Abstract: The invention provides a power supply including at least one power output port, at least one status alert component, and at least one output port status monitoring module. The status alert component generates at least one visual prompt based on an alert signal. The output port status monitoring module includes at least one temperature sensor adjacent to the power output port, a microcontroller connected to the temperature sensor and sensing an output current from the power output port, and a reset signal generator connected to the microcontroller. The microcontroller comprises at least one port status alert condition that takes a temperature and the output current of the power output port as decision factors. The microcontroller outputs the alert signal to the status alert component when the port status alert condition is met and maintains the status until a reset signal provided by the reset signal generator is received.

Abstract: A semiconductor device according to the present disclosure includes a gate extension structure, a first source/drain feature and a second source/drain feature, a vertical stack of channel members extending between the first source/drain feature and the second source/drain feature along a direction, and a gate structure wrapping around each of the vertical stack of channel members. The gate extension structure is in direct contact with the first source/drain feature.

Abstract: A mending method for a display includes the steps of making a display device light to make a plurality of light emitting positions thereof shine, searching out a plurality of defect positions among the light emitting positions, providing a transferring device having a transferring surface with a plurality of miniature light emitting elements positioned correspondingly to the light emitting positions, planning a mending procedure which includes in the area the transferring surface corresponds to, choosing in chief the largest number of defect positions able to be mended at a single time according to the positions of the miniature light emitting elements and then in the area the transferring surface corresponds to, planning the rest of the defect positions according to the rest of the miniature light emitting elements, and according to the mending procedure, moving the transferring device to weld the miniature light emitting elements at the defect positions.

Abstract: A leak check is performed on a semiconductor wafer processing tool that includes a process chamber and process gas lines, and a semiconductor wafer is processed using the semiconductor wafer processing tool if the leak check passes. Each gas line includes a mass flow controller (MFC) and normally closed valves including an upstream and downstream valves upstream and downstream of the MFC. Leak checking includes: leak checking up to the downstream valves of the gas lines with the upstream valves closed and the downstream valves of the gas lines closed; and leak checking up to the upstream valve of each the process gas line with the upstream valves of the of the process gas lines closed and with the downstream valve of the of the process gas line being leak checked open and the downstream valve of every other process gas line closed.

Abstract: A method for forming a dielectric layer of a semiconductor is described. At first, providing a substrate with a metal-conductive layer having been formed thereon. Next covering the substrate with a membrane having a plurality of micro-holes. Afterward spraying a fluid dielectric on the membrane having a plurality of micro-holes. After waiting a period of time for the gaps among the metal conductors being filled with the fluid dielectric, removing the membrane having a plurality of micro-holes from the substrate. Further baking the substrate to cure the fluid dielectric inside metal-conductive layer. The thickness of the dielectric after curing is approximately equal to the thickness of the metal-conductive layer. At last forming a cap dielectric layer on the substrate.

Abstract: A process for making split-gate semiconductor flash memory contains an outwardly-diverging control gate stacked on but separated from a pair of opposing floating gates via an interpoly dielectric layer.

Abstract: A MOS transistor with a pair of lightly doped drain (LDD) sub-regions in the substrate and whose gate electrode is self-aligned with a non-doped gate oxide layer overlying the channel region between the two LDD sub-regions.

Abstract: A method of manufacturing an electron tunnel oxide (ETOX) flash memory device having an improved coupling efficiency includes sequentially forming a tunnel oxide, a floating gate, a dielectric layer, and a control gate on a substrate, where the tunnel oxide and the bottom of the floating gate are formed to be narrower than the top of the floating gate, the dielectric and the control gate.

Abstract: A split-gate semiconductor flash memory contains an outwardly-diverging control gate stacked on but separated from a pair of opposing floating gates via an inter-poly dielectric layer.

Abstract: A structure of dynamic random access memory includes a field effect transistor (FET), a capacitor, a world line and a bit line. The gate of the FET is electrically coupled to the word line in which a voltage source is supplied through the world line to the gate. The drain region of the FET is electrically coupled to a lower electrode of the capacitor. The capacitor has an upper electrode being electrically coupled to the gate of the FET either. The source region of the FET is electrically coupled to the bit line.

Abstract: A MOS device is provided with a reduced source and drain area. This is accomplished by first providing a MOS device with a buried gate region. The buried gate region is located on top of a channel region, which runs horizontally along the bottom of the gate trench. The source and drain regions are aligned vertically an parallel to the outside sidewalls of the buried gate region. Sidewall protectors are provided between the gate and lateral source and drain regions on the inside sidewalls of the gate trench. Additionally, a process for manufacturing the above described device is also disclosed.

Abstract: A method of forming local interconnection of a SRAM, including the following steps: First, an NMOS and a PMOS are formed on a P-well and an N-well on a substrate, respectively. An isolation oxide layer is formed and the isolation oxide layer on a node is removed. A thin polysilicon layer is formed and N+ shallow implantation and N+ deep implantation is performed by using a photolithography technique. Also, P+ shallow implantation and P+ deep implantation are performed by using a photolithography technique. After the formation of a low resistance material, the low resistance material and the thin polysilicon layer are together formed.