Patents by Inventor Yuhsin Tsai

Yuhsin Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9863044
    Abstract: A method for forming a polymerized film on a surface of a non-conductive material and subsequently forming an electroless metal plating film on the surface is described. The method includes the step of contacting the surface of the material with a solution including (A) an amine compound having at least two functional groups, where at least one of the functional groups is an amino group, and (B) an aromatic compound having at least one hydroxyl group on the aromatic ring.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: January 9, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Maria Anna Rzeznik, Philip D. Knudsen, Xuesong Wang, Martin W. Bayes, Yuhsin Tsai
  • Publication number: 20140093647
    Abstract: A method for forming a polymerized film on a surface of a non-conductive material and subsequently forming an electroless metal plating film on the surface is described. The method includes the step of contacting the surface of the material with a solution including (A) an amine compound having at least two functional groups, where at least one of the functional groups is an amino group, and (B) an aromatic compound having at least one hydroxyl group on the aromatic ring.
    Type: Application
    Filed: September 30, 2013
    Publication date: April 3, 2014
    Inventors: Maria Anna RZEZNIK, Philip D. KNUDSEN, Xuesong WANG, Martin W. BAYES, Yuhsin TSAI
  • Patent number: 7687594
    Abstract: A random amorphous copolyester is synthesized by using diacid monomers and diol monomers. The random amorphous copolyester has a structure of the formula (I): wherein R1, R2 is an aromatic or aliphatic monomer, A is 0-0.8, B is 0-0.8, C is 0-1, D is 0-1, E is 0-0.8, F is 0-0.8, C+D<0.2 and A+B+E+F<0.8. The diacid monomer comprises TPA and an aromatic or aliphatic diacid monomer, the diol monomer comprises EG, 1,3 and 1,4-CHDM, and an aromatic or aliphatic diol monomer.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: March 30, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Yuan Hung, Cheng-Hsing Fan, Yuhsin Tsai, Fu-Yu Tsai
  • Publication number: 20090137768
    Abstract: A random amorphous copolyester is provided. The copolyester of the invention is synthesized by using diacid monomers and diol monomers. The random amorphous copolyester has a structure of the formula (I): wherein R1, R2 is an aromatic or aliphatic monomer, and wherein A, B, C, D, E and F are numbers of repeating units, A is 0-0.8, B is 0-0.8, C is 0-1, D is 0-1, E is 0-0.8, F is 0-0.8, C+D>0.2 and A+B+E+F<0.8. The diacid monomer comprises TPA and an aromatic or aliphatic diacid monomer, the diol monomer comprises EG, 1,3 and 1,4-CHDM, and an aromatic or aliphatic diol monomer.
    Type: Application
    Filed: June 24, 2008
    Publication date: May 28, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Yuan Hung, Cheng-Hsing Fan, Yuhsin Tsai, Fu-Yu Tsai