Patents by Inventor Yuhu Wang

Yuhu Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11748742
    Abstract: The present invention relates to the provision of an information processing device that can smoothly perform the migration of a system. An information processing device includes a processing unit including a first function of executing processing that uses service information stored in a recording medium, and a second function of executing processing that uses identification information regarding a service that is stored in a recording medium, and a determination unit configured to determine processing to be executed by the processing unit, on the basis of a request from an external device. In the information processing device, the processing unit executes processing determined on the basis of the request, and the first function is invalidated on the basis of an invalidation request from an external device.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: September 5, 2023
    Assignee: SONY CORPORATION
    Inventors: Yuhu Wang, Shino Ogasahara, Tsutomu Nakatsuru
  • Publication number: 20210065162
    Abstract: The present invention relates to the provision of an information processing device that can smoothly perform the migration of a system. An information processing device includes a processing unit including a first function of executing processing that uses service information stored in a recording medium, and a second function of executing processing that uses identification information regarding a service that is stored in a recording medium, and a determination unit configured to determine processing to be executed by the processing unit, on the basis of a request from an external device. In the information processing device, the processing unit executes processing determined on the basis of the request, and the first function is invalidated on the basis of an invalidation request from an external device.
    Type: Application
    Filed: December 28, 2018
    Publication date: March 4, 2021
    Inventors: YUHU WANG, SHINO OGASAHARA, TSUTOMU NAKATSURU
  • Publication number: 20210050997
    Abstract: There is provided an information processing apparatus, an information processing method, a program, and an information processing system that are able to reduce a processing time for reading while ensuring security regarding data reading. The information processing apparatus includes a processing unit that, in a case where a reading request including a data reading command and information indicating a region of a recording medium from which data is read is acquired, encrypts data corresponding to the region indicated by the reading request by using an encryption key corresponding to the region indicated by the reading request and transmits the encrypted data.
    Type: Application
    Filed: January 22, 2019
    Publication date: February 18, 2021
    Applicant: SONY CORPORATION
    Inventors: Tsutomu NAKATSURU, Katsuya SHIMOJI, Toshiharu TAKEMURA, Yuhu WANG
  • Patent number: 10574752
    Abstract: A distributed data storage method, apparatus, and system are disclosed. After a first node receives a query request that comprises a query identifier, if first data corresponding to the query identifier is stored locally, but second data corresponding to the query identifier is not stored locally, the first node recalculates a second node configured to store the first data, and sends storage location information of the first data to the second node. The second node obtains the first data from the first node according to the storage location information after receiving a request for querying for the first data, and if the request for querying for the first data is not received subsequently, the operation of obtaining, by the second node, the first data from the first node is not triggered. In this way, network data transmission resources are reduced and storage space is saved.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: February 25, 2020
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventor: Yuhu Wang
  • Patent number: 10353896
    Abstract: A data processing method and apparatus are provided. The data processing method includes determining, according to a database execution plan, a partition quantity corresponding to a currently free programmable memory, partitioning the currently free programmable memory according to the partition quantity, to obtain a programmable memory partition corresponding to the partition quantity, and executing, using the programmable memory partition, a relational algebra logical operation corresponding to the database execution plan. Embodiments of the present disclosure can be used to improve data processing efficiency.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: July 16, 2019
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Liang Ke, Huaizhou Li, Yuhu Wang
  • Patent number: 10339432
    Abstract: To propose a novel and improved communication device which is capable of improving user convenience. Provided is a communication device, including: a solar cell including a light receiving surface configured to receive radiated light; an electric storage device that is installed on a back surface of the light receiving surface; and a circuit board that includes a communication antenna and is installed on a back surface of an opposite surface of the electric storage device to the solar cell.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: July 2, 2019
    Assignee: SONY CORPORATION
    Inventors: Takayuki Yamada, Masayuki Ishikura, Shino Ogasahara, Masashi Ishikawa, Yuhu Wang, Hitoshi Miki
  • Publication number: 20190005367
    Abstract: [Object] To propose a novel and improved communication device which is capable of improving user convenience. [Solution] Provided is a communication device, including: a solar cell including a light receiving surface configured to receive radiated light; an electric storage device that is installed on a back surface of the light receiving surface; and a circuit board that includes a communication antenna and is installed on a back surface of an opposite surface of the electric storage device to the solar cell.
    Type: Application
    Filed: May 27, 2016
    Publication date: January 3, 2019
    Inventors: TAKAYUKI YAMADA, MASAYUKI ISHIKURA, SHINO OGASAHARA, MASASHI ISHIKAWA, YUHU WANG, HITOSHI MIKI
  • Publication number: 20170091273
    Abstract: A data processing method and apparatus are provided. The data processing method includes determining, according to a database execution plan, a partition quantity corresponding to a currently free programmable memory, partitioning the currently free programmable memory according to the partition quantity, to obtain a programmable memory partition corresponding to the partition quantity, and executing, using the programmable memory partition, a relational algebra logical operation corresponding to the database execution plan. Embodiments of the present disclosure can be used to improve data processing efficiency.
    Type: Application
    Filed: December 8, 2016
    Publication date: March 30, 2017
    Inventors: Liang Ke, Huaizhou Li, Yuhu Wang
  • Publication number: 20160323385
    Abstract: A distributed data storage method, apparatus, and system are disclosed. After a first node receives a query request that comprises a query identifier, if first data corresponding to the query identifier is stored locally, but second data corresponding to the query identifier is not stored locally, the first node recalculates a second node configured to store the first data, and sends storage location information of the first data to the second node. The second node obtains the first data from the first node according to the storage location information after receiving a request for querying for the first data, and if the request for querying for the first data is not received subsequently, the operation of obtaining, by the second node, the first data from the first node is not triggered. In this way, network data transmission resources are reduced and storage space is saved.
    Type: Application
    Filed: July 11, 2016
    Publication date: November 3, 2016
    Inventor: Yuhu Wang
  • Patent number: 8779011
    Abstract: A method for producing and using an ultrapure colloidal silica dispersion is disclosed. The ultrapure colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and less than 2 ppm residual alcohol. The method comprises dissolving a fumed silica in an aqueous solvent comprising an alkali metal hydroxide to produce an alkaline silicate solution, removing the alkali metal via ion exchange to generate a silicic acid solution, adjusting temperature, concentration and pH of said silicic acid solution to values sufficient to initiate nucleation and particle growth, and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: July 15, 2014
    Assignee: Fujifilm Planar Solutions, LLC
    Inventors: Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert R. M. Moyaerts, Saeed H. Mohseni, Nichole R. Koontz, Bin Hu, Liqing Wen
  • Patent number: 8211193
    Abstract: A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: July 3, 2012
    Assignee: Fujifilm Planar Solutions, LLC
    Inventors: Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert R. M. Moyaerts, Saeed H. Mohseni, Nichole R. Koontz, Bin Hu, Liqing Wen
  • Publication number: 20120145950
    Abstract: An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb, of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol. A method for producing and using the same is also disclosed.
    Type: Application
    Filed: February 24, 2012
    Publication date: June 14, 2012
    Inventors: Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert R.M. Moyaerts, Saeed H. Mohseni, Nichole R. Koontz, Bin Hu, Liqing Wen
  • Patent number: 8080231
    Abstract: The present invention provides nanoporous ?-alumina powders comprising powder comprising interconnected ?-alumina primary particles having an average particle size of less than about 100 nm and an interpenetrated array of pores or voids. The invention also provides nanosized ?-alumina powders comprising ?-alumina particles having an average particle size of less than about 100 nm and slurries, particularly aqueous slurries, which comprise nanosized ?-alumina powders of the invention. The invention further provides methods of manufacturing nanoporous ?-alumina powders and nanosized ?-alumina powders of the invention and methods of polishing using slurries of the invention.
    Type: Grant
    Filed: February 2, 2005
    Date of Patent: December 20, 2011
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventor: Yuhu Wang
  • Patent number: 7638105
    Abstract: The present invention provides ?-alumina powders comprising ?-alumina particles of which at least 80% of the ?-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise ?-alumina powders of the invention. The invention further provides methods of manufacturing ?-alumina powders and ?-alumina slurries of the invention and methods of polishing using same.
    Type: Grant
    Filed: August 13, 2008
    Date of Patent: December 29, 2009
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventor: Yuhu Wang
  • Publication number: 20080308528
    Abstract: The present invention provides ?-alumina powders comprising ?-alumina particles of which at least 80% of the ?-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise ?-alumina powders of the invention. The invention further provides methods of manufacturing ?-alumina powders and ?-alumina slurries of the invention and methods of polishing using same.
    Type: Application
    Filed: August 13, 2008
    Publication date: December 18, 2008
    Inventor: Yuhu Wang
  • Patent number: 7422730
    Abstract: The present invention provides ?-alumina powders comprising ?-alumina particles of which at least 80% of the ?-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise ?-alumina powders of the invention. The invention further provides methods of manufacturing ?-alumina powders and ?-alumina slurries of the invention and methods of polishing using same.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: September 9, 2008
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventor: Yuhu Wang
  • Publication number: 20080170979
    Abstract: This patent disclose a method for making ultra pure colloidal silica having metal impurities except potassium of less than about 1 ppm, at a pH of greater than about 6, with an average particle size of less than about 200 nm. Hydrolyzable silanes that can be purified by distillation, or their oligomers, are used as raw materials which are first dissolved in water with organic or inorganic acids. This acidic solution is slowly mixed with a basic solution with or without silicate at a temperature range 50-105° C. to form colloidal silica. The colloidal silica can be further concentrated to higher concentrations, greater than about 20% by evaporation or by ultrafiltration, or a combination thereof.
    Type: Application
    Filed: December 27, 2007
    Publication date: July 17, 2008
    Applicant: Suzhou Nanodispersions LTD
    Inventors: Yuhu Wang, Ning Zhang
  • Publication number: 20070254964
    Abstract: An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol.
    Type: Application
    Filed: June 15, 2007
    Publication date: November 1, 2007
    Inventors: Deepak Mahulikar, Yuhu Wang, Ken Delbridge, Gert Moyaerts, Saeed Mohseni, Nichole Koontz, Bin Hu, Liqing Wen
  • Publication number: 20070075292
    Abstract: A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
    Type: Application
    Filed: September 22, 2006
    Publication date: April 5, 2007
    Inventors: Deepak Mahulikar, Yuhu Wang, Ken Delbridge, Gert Moyaerts, Saeed Mohseni, Nichole Koontz, Bin Hu, Liqing Wen
  • Publication number: 20060283095
    Abstract: A method of manufacturing a colloidal silica dispersion, by dissolving a fumed silica in an aqueous solvent having an alkali metal hydroxide to produce an alkaline silicate solution; removing the alkali metal via ion exchange to produce a silicic acid solution; adjusting the temperature, concentration and pH of the silicic acid solution to values sufficient to initiate nucleation and particle growth at elevated temperatures; and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion. The colloidal silica particles in the colloidal silica dispersion have a mean particle size about 2 nm to about 100 nm. Also provided is a method of chemical mechanical polishing a surface of a substrate by contacting the substrate and a composition having a plurality of colloidal silica particles according to the present invention and a medium for suspending the particles. The contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
    Type: Application
    Filed: June 15, 2005
    Publication date: December 21, 2006
    Inventors: Deepak Mahulikar, Yuhu Wang