Patents by Inventor Yuichi Hashiguchi

Yuichi Hashiguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7759437
    Abstract: The norbornene derivative of the present invention is represented by the following formula (Im). According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the present invention, further, a norbornene ring-opened (co)polymer having excellent transparency and heat resistance, exhibiting high solubility in organic solvents and having specific birefringence properties and wavelength dependence, and a process for preparing the ring-opened (co)polymer can be provided.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: July 20, 2010
    Assignee: JSR Corporation
    Inventors: Yoshikazu Miyamoto, Nobuyuki Miyaki, Kohei Goto, Yuichi Hashiguchi
  • Publication number: 20090247798
    Abstract: The norbornene derivative of the present invention is represented by the following formula (Im). According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the present invention, further, a norbornene ring-opened (co)polymer having excellent transparency and heat resistance, exhibiting high solubility in organic solvents and having specific birefringence properties and wavelength dependence, and a process for preparing the ring-opened (co)polymer can be provided.
    Type: Application
    Filed: April 1, 2009
    Publication date: October 1, 2009
    Applicant: JSR Corporation
    Inventors: Yoshikazu Miyamoto, Nobuyuki Miyaki, Kohei Goto, Yuichi Hashiguchi
  • Patent number: 7541411
    Abstract: The norbornene derivative of the present invention is represented by the following formula (Im). According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the present invention, further, a norbornene ring-opened (co)polymer having excellent transparency and heat resistance, exhibiting high solubility in organic solvents and having specific birefringence properties and wavelength dependence, and a process for preparing the ring-opened (co)polymer can be provided.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: June 2, 2009
    Assignee: JSR Corporation
    Inventors: Yoshikazu Miyamoto, Nobuyuki Miyaki, Kohei Goto, Yuichi Hashiguchi
  • Patent number: 7449532
    Abstract: A cycloolefin copolymer obtained by ring opening polymerization according to the present invention is characterized by comprising a specific structural unit and exhibiting a single peak in a derivative differential scanning calorimetry curve obtained by differential scanning calorimeter (DSC), having a temperature width of the rising part in the peak of 35° C. or below, and having a glass transition temperature (Tg) of 110° C. or above. The cycloolefin copolymer provided by the present invention has excellent heat resistance and optical properties, is suitable for the formation of a film or sheet therefrom, and can be stretched even at a relatively low temperature around the Tg without causing troubles such as cloudiness. A film or sheet comprising the cycloolefin copolymer, which has excellent optical properties and heat resistance and is also suitable for stretching even at a relatively low temperature, is also provided.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: November 11, 2008
    Assignee: JSR Corporation
    Inventors: Motoki Okaniwa, Ichiro Kajiwara, Yoshimi Suwa, Yoichiro Maruyama, Yuichi Hashiguchi
  • Patent number: 7332254
    Abstract: Disclosed is a positive photosensitive insulating resin composition including: (A) an alkali soluble resin, (B) a compound having a quinonediazide group, and (C) an epoxy resin having a softening point of not lower than 30° C.; and a cured product which is obtained by curing the composition. The cured product obtained by curing the composition is excellent in resolution, electrical insulation, thermal shock resistance and adhesion, and exhibits reduced deformation after post-baking.
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: February 19, 2008
    Assignee: JSR Corporation
    Inventors: Hirofumi Sasaki, Atsushi Ito, Hirofumi Goto, Yuichi Hashiguchi
  • Publication number: 20070179264
    Abstract: A cycloolefin copolymer obtained by ring opening polymerization according to the present invention is characterized by comprising a specific structural unit and exhibiting a single peak in a derivative differential scanning calorimetry curve obtained by differential scanning calorimeter (DSC), having a temperature width of the rising part in the peak of 35° C. or below, and having a glass transition temperature (Tg) of 110° C. or above. The cycloolefin copolymer provided by the present invention has excellent heat resistance and optical properties, is suitable for the formation of a film or sheet therefrom, and can be stretched even at a relatively low temperature around the Tg without causing troubles such as cloudiness. A film or sheet comprising the cycloolefin copolymer, which has excellent optical properties and heat resistance and is also suitable for stretching even at a relatively low temperature, is also provided.
    Type: Application
    Filed: April 20, 2005
    Publication date: August 2, 2007
    Inventors: Motoki Okaniwa, Ichiro Kajiwara, Yoshimi Suwa, Yoichiro Maruyama, Yuichi Hashiguchi
  • Publication number: 20070172604
    Abstract: There is provided by the invention a retardation film stably exhibiting excellent optical properties over a long period of time. The retardation film of the invention is a retardation film comprising (A) a cycloolefin resin and (B) inorganic particles which have a longer diameter and a shorter diameter and exhibit shape anisotropy, a refractive index of which in the longer diameter direction is larger than an average refractive index of which in the direction crossing the longer diameter direction at right angles and which exhibit birefringence, wherein the inorganic particles (B) are orientated and the retardation film has a difference in refractive index between the film plane direction and the film thickness direction.
    Type: Application
    Filed: January 12, 2005
    Publication date: July 26, 2007
    Applicant: JSR Corporation
    Inventors: Naoki Sugiyama, Takuhiro Ushino, Yuichi Hashiguchi, Masayuki Sekiguchi
  • Patent number: 7230058
    Abstract: The disclosure is directed to a partially hydrogenated ring-opened polynorbornene and a process for making the same. The ring-opened polynorbornene is low in birefringence, high in wavelength dependency about birefringence and excellent in transparency and heat resistance.
    Type: Grant
    Filed: February 27, 2006
    Date of Patent: June 12, 2007
    Assignee: JSR Corporation
    Inventors: Nobuyuki Miyaki, Yoshikazu Miyamoto, Souichi Yoshida, Yuichi Hashiguchi
  • Publication number: 20070065747
    Abstract: The norbornene derivative of the present invention is represented by the following formula (Im). According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the present invention, further, a norbornene ring-opened (co)polymer having excellent transparency and heat resistance, exhibiting high solubility in organic solvents and having specific birefringence properties and wavelength dependence, and a process for preparing the ring-opened (co)polymer can be provided.
    Type: Application
    Filed: April 27, 2004
    Publication date: March 22, 2007
    Applicant: JSR Corporation
    Inventors: Yoshikazu Miyamoto, Nobuyuki Miyaki, Kohei Goto, Yuichi Hashiguchi
  • Publication number: 20070042296
    Abstract: Disclosed is a positive photosensitive insulating resin composition including: (A) an alkali soluble resin, (B) a compound having a quinonediazide group, and (C) an epoxy resin having a softening point of not lower than 30° C.; and a cured product which is obtained by curing the composition. The cured product obtained by curing the composition is excellent in resolution, electrical insulation, thermal shock resistance and adhesion, and exhibits reduced deformation after post-baking.
    Type: Application
    Filed: August 18, 2006
    Publication date: February 22, 2007
    Applicant: JSR Corporation
    Inventors: Hirofumi Sasaki, Atsushi Ito, Hirofumi Goto, Yuichi Hashiguchi
  • Patent number: 7157523
    Abstract: The disclosure is directed to a partially hydrogenated ring-opened polynorbornene and a process for making the same. The ring-opened polynorbornene is low in birefringence, high in wavelength dependency about birefringence and excellent in transparency and heat resistance.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: January 2, 2007
    Assignee: JSR Corporation
    Inventors: Nobuyuki Miyaki, Yoshikazu Miyamoto, Souichi Yoshida, Yuichi Hashiguchi
  • Publication number: 20060189771
    Abstract: The invention provides a ring-opened norbornene polymer that is relatively small in birefringence, has specific wavelength dependency about birefringence and is excellent in transparency and heat resistance.
    Type: Application
    Filed: February 27, 2006
    Publication date: August 24, 2006
    Applicant: JSR Corporation
    Inventors: Nobuyuki Miyaki, Yoshikazu Miyamoto, Souichi Yoshida, Yuichi Hashiguchi
  • Publication number: 20060041092
    Abstract: The invention provides a ring-opened polynorbornene that is relatively low in birefringence, has specific wavelength dependency about birefringence and is excellent in transparency and heat resistance.
    Type: Application
    Filed: November 12, 2003
    Publication date: February 23, 2006
    Applicant: JSR Corporation
    Inventors: Nobuyuki Miyaki, Yoshikazu Miyamoto, Souichi Yoshida, Yuichi Hashiguchi
  • Patent number: 6756124
    Abstract: A coating composition excellent in dispersion stability of a photocatalyst even in a highly hydrophobic alcohol, excellent in storage stability, giving a coating layer excellent in durability and adhesion, and having a photocatalytic function, which comprises (a) at least one component selected from the group consisting of an organosilane represented by (R1)nSi (OR2)4-n (wherein, R1 represents a monovalent organic group; R2 represents an alkyl group or an acyl group; and n is an integer ranging from 0 to 2), a hydrolyzate and a condensates thereof; (b) an organosiloxane oligomer having an SiO bond and a specific Mw; (c) a photocatalyst; and (d-1) an organic solvent having a surface tension at 20° C. of 260 &mgr;N/cm or less.
    Type: Grant
    Filed: April 13, 2001
    Date of Patent: June 29, 2004
    Assignee: JSR Corporation
    Inventors: Tarou Kanamori, Miwa Honda, Kouji Kawahara, Yuichi Hashiguchi
  • Patent number: 6737169
    Abstract: A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: May 18, 2004
    Assignee: JSR Corporation
    Inventors: Mibuko Shimada, Nakaatsu Yoshimura, Yuichi Hashiguchi
  • Patent number: 6485838
    Abstract: A coated film and a coated glass improved in the resistance to fouling derived from water and oil repellency, and in the durability, the abrasion resistance, and the exfoliation of stacked outer layer, are provided by a specific coating composition having at least one component (a) selected from organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes, and component (b) containing a silyl group wherein one of silicon atoms bonded with a hydrolytic group and/or a hydroxy group.
    Type: Grant
    Filed: May 18, 2000
    Date of Patent: November 26, 2002
    Assignee: JSR Corporation
    Inventors: Mibuko Shimada, Toshinori Sakagami, Yuichi Hashiguchi, Hiroshi Shiho
  • Publication number: 20020146573
    Abstract: A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.
    Type: Application
    Filed: January 30, 2002
    Publication date: October 10, 2002
    Applicant: JSR CORPORATION
    Inventors: Mibuko Shimada, Nakaatsu Yoshimura, Yuichi Hashiguchi
  • Publication number: 20020051889
    Abstract: A coating composition excellent in storage stability, excellent in coating appearance, adhesion and weather resistance, high in hardness, having ultraviolet absorbing ability, and capable of preventing deterioration of a ground or a substrate, which comprises (A) a polymer containing (a1) a silyl group having a silicon atom bound to a hydrolytic group and/or a hydroxyl group, (a2) a group having ultraviolet absorbing ability and (a3) a group having ultraviolet stability in the same polymer chain, and further optionally comprises (B) at least one component selected from the group consisting of an organosilane represented by (R1)nSi(OR2)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane; and a cured product thereof.
    Type: Application
    Filed: April 2, 2001
    Publication date: May 2, 2002
    Applicant: JSR CORPORATION
    Inventors: Tarou Kanamori, Kouji Kawahara, Yuichi Hashiguchi
  • Publication number: 20020007006
    Abstract: A coating composition excellent in dispersion stability of a photocatalyst even in a highly hydrophobic alcohol, excellent in storage stability, giving a coating layer excellent in durability and adhesion, and having a photocatalytic function, which comprises (a) at least one component selected from the group consisting of an organosilane represented by (R1)nSi (OR2)4-n (wherein, R1 represents a monovalent organic group; R2 represents an alkyl group or an acyl group; and n is an integer ranging fram 0 to 2), a hydrolyzate and a condensates thereof; (b) an organosiloxane oligomer having an SiO bond and a specific Mw; (c) a photocatalyst: and (d-1) an organic solvent having a surface tension at 20° C. of 260 &mgr;N/cm or less.
    Type: Application
    Filed: April 13, 2001
    Publication date: January 17, 2002
    Applicant: JSR CORPORATION
    Inventors: Tarou Kanamori, Miwa Honda, Kouji Kawahara, Yuichi Hashiguchi
  • Patent number: 6271326
    Abstract: An olefin polymer and a curable resin composition which can form cure coatings with excellent transparency, low reflectance, and high scratch resistance, an antireflection film exhibiting excellent transparency, low reflectance, and high scratch resistance are disclosed. The olefin polymer comprises a polysiloxane segment in the main chain, has 30 wt % or more fluorine content, and has a polystyrene-reduced number average molecular weight of 5,000 or more. The curable resin composition comprises the olefin polymer. The antireflection film is made from the cured product of the curable resin composition.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: August 7, 2001
    Assignee: JSR Corporation
    Inventors: Akira Nishikawa, Fusaka Watanabe, Yuichi Hashiguchi, Hozumi Sato