase separation, the first solvent is located above the second solvent. At least one of the photo initiator, the monomer, the polymer, and the additive has solubility in the second solvent that is higher than that in the first solvent so as to alleviate the wrinkling issue caused by different degrees of solidification between upper and lower layers of the photoresist during a manufacturing process of a color filter.

Abstract: The present invention provides a photoresist composition and a color filter manufacturing method. The photoresist composition of the present invention includes a first solvent, a second solvent, a photo initiator, a monomer, a polymer, an additive, and a pigment. After heating, phase separation occurs between the first solvent and the second solvent. After the phase separation, the first solvent is located above the second solvent. At least one of the photo initiator, the monomer, the polymer, and the additive has solubility in the second solvent that is higher than that in the first solvent so as to alleviate the wrinkling issue caused by different degrees of solidification between upper and lower layers of the photoresist during a manufacturing process of a color filter.

Abstract: The present disclosure relates to an image processing method, an image processing device, and an automated optical inspection machine. The method includes: an inspection area determining step for determining a rectangular inspection area in an inspected image; a definition threshold determining step for calculating an image definition threshold according to the gray values of pixels of a plurality of sample images in the inspection area; a product image definition determining step for calculating a product image definition according to the gray values of pixels of a product image in the inspection area; and a comparison step for comparing the product image definition with the image definition threshold; and a product image selecting step for selecting the current product image as an image to be inspected.

Abstract: The present invention discloses a slit nozzle cleaning device for coaters. The slit nozzle cleaning device for coaters comprises a heating source, a crucible and a mixing means, the heating source is used to heat the materials in the crucible; the mixing means is used to mix the materials in the crucible. The mixing means is used to mix the materials in the crucible, thus a uniform heating environment in the crucible can be formed.

Abstract: A daily checking and calibrating method includes the following steps. Step (1) is for detecting a state of the length measuring machine at a predetermined daily check time. Step (2) is for stopping the transportation of substrates upon determining the length measuring machine is in an idle state. Step (3) is for measuring coordinates of positioning marks on a substrate-carrying platform to generate a measured data file and comparing the measured coordinates of the positioning marks with predetermined coordinates. Step (4) is for automatically calculating a calibration value when a difference between the measured coordinates of the positioning marks and the predetermined coordinates is smaller than a predetermined value and updating the calibration value to a coordinate parameter file to complete automatic calibration. Otherwise, an alarm is activated.

Abstract: A liquid crystal panel comprises an end product area and a test area, wherein a RGB test block, a blank block and three monochrome blocks are provided in the test area, the monochrome blocks comprises a red test block, a green test block and a blue test block, the RGB test block is compounded with a red light resistance, a green light resistance and a blue light resistance, the electric resistance and the metal ionic concentration of the RGB test block is equal to that of the end product area, the electric resistance and the metal ionic concentration can be determine whether the related target parameters of the liquid crystal panel on the end product area will reach the standard or not. Detection method on image sticking of the liquid crystal panel, the detecting efficiency will be obviously improved and the defect rate will be reduced.

Abstract: The present invention discloses a slit nozzle cleaning device for coaters. The slit nozzle cleaning device for coaters comprises a heating source, a crucible and a mixing means, the heating source is used to heat the materials in the crucible; the mixing means is used to mix the materials in the crucible. The mixing means is used to mix the materials in the crucible, thus a uniform heating environment in the crucible can be formed.

Abstract: The present disclosure relates to an image processing method, an image processing device, and an automated optical inspection machine. The method includes: an inspection area determining step for determining a rectangular inspection area in an inspected image; a definition threshold determining step for calculating an image definition threshold according to the gray values of pixels of a plurality of sample images in the inspection area; a product image definition determining step for calculating a product image definition according to the gray values of pixels of a product image in the inspection area; and a comparison step for comparing the product image definition with the image definition threshold; and a product image selecting step for selecting the current product image as an image to be inspected.

Abstract: A daily checking and calibrating method of a length measuring machine is disclosed. The method includes the following steps. Step (1) is for detecting a state of the length measuring machine at a predetermined daily check time. Step (2) is for stopping the transportation of substrates upon determining the length measuring machine is in an idle state. Step (3) is for measuring coordinates of positioning marks on a substrate-carrying platform to generate a measured data file and comparing the measured coordinates of the positioning marks with predetermined standard coordinates. Step (4) is for automatically calculating a calibration value when a difference between the measured coordinates of the positioning marks and the predetermined standard coordinates is smaller than a predetermined value and updating the calibration value to a coordinate parameter file to complete automatic calibration. Otherwise, an alarm is activated.

Abstract: A nozzle cleaning device and a coater provided with the nozzle cleaning device are provided, the nozzle cleaning device comprise a cleaner, a vacuum pipe and a vacuum pump; the cleaner has a recessed hole coinciding in shape with the nozzle of the coater for receiving the nozzle of the coater, and the inner wall of the recessed hole is provided with a plurality of through-holes; one end of the vacuum pipe is connected to said a plurality of through-holes, and the other end of the vacuum pipe is connected to the vacuum pump. The nozzle cleaning device of the present invention can be used conveniently to remove the photoresist residue so as to clean the nozzle, which effectively improves the product yield and the production efficiency, and reduces the cost due to needing no expensive nanomaterials.

Abstract: The present disclosure provides a method for correcting a measurement deviation of a transmittance frequency spectrum of a color filter. With the standard measuring data of transmittance frequency spectrum of the color filter, based on the deviation between the standard measuring data and the instantaneous measuring data of the transmittance frequency spectrum, the measurement of the transmittance frequency spectrum can be corrected automatically, which reduces the time of the transferring of the glass, analysis of the data, and manual correcting, reduces the labor, improves the utilization rate and productivity of the machine. The present disclosure further provides a system correcting a measurement deviation of transmittance frequency spectrum of a color filter.