Patents by Inventor Yu Feng Wang

Yu Feng Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145597
    Abstract: A method of forming a semiconductor device includes: forming a gate structure over a fin that protrudes above a substrate; forming source/drain regions over the fin on opposing sides of the gate structure; forming a first dielectric layer and a second dielectric layer successively over the source/drain regions; performing a first etching process to form an opening in the first dielectric layer and in the second dielectric layer, where the opening exposes an underlying electrically conductive feature; after performing the first etching process, performing a second etching process to enlarge a lower portion of the opening proximate to the substrate; and forming a contact plug in the opening after the second etching process.
    Type: Application
    Filed: January 2, 2024
    Publication date: May 2, 2024
    Inventors: Yu-Lien Huang, Guan-Ren Wang, Ching-Feng Fu, Yun-Min Chang
  • Patent number: 11942358
    Abstract: The present disclosure describes a method of forming low thermal budget dielectrics in semiconductor devices. The method includes forming, on a substrate, first and second fin structures with an opening in between, filling the opening with a flowable isolation material, treating the flowable isolation material with a plasma, and removing a portion of the plasma-treated flowable isolation material between the first and second fin structures.
    Type: Grant
    Filed: March 12, 2021
    Date of Patent: March 26, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Mrunal Abhijith Khaderbad, Ko-Feng Chen, Zheng-Yong Liang, Chen-Han Wang, De-Yang Chiou, Yu-Yun Peng, Keng-Chu Lin
  • Patent number: 11935920
    Abstract: In an embodiment, a device includes: a first source/drain region; a second source/drain region; an inter-layer dielectric (ILD) layer over the first source/drain region and the second source/drain region; a first source/drain contact extending through the ILD layer, the first source/drain contact connected to the first source/drain region; a second source/drain contact extending through the ILD layer, the second source/drain contact connected to the second source/drain region; and an isolation feature between the first source/drain contact and the second source/drain contact, the isolation feature including a dielectric liner and a void, the dielectric liner surrounding the void.
    Type: Grant
    Filed: July 27, 2022
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Lien Huang, Guan-Ren Wang, Ching-Feng Fu
  • Publication number: 20240087960
    Abstract: A method may include forming a mask layer on top of a first dielectric layer formed on a first source/drain and a second source/drain, and creating an opening in the mask layer and the first dielectric layer that exposes portions of the first source/drain and the second source/drain. The method may include filling the opening with a metal layer that covers the exposed portions of the first source/drain and the second source/drain, and forming a gap in the metal layer to create a first metal contact and a second metal contact. The first metal contact may electrically couple to the first source/drain and the second metal contact may electrically couple to the second source/drain. The gap may separate the first metal contact from the second metal contact by less than nineteen nanometers.
    Type: Application
    Filed: November 13, 2023
    Publication date: March 14, 2024
    Inventors: Yu-Lien HUANG, Ching-Feng FU, Huan-Just LIN, Fu-Sheng LI, Tsai-Jung HO, Bor Chiuan HSIEH, Guan-Xuan CHEN, Guan-Ren WANG
  • Publication number: 20240090236
    Abstract: A magnetic tunnel junction memory device includes a vertical stack of magnetic tunnel junction NOR strings located over a substrate. Each magnetic tunnel junction NOR string includes a respective semiconductor material layer that contains a semiconductor source region, a plurality of semiconductor channels, and a plurality of semiconductor drain regions, a plurality of magnetic tunnel junction memory cells having a respective first electrode that is located on a respective one of the plurality of semiconductor drain regions, and a metallic bit line contacting each second electrode of the plurality of magnetic tunnel junction memory cells. The vertical stack of magnetic tunnel junction NOR strings may be repeated along a channel direction to provide a three-dimensional magnetic tunnel junction memory device.
    Type: Application
    Filed: November 16, 2023
    Publication date: March 14, 2024
    Inventors: Han-Jong CHIA, Bo-Feng YOUNG, Sai-Hooi YEONG, Chenchen Jacob WANG, Meng-Han LIN, Yu-Ming LIN
  • Patent number: 11925457
    Abstract: A device for encouraging and guiding a spirometer user includes a housing, a main valve, a visual assembly, and a sound making assembly. The housing has a guiding channel, a first outlet channel, a second outlet channel, and an inlet channel. The main valve is disposed in a housing communicating with the guiding channel, the first outlet channel, the second outlet channel or the inlet channel and configured to regulate or control fluid flowing paths. The visual assembly includes a check valve in the second outlet channel, and at least one movable member. The sound making assembly includes a check valve and a sound maker. So, it can generate the visual and sound encouraging effects for learning how to use a spirometer correctly.
    Type: Grant
    Filed: February 17, 2021
    Date of Patent: March 12, 2024
    Assignees: TAICHUNG VETERANS GENERAL HOSPITAL, CENTRAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Ming-Feng Wu, Yu-Hsuan Chen, Kuo-Chih Su, Chun-Hsiang Wang
  • Patent number: 11922855
    Abstract: An information handling system includes a host processing system and a Liquid Crystal Display device. The host processing system includes a graphics processing unit (GPU) and the LCD device includes a memory device and a DisplayPort Configuration Data (DPCD) register. The host processing system 1) determines whether the first GPU supports a Dynamic Display Shifting (DDS) mode, 2) when the GPU does not support the DDS mode, provides a first indication to the LCD device that the GPU does not support the DDS mode, and 3) when the GPU supports the DDS mode, provides a second indication to the LCD device that the GPU supports the DDS mode. The LCD device retrieves a Panel Self Refresh (PSR) setting from the memory device and stores the PSR setting to the DPCD register in response to the first indication, and retrieves a DDS setting from the memory and stores the DDS setting to the DPCD register in response to the second indication.
    Type: Grant
    Filed: January 31, 2022
    Date of Patent: March 5, 2024
    Assignee: Dell Products L.P.
    Inventors: Chun-Yi Chang, Yi-Fan Wang, Meng-Feng Hung, No-Hua Chuang, Yu Sheng Chang
  • Publication number: 20240069304
    Abstract: A voice coil motor held immobile by magnetic attraction when not in use for photography purposes includes a base, a magnet fixed thereto, a carrier, a magnetic member, and a coil. The magnetic member is fixed to the carrier and is attracted by a permanent magnetic field (first MF) of the magnet on the base. The coil is fixed to the carrier and the magnetic member. When the voice coil motor is powered on, the coil generates a second magnetic field (second MF) opposing the first MF. The second MF reduces or eliminates the attractive force of the first MF of the magnet, to separate the carrier and its fittings and allow them to work freely. A lens module and an electronic device are further provided.
    Type: Application
    Filed: September 30, 2022
    Publication date: February 29, 2024
    Inventors: YU-SHUAI LI, SHIN-WEN CHEN, KUN LI, JIAN-CHAO SONG, WU-TONG WANG, DING FENG
  • Publication number: 20240071911
    Abstract: A semiconductor device includes a first die having a first bonding layer; a second die having a second bonding layer disposed over and bonded to the first bonding layer; a plurality of bonding members, wherein each of the plurality of bonding members extends within the first bonding layer and the second bonding layer, wherein the plurality of bonding members includes a connecting member electrically connected to a first conductive pattern in the first die and a second conductive pattern in the second die, and a dummy member electrically isolated from the first conductive pattern and the second conductive pattern; and an inductor disposed within the first bonding layer and the second bonding layer. A method of manufacturing a semiconductor device includes bonding a first inductive coil of a first die to a second inductive coil of a second die to form an inductor.
    Type: Application
    Filed: January 31, 2023
    Publication date: February 29, 2024
    Inventors: Harry-Haklay Chuang, Wen-Tuo Huang, Li-Feng Teng, Wei-Cheng Wu, Yu-Jen Wang
  • Patent number: 11916147
    Abstract: A method of forming a semiconductor device includes: forming a gate structure over a fin that protrudes above a substrate; forming source/drain regions over the fin on opposing sides of the gate structure; forming a first dielectric layer and a second dielectric layer successively over the source/drain regions; performing a first etching process to form an opening in the first dielectric layer and in the second dielectric layer, where the opening exposes an underlying electrically conductive feature; after performing the first etching process, performing a second etching process to enlarge a lower portion of the opening proximate to the substrate; and forming a contact plug in the opening after the second etching process.
    Type: Grant
    Filed: June 29, 2022
    Date of Patent: February 27, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD
    Inventors: Yu-Lien Huang, Guan-Ren Wang, Ching-Feng Fu, Yun-Min Chang
  • Publication number: 20220371253
    Abstract: A system for halogenating olefinic-based elastomer, the system comprising a first extruder, a first kneader vessel downstream of said first extruder and in fluid communication with said first extruder, a second extruder downstream of said first kneader vessel and in fluid communication with said first kneader vessel, a second kneader vessel downstream of said second extruder and in fluid communication with said second extruder; and a third extruder downstream of said second kneader vessel and in fluid communication with said second kneader vessel.
    Type: Application
    Filed: August 12, 2021
    Publication date: November 24, 2022
    Inventors: Richard D. Hembree, Michael F. McDonald, JR., Joseph A. Maier, Leming Gu, Yu Feng Wang
  • Patent number: 11255292
    Abstract: An intake swirl gasket is disclosed herein. It is installed between a cylinder head and an intake manifold and comprises plural airflow holes for respectively communicating with plural intake passages of the cylinder head; and plural diversion devices respectively disposed in the plural airflow holes and each having an axis and plural splitter blades extended from the axis for connecting to an inner wall of each of the plural airflow holes, wherein each of the plural splitter blades is shaped as an arc to form a recessed surface towards the intake manifold at one side thereof and a convex surface towards the cylinder head at the other side thereof, and wherein an included angle between each of the plural splitter blades and an end face of the intake swirl gasket oriented towards the cylinder head ranges from 50 to 80 degrees.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: February 22, 2022
    Assignee: Pang Chih Industrial Co., Ltd.
    Inventors: Yu-Jen Wang, Yu-Feng Wang, Hao-Yu Shih
  • Publication number: 20210102512
    Abstract: An intake swirl gasket is disclosed herein. It is installed between a cylinder head and an intake manifold and comprises plural airflow holes for respectively communicating with plural intake passages of the cylinder head; and plural diversion devices respectively disposed in the plural airflow holes and each having an axis and plural splitter blades extended from the axis for connecting to an inner wall of each of the plural airflow holes, wherein each of the plural splitter blades is shaped as an arc to form a recessed surface towards the intake manifold at one side thereof and a convex surface towards the cylinder head at the other side thereof, and wherein an included angle between each of the plural splitter blades and an end face of the intake swirl gasket oriented towards the cylinder head ranges from 50 to 80 degrees.
    Type: Application
    Filed: August 14, 2020
    Publication date: April 8, 2021
    Inventors: YU-JEN WANG, YU-FENG WANG, HAO-YU SHIH
  • Patent number: 10947375
    Abstract: A system for producing a functionalized olefinic-based polymer, the system comprising a polymerization zone for producing an olefinic-based polymer comprising a mixing section, a deliquifying section, and a quenching section, wherein at least one section of the polymerization zone has a defined cross-sectional area that continually decreases from a first end to a second end of said section; a devolatilization zone comprising a kneader or extruder, wherein said devolatilization zone is downstream of said polymerization zone and in fluid communication with said polymerization zone; and a functionalization zone downstream of said devolatilization zone and in fluid communication with said devolatilization zone.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: March 16, 2021
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Yu Feng Wang, Richard D. Hembree, Michael F. McDonald, Jr., Joseph A. Maier, Richard C. M. Yeh, Leming Gu, Timothy D. Shaffer, Pamela J. Wright
  • Publication number: 20200255643
    Abstract: A system for producing a functionalized olefinic-based polymer, the system comprising a polymerization zone for producing an olefinic-based polymer comprising a mixing section, a deliquifying section, and a quenching section, wherein at least one section of the polymerization zone has a defined cross-sectional area that continually decreases from a first end to a second end of said section; a devolatilization zone comprising a kneader or extruder, wherein said devolatilization zone is downstream of said polymerization zone and in fluid communication with said polymerization zone; and a functionalization zone downstream of said devolatilization zone and in fluid communication with said devolatilization zone.
    Type: Application
    Filed: December 9, 2016
    Publication date: August 13, 2020
    Inventors: Yu Feng Wang, Richard D. Hembree, Michael F. McDonald, JR., Joseph A. Maier, Richard C.M. Yeh, Leming Gu, Timothy D. Shaffer, Pamela J. Wright
  • Publication number: 20180362684
    Abstract: High Mooney viscosity elastomers having low volatiles content, and processes for producing such elastomers, are provided herein. In particular aspects, the elastomers are metallocene-catalyzed elastomers, such as mEPDM elastomers. Processes for producing such elastomers include devolatilization of an elastomer stream comprising such elastomers, using a kneader. The kneader is counterintuitively operated such that the internal agitating paddles rotate at relatively low speeds. It is believed these low speeds help maintain the elastomer stream as a toffee-like composition, preventing the elastomer stream within the kneader from becoming a crumbly composition, which is difficult to devolatilize.
    Type: Application
    Filed: December 9, 2016
    Publication date: December 20, 2018
    Inventors: Yu Feng Wang, Cameron Y. Lim, Aaron H. Reed
  • Publication number: 20180085989
    Abstract: A system for halogenating olefinic-based elastomer, the system comprising a first extruder, a first kneader vessel downstream of said first extruder and in fluid communication with said first extruder, a second extruder downstream of said first kneader vessel and in fluid communication with said first kneader vessel, a second kneader vessel downstream of said second extruder and in fluid communication with said second extruder; and a third extruder downstream of said second kneader vessel and in fluid communication with said second kneader vessel.
    Type: Application
    Filed: March 22, 2016
    Publication date: March 29, 2018
    Inventors: Richard D. Hembree, Michael F. McDonald, Joseph A. Maier, Leming Gu, Yu Feng Wang
  • Patent number: 9796838
    Abstract: A blended multimodal polymer product is disclosed that comprises a first polymer, wherein the first polymer is a homopolymer of propylene or a propylene copolymer having an ethylene or a C4 to C10 olefin comonomer; and a second polymer, wherein the second polymer is a propylene homopolymer and a propylene copolymer having an ethylene or a C4 to C10 olefin comonomer, and wherein the first polymer and second polymer have a difference in heat of fusion of about 25 J/g or more. Methods for making such a polymer product using at least two reactors in parallel and for separating a propylene-based polymer from a solvent using a liquid-phase separator are also disclosed.
    Type: Grant
    Filed: January 8, 2016
    Date of Patent: October 24, 2017
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Periagaram S. Ravishankar, Yu Feng Wang, Luke P. Stephens, Florin Barsan, Douglas A. Berti
  • Patent number: D881140
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: April 14, 2020
    Assignee: SIEMENS AKTIENGESELLSCHAFT
    Inventor: Yu Feng Wang
  • Patent number: D919568
    Type: Grant
    Filed: January 9, 2019
    Date of Patent: May 18, 2021
    Assignee: Siemens Aktiengesellschaft
    Inventors: An Chao Zhang, Bin Yang, Yu Feng Wang, Jian Zhang, Long Xian Ni