Abstract: Vapor deposition apparatus includes: reaction chamber; base including a central area and peripheral area, and capable of moving between high position and low position; shower head at the top of the chamber and configured to introduce plurality of gases; first pumping channel, surrounding the reaction space and formed between the peripheral area of the base assembly and the lower surface of the shower head when the base assembly is located at the high position; and second pumping channel, surrounding the first pumping channel, where the conductance of the second pumping channel is greater than that of the first pumping channel, so that gases are emitted after being subjected to two-stage choke of the first pumping channel and the second pumping channel; and when the base assembly is located at the low position, the fabrication gases are emitted after being subjected to one-stage choke of the second pumping channel.

Abstract: Disclosed herein is a stent graft for ascending aorta, comprising a stent; a cover attachment at least partially covering the stent; a valve leaflet for reconstructing aortic valves, which are positioned at the proximal end of the stent and attached to the cover attachment and the stent. The valve leaflet for reconstructing aortic valves is configured to allow blood to flow from the left ventricle to the aorta and prevent blood from flowing from the aorta back to the left ventricle. In addition, the stent graft has two windows aligning with two openings of the coronary artery. Therefore, for the aortic root diseases involving aortic sinus and aortic valves, the stent graft for ascending aorta can be implanted into ascending aortic root by minimally invasive endovascular surgery to repair the ascending aorta lesions and reconstruct the aortic valves, aortic sinus, openings of the coronary artery, thereby achieving overall cure.