Patents by Inventor Yuichi Hamada

Yuichi Hamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230243858
    Abstract: A sample testing system comprising: a transporting apparatus; a testing apparatus for obtain a sample and performing testing on the obtained sample; and a controller. The controller executes operation of: controlling the transporting apparatus so as to transport the sample rack in first direction, such that each sample container held in a sample rack is transported to a obtaining position on which the testing apparatus obtains a sample and then the sample rack is transported toward the second position; changing, when retesting of a sample contained in a sample container is necessary, the transporting direction from the first direction to second direction, and then controlling the transporting apparatus so as to transport the sample container accommodating the sample, for which retesting is necessary, to the obtaining position again. Sample testing method and a computer program product are also disclosed.
    Type: Application
    Filed: April 7, 2023
    Publication date: August 3, 2023
    Inventors: Yuichi HAMADA, Daigo FUKUMA
  • Patent number: 11635442
    Abstract: A sample testing system comprising: a transporting apparatus; a testing apparatus for obtain a sample and performing testing on the obtained sample; and a controller. The controller executes operation of: controlling the transporting apparatus so as to transport the sample rack in first direction, such that each sample container held in a sample rack is transported to a obtaining position on which the testing apparatus obtains a sample and then the sample rack is transported toward the second position; changing, when retesting of a sample contained in a sample container is necessary, the transporting direction from the first direction to second direction, and then controlling the transporting apparatus so as to transport the sample container accommodating the sample, for which retesting is necessary, to the obtaining position again. Sample testing method and a computer program product are also disclosed.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: April 25, 2023
    Assignee: SYSMEX CORPORATION
    Inventors: Yuichi Hamada, Daigo Fukuma
  • Patent number: 11630115
    Abstract: A sample testing system comprising: a transporting apparatus; a testing apparatus for obtain a sample and performing testing on the obtained sample; and a controller. The controller executes operation of: controlling the transporting apparatus so as to transport the sample rack in first direction, such that each sample container held in a sample rack is transported to a obtaining position on which the testing apparatus obtains a sample and then the sample rack is transported toward the second position; changing, when retesting of a sample contained in a sample container is necessary, the transporting direction from the first direction to second direction, and then controlling the transporting apparatus so as to transport the sample container accommodating the sample, for which retesting is necessary, to the obtaining position again. Sample testing method and a computer program product are also disclosed.
    Type: Grant
    Filed: February 18, 2022
    Date of Patent: April 18, 2023
    Assignee: SYSMEX CORPORATION
    Inventors: Yuichi Hamada, Daigo Fukuma
  • Publication number: 20220390830
    Abstract: A pellicle frame including a frame base having an anodized film on a surface thereof and covered with a transparent polymer film, where the polymer film is formed without color unevenness, is described. The inside surface of the pellicle frame has reduced glare due to particles and has a light resistance to an ArF laser at 1500 J. A method for manufacturing a semiconductor device using a photomask with the pellicle is also described.
    Type: Application
    Filed: August 15, 2022
    Publication date: December 8, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi HAMADA
  • Patent number: 11474427
    Abstract: The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 ?m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.
    Type: Grant
    Filed: April 6, 2021
    Date of Patent: October 18, 2022
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi Hamada
  • Publication number: 20220214611
    Abstract: Provided is a pellicle that can reduce residues stuck onto an exposure original plate when the pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method. A pellicle includes a pellicle film, a pellicle frame provided with the pellicle film on one end face thereof, and an agglutinant layer provided on the other end face of the pellicle frame. When the agglutinant layer of the pellicle is bonded to a quartz mask substrate, then a portion to which the agglutinant layer of the pellicle is bonded is irradiated with 193-nm ultraviolet rays at 10 J/cm2 from a back surface of the substrate, and the pellicle is peeled after the irradiation, an amount of peeling residues of the agglutinant layer remaining on the substrate is 0.5 mg or less.
    Type: Application
    Filed: April 15, 2020
    Publication date: July 7, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuichi Hamada, Akinori Nishimura
  • Publication number: 20220214612
    Abstract: Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method. An agglutinant for pellicles for bonding a pellicle to an exposure original plate, in which the agglutinant includes an acrylic polymer having an SP value of 10.0 or more and 12.0 or less as a base material.
    Type: Application
    Filed: April 15, 2020
    Publication date: July 7, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuichi Hamada, Akinori Nishimura
  • Publication number: 20220214613
    Abstract: Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method. An agglutinant for pellicles for bonding a pellicle to an exposure original plate, the agglutinant comprising a polyvinyl ether compound.
    Type: Application
    Filed: April 15, 2020
    Publication date: July 7, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuichi Hamada, Akinori Nishimura
  • Publication number: 20220170952
    Abstract: A sample testing system comprising: a transporting apparatus; a testing apparatus for obtain a sample and performing testing on the obtained sample; and a controller. The controller executes operation of: controlling the transporting apparatus so as to transport the sample rack in first direction, such that each sample container held in a sample rack is transported to a obtaining position on which the testing apparatus obtains a sample and then the sample rack is transported toward the second position; changing, when retesting of a sample contained in a sample container is necessary, the transporting direction from the first direction to second direction, and then controlling the transporting apparatus so as to transport the sample container accommodating the sample, for which retesting is necessary, to the obtaining position again. Sample testing method and a computer program product are also disclosed.
    Type: Application
    Filed: February 18, 2022
    Publication date: June 2, 2022
    Inventors: Yuichi HAMADA, Daigo Fukuma
  • Publication number: 20220113623
    Abstract: Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after exposure, in particular exposure using ArF as an exposure light source, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method. An agglutinant for pellicles for bonding a pellicle to an exposure original plate, the agglutinant comprising an acrylic polymer as a base material, the acrylic polymer comprising, as monomer components: a (meth)acrylic acid alkyl ester having a C4 or less alkyl group; and a (meth)acrylic acid ester having an ether bond.
    Type: Application
    Filed: October 12, 2021
    Publication date: April 14, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuichi Hamada, Akinori Nishimura
  • Publication number: 20210325413
    Abstract: A sample testing system comprising: a transporting apparatus; a testing apparatus for obtain a sample and performing testing on the obtained sample; and a controller. The controller executes operation of: controlling the transporting apparatus so as to transport the sample rack in first direction, such that each sample container held in a sample rack is transported to a obtaining position on which the testing apparatus obtains a sample and then the sample rack is transported toward the second position; changing, when retesting of a sample contained in a sample container is necessary, the transporting direction from the first direction to second direction, and then controlling the transporting apparatus so as to transport the sample container accommodating the sample, for which retesting is necessary, to the obtaining position again. Sample testing method and a computer program product are also disclosed.
    Type: Application
    Filed: July 1, 2021
    Publication date: October 21, 2021
    Inventors: Yuichi Hamada, Daigo Fukuma
  • Publication number: 20210223684
    Abstract: The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 ?m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.
    Type: Application
    Filed: April 6, 2021
    Publication date: July 22, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi HAMADA
  • Patent number: 11003070
    Abstract: The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 ?m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: May 11, 2021
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi Hamada
  • Patent number: 10962877
    Abstract: To provide a method of separating a pellicle and a device for separating a pellicle which can reduce the amount of residue left on an exposure original plate when the pellicle is separated from the exposure original plate and which can wash again the exposure original plate under mitigated washing conditions, a pellicle frame support pin is inserted into a jig hole provided in an outer surface of the pellicle frame, the pellicle frame support pin is moved in a direction in which the pellicle is separated from the exposure original plate, a separation force applied by the movement to the pellicle frame support pin is measured and the pellicle is separated from the exposure original plate while control is being performed such that the separation force is minimized.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: March 30, 2021
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi Hamada
  • Patent number: 10712658
    Abstract: There is provided a method for procuring an agglutinant structure or in particular an agglutinant layer, from an agglutinant material, which is laid on an end face of a pellicle frame for gluing the pellicle to a photomask, wherein the agglutinant material is processed into the agglutinant layer passing through one more stages wherein the material is under a helium gas atmosphere; the invention is also about a manufacturing method of a pellicle wherein the agglutinant layer is procured in the above described manner.
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: July 14, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuichi Hamada, Yu Yanase
  • Publication number: 20200133116
    Abstract: To provide a method of separating a pellicle and a device for separating a pellicle which can reduce the amount of residue left on an exposure original plate when the pellicle is separated from the exposure original plate and which can wash again the exposure original plate under mitigated washing conditions, a pellicle frame support pin is inserted into a jig hole provided in an outer surface of the pellicle frame, the pellicle frame support pin is moved in a direction in which the pellicle is separated from the exposure original plate, a separation force applied by the movement to the pellicle frame support pin is measured and the pellicle is separated from the exposure original plate while control is being performed such that the separation force is minimized.
    Type: Application
    Filed: October 25, 2019
    Publication date: April 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi HAMADA
  • Patent number: 10622531
    Abstract: A light-emitting device includes a light emitting element having a pad electrode, and a metal member connected to the pad electrode via a wire. The wire has a layered structure including at least a core material containing copper as a main component, an intermediate layer containing palladium as a main component, and a surface layer containing silver as a main component. The intermediate layer is arranged between the core material and the surface layer.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: April 14, 2020
    Assignee: NICHIA CORPORATION
    Inventors: Yasuo Kato, Yuichi Hamada, Kensaku Hamada, Takanori Akaishi
  • Patent number: 10550803
    Abstract: Provided are a filter medium for a filter, which makes it possible to obtain a filter high in collection efficiency, low in pressure loss and long in filter lifetime, a method for producing the same, and a filter using the filter medium for a filter. A filter medium for a filter is used as a constituent member of a filter and composed of a wet type nonwoven fabric, wherein the filter medium for a filter has a multilayer structure of two or more layers, and there is no interface between the above-mentioned two layers.
    Type: Grant
    Filed: September 25, 2012
    Date of Patent: February 4, 2020
    Assignees: TEIJIN FRONTIER CO., LTD., Mahle Filter Systems Japan Corporation
    Inventors: Yuichi Hamada, Mitutosi Suzuki, Hiroyuki Ishii, Kenji Inagaki
  • Publication number: 20190302608
    Abstract: The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 ?m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.
    Type: Application
    Filed: April 1, 2019
    Publication date: October 3, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuichi HAMADA
  • Patent number: 10338465
    Abstract: There is provided a pellicle frame which prevents particles such as carbon black particles or filler particles from contaminating a photomask even when stray light hits the inside face of the pellicle frame in the exposure step of photolithography. More specifically, provided are a pellicle frame including a frame base, and a polymer coating layer coating at least an inner circumferential surface of the frame base, the polymer coating layer including an outermost polymer layer on a side farthest away from the frame base and one or more inner polymer layers between the frame base and the outermost polymer layer, wherein at least one of the one or more inner polymer layers contains particles, and the outermost polymer layer contains no particles or has a particle concentration lower than a highest particle concentration among the one or more inner polymer layers; and a pellicle including the pellicle frame.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: July 2, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Yuichi Hamada