Patents by Inventor Yuhu Wang
Yuhu Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11748742Abstract: The present invention relates to the provision of an information processing device that can smoothly perform the migration of a system. An information processing device includes a processing unit including a first function of executing processing that uses service information stored in a recording medium, and a second function of executing processing that uses identification information regarding a service that is stored in a recording medium, and a determination unit configured to determine processing to be executed by the processing unit, on the basis of a request from an external device. In the information processing device, the processing unit executes processing determined on the basis of the request, and the first function is invalidated on the basis of an invalidation request from an external device.Type: GrantFiled: December 28, 2018Date of Patent: September 5, 2023Assignee: SONY CORPORATIONInventors: Yuhu Wang, Shino Ogasahara, Tsutomu Nakatsuru
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Publication number: 20210065162Abstract: The present invention relates to the provision of an information processing device that can smoothly perform the migration of a system. An information processing device includes a processing unit including a first function of executing processing that uses service information stored in a recording medium, and a second function of executing processing that uses identification information regarding a service that is stored in a recording medium, and a determination unit configured to determine processing to be executed by the processing unit, on the basis of a request from an external device. In the information processing device, the processing unit executes processing determined on the basis of the request, and the first function is invalidated on the basis of an invalidation request from an external device.Type: ApplicationFiled: December 28, 2018Publication date: March 4, 2021Inventors: YUHU WANG, SHINO OGASAHARA, TSUTOMU NAKATSURU
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Publication number: 20210050997Abstract: There is provided an information processing apparatus, an information processing method, a program, and an information processing system that are able to reduce a processing time for reading while ensuring security regarding data reading. The information processing apparatus includes a processing unit that, in a case where a reading request including a data reading command and information indicating a region of a recording medium from which data is read is acquired, encrypts data corresponding to the region indicated by the reading request by using an encryption key corresponding to the region indicated by the reading request and transmits the encrypted data.Type: ApplicationFiled: January 22, 2019Publication date: February 18, 2021Applicant: SONY CORPORATIONInventors: Tsutomu NAKATSURU, Katsuya SHIMOJI, Toshiharu TAKEMURA, Yuhu WANG
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Patent number: 10574752Abstract: A distributed data storage method, apparatus, and system are disclosed. After a first node receives a query request that comprises a query identifier, if first data corresponding to the query identifier is stored locally, but second data corresponding to the query identifier is not stored locally, the first node recalculates a second node configured to store the first data, and sends storage location information of the first data to the second node. The second node obtains the first data from the first node according to the storage location information after receiving a request for querying for the first data, and if the request for querying for the first data is not received subsequently, the operation of obtaining, by the second node, the first data from the first node is not triggered. In this way, network data transmission resources are reduced and storage space is saved.Type: GrantFiled: July 11, 2016Date of Patent: February 25, 2020Assignee: HUAWEI TECHNOLOGIES CO., LTD.Inventor: Yuhu Wang
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Patent number: 10353896Abstract: A data processing method and apparatus are provided. The data processing method includes determining, according to a database execution plan, a partition quantity corresponding to a currently free programmable memory, partitioning the currently free programmable memory according to the partition quantity, to obtain a programmable memory partition corresponding to the partition quantity, and executing, using the programmable memory partition, a relational algebra logical operation corresponding to the database execution plan. Embodiments of the present disclosure can be used to improve data processing efficiency.Type: GrantFiled: December 8, 2016Date of Patent: July 16, 2019Assignee: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Liang Ke, Huaizhou Li, Yuhu Wang
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Patent number: 10339432Abstract: To propose a novel and improved communication device which is capable of improving user convenience. Provided is a communication device, including: a solar cell including a light receiving surface configured to receive radiated light; an electric storage device that is installed on a back surface of the light receiving surface; and a circuit board that includes a communication antenna and is installed on a back surface of an opposite surface of the electric storage device to the solar cell.Type: GrantFiled: May 27, 2016Date of Patent: July 2, 2019Assignee: SONY CORPORATIONInventors: Takayuki Yamada, Masayuki Ishikura, Shino Ogasahara, Masashi Ishikawa, Yuhu Wang, Hitoshi Miki
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Publication number: 20190005367Abstract: [Object] To propose a novel and improved communication device which is capable of improving user convenience. [Solution] Provided is a communication device, including: a solar cell including a light receiving surface configured to receive radiated light; an electric storage device that is installed on a back surface of the light receiving surface; and a circuit board that includes a communication antenna and is installed on a back surface of an opposite surface of the electric storage device to the solar cell.Type: ApplicationFiled: May 27, 2016Publication date: January 3, 2019Inventors: TAKAYUKI YAMADA, MASAYUKI ISHIKURA, SHINO OGASAHARA, MASASHI ISHIKAWA, YUHU WANG, HITOSHI MIKI
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Publication number: 20170091273Abstract: A data processing method and apparatus are provided. The data processing method includes determining, according to a database execution plan, a partition quantity corresponding to a currently free programmable memory, partitioning the currently free programmable memory according to the partition quantity, to obtain a programmable memory partition corresponding to the partition quantity, and executing, using the programmable memory partition, a relational algebra logical operation corresponding to the database execution plan. Embodiments of the present disclosure can be used to improve data processing efficiency.Type: ApplicationFiled: December 8, 2016Publication date: March 30, 2017Inventors: Liang Ke, Huaizhou Li, Yuhu Wang
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Publication number: 20160323385Abstract: A distributed data storage method, apparatus, and system are disclosed. After a first node receives a query request that comprises a query identifier, if first data corresponding to the query identifier is stored locally, but second data corresponding to the query identifier is not stored locally, the first node recalculates a second node configured to store the first data, and sends storage location information of the first data to the second node. The second node obtains the first data from the first node according to the storage location information after receiving a request for querying for the first data, and if the request for querying for the first data is not received subsequently, the operation of obtaining, by the second node, the first data from the first node is not triggered. In this way, network data transmission resources are reduced and storage space is saved.Type: ApplicationFiled: July 11, 2016Publication date: November 3, 2016Inventor: Yuhu Wang
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Patent number: 8779011Abstract: A method for producing and using an ultrapure colloidal silica dispersion is disclosed. The ultrapure colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and less than 2 ppm residual alcohol. The method comprises dissolving a fumed silica in an aqueous solvent comprising an alkali metal hydroxide to produce an alkaline silicate solution, removing the alkali metal via ion exchange to generate a silicic acid solution, adjusting temperature, concentration and pH of said silicic acid solution to values sufficient to initiate nucleation and particle growth, and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion.Type: GrantFiled: February 24, 2012Date of Patent: July 15, 2014Assignee: Fujifilm Planar Solutions, LLCInventors: Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert R. M. Moyaerts, Saeed H. Mohseni, Nichole R. Koontz, Bin Hu, Liqing Wen
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Patent number: 8211193Abstract: A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.Type: GrantFiled: September 22, 2006Date of Patent: July 3, 2012Assignee: Fujifilm Planar Solutions, LLCInventors: Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert R. M. Moyaerts, Saeed H. Mohseni, Nichole R. Koontz, Bin Hu, Liqing Wen
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Publication number: 20120145950Abstract: An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb, of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol. A method for producing and using the same is also disclosed.Type: ApplicationFiled: February 24, 2012Publication date: June 14, 2012Inventors: Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert R.M. Moyaerts, Saeed H. Mohseni, Nichole R. Koontz, Bin Hu, Liqing Wen
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Patent number: 8080231Abstract: The present invention provides nanoporous ?-alumina powders comprising powder comprising interconnected ?-alumina primary particles having an average particle size of less than about 100 nm and an interpenetrated array of pores or voids. The invention also provides nanosized ?-alumina powders comprising ?-alumina particles having an average particle size of less than about 100 nm and slurries, particularly aqueous slurries, which comprise nanosized ?-alumina powders of the invention. The invention further provides methods of manufacturing nanoporous ?-alumina powders and nanosized ?-alumina powders of the invention and methods of polishing using slurries of the invention.Type: GrantFiled: February 2, 2005Date of Patent: December 20, 2011Assignee: Saint-Gobain Ceramics & Plastics, Inc.Inventor: Yuhu Wang
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Patent number: 7638105Abstract: The present invention provides ?-alumina powders comprising ?-alumina particles of which at least 80% of the ?-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise ?-alumina powders of the invention. The invention further provides methods of manufacturing ?-alumina powders and ?-alumina slurries of the invention and methods of polishing using same.Type: GrantFiled: August 13, 2008Date of Patent: December 29, 2009Assignee: Saint-Gobain Ceramics & Plastics, Inc.Inventor: Yuhu Wang
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Publication number: 20080308528Abstract: The present invention provides ?-alumina powders comprising ?-alumina particles of which at least 80% of the ?-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise ?-alumina powders of the invention. The invention further provides methods of manufacturing ?-alumina powders and ?-alumina slurries of the invention and methods of polishing using same.Type: ApplicationFiled: August 13, 2008Publication date: December 18, 2008Inventor: Yuhu Wang
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Patent number: 7422730Abstract: The present invention provides ?-alumina powders comprising ?-alumina particles of which at least 80% of the ?-alumina particles have a particle size of less than 100 nm. The invention also provides slurries, particularly aqueous slurries, which comprise ?-alumina powders of the invention. The invention further provides methods of manufacturing ?-alumina powders and ?-alumina slurries of the invention and methods of polishing using same.Type: GrantFiled: April 2, 2003Date of Patent: September 9, 2008Assignee: Saint-Gobain Ceramics & Plastics, Inc.Inventor: Yuhu Wang
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Publication number: 20080170979Abstract: This patent disclose a method for making ultra pure colloidal silica having metal impurities except potassium of less than about 1 ppm, at a pH of greater than about 6, with an average particle size of less than about 200 nm. Hydrolyzable silanes that can be purified by distillation, or their oligomers, are used as raw materials which are first dissolved in water with organic or inorganic acids. This acidic solution is slowly mixed with a basic solution with or without silicate at a temperature range 50-105° C. to form colloidal silica. The colloidal silica can be further concentrated to higher concentrations, greater than about 20% by evaporation or by ultrafiltration, or a combination thereof.Type: ApplicationFiled: December 27, 2007Publication date: July 17, 2008Applicant: Suzhou Nanodispersions LTDInventors: Yuhu Wang, Ning Zhang
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Publication number: 20070254964Abstract: An ultrapure colloidal silica dispersion comprising colloidal silica particles having a mean or aggregate particle size from about 10 to about 200 nm, wherein the colloidal silica dispersion has less than 200 ppb of each trace metal impurity disposed therein, excluding potassium and sodium, and have less than 2 ppm residual alcohol.Type: ApplicationFiled: June 15, 2007Publication date: November 1, 2007Inventors: Deepak Mahulikar, Yuhu Wang, Ken Delbridge, Gert Moyaerts, Saeed Mohseni, Nichole Koontz, Bin Hu, Liqing Wen
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Publication number: 20070075292Abstract: A method of chemical mechanical polishing a surface of a substrate including the step of: contacting the substrate and a composition including a plurality of colloidal silica particles having less than 200 ppb of each trace metal impurity, excluding potassium and sodium, have less than 2 ppm residual alcohol and wherein the cumulative concentration of the trace metal, excluding potassium and sodium, is in the range from about 0.5 to about 5 ppm; and a medium for suspending the particles; wherein the composition is an ultrapure colloidal silica dispersion; and wherein the contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.Type: ApplicationFiled: September 22, 2006Publication date: April 5, 2007Inventors: Deepak Mahulikar, Yuhu Wang, Ken Delbridge, Gert Moyaerts, Saeed Mohseni, Nichole Koontz, Bin Hu, Liqing Wen
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Publication number: 20060283095Abstract: A method of manufacturing a colloidal silica dispersion, by dissolving a fumed silica in an aqueous solvent having an alkali metal hydroxide to produce an alkaline silicate solution; removing the alkali metal via ion exchange to produce a silicic acid solution; adjusting the temperature, concentration and pH of the silicic acid solution to values sufficient to initiate nucleation and particle growth at elevated temperatures; and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion. The colloidal silica particles in the colloidal silica dispersion have a mean particle size about 2 nm to about 100 nm. Also provided is a method of chemical mechanical polishing a surface of a substrate by contacting the substrate and a composition having a plurality of colloidal silica particles according to the present invention and a medium for suspending the particles. The contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.Type: ApplicationFiled: June 15, 2005Publication date: December 21, 2006Inventors: Deepak Mahulikar, Yuhu Wang