Patents by Inventor Yuichi Katayose

Yuichi Katayose has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing polyarylene sulfide, and polyarylene
    Patent number: 10556992
    Abstract: To provide a method of manufacturing polyarylene sulfide (PAS) while efficiently recovering an organic amide solvent at a low energy cost, without using an organic solvent, from washing wastewater produced by washing a raw material mixture containing PAS and an organic amide solvent using a solvent containing water; a method of manufacturing PAS by reducing the amount of water supplied when washing the raw material mixture using a solvent containing water; and PAS manufactured by these methods.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: February 11, 2020
    Assignee: KUREHA CORPORATION
    Inventors: Michihisa Miyahara, Kenji Suzuki, Yuichi Katayose, Takayuki Kimura
  • METHOD OF MANUFACTURING POLYARYLENE SULFIDE, AND POLYARYLENE
    Publication number: 20190135982
    Abstract: To provide a method of manufacturing polyarylene sulfide (PAS) while efficiently recovering an organic amide solvent at a low energy cost, without using an organic solvent, from washing wastewater produced by washing a raw material mixture containing PAS and an organic amide solvent using a solvent containing water; a method of manufacturing PAS by reducing the amount of water supplied when washing the raw material mixture using a solvent containing water; and PAS manufactured by these methods.
    Type: Application
    Filed: December 28, 2018
    Publication date: May 9, 2019
    Inventors: Michihisa MIYAHARA, Kenji SUZUKI, Yuichi KATAYOSE, Takayuki KIMURA
  • METHOD OF MANUFACTURING POLYARYLENE SULFIDE, AND POLYARYLENE SULFIDE
    Publication number: 20180171079
    Abstract: To provide a method of manufacturing polyarylene sulfide (PAS) while efficiently recovering an organic amide solvent at a low energy cost, without using an organic solvent, from washing wastewater produced by washing a raw material mixture containing PAS and an organic amide solvent using a solvent containing water; a method of manufacturing PAS by reducing the amount of water supplied when washing the raw material mixture using a solvent containing water; and PAS manufactured by these methods.
    Type: Application
    Filed: May 9, 2016
    Publication date: June 21, 2018
    Inventors: MICHIHISA MIYAHARA, KENJI SUZUKI, YUICHI KATAYOSE, TAKAYUKI KIMURA
  • Plant photoperiod sensitivity gene and use of the same
    Patent number: 7253339
    Abstract: A rice photosensitivity gene Hd1 is successfully isolated by linkage analysis. It is found out that the photosensitivity of a plant can be modified by transferring this gene or controlling the expression thereof. It is further found out that the photosensitivity of a plant can be evaluated by examining the presence/absence of this functional gene.
    Type: Grant
    Filed: November 1, 2000
    Date of Patent: August 7, 2007
    Assignees: National Institute of Agrobiological Sciences, Society for Techno-Innovation of Agriculture, Forestry and Fisheries, National Agriculture and Bio-Oriented Research Organization
    Inventors: Masahiro Yano, Yuichi Katayose, Takuji Sasaki, Risa Ishimaru, Takuichi Fuse, Motoyuki Ashikari
  • Rice gene resistant to blast disease
    Patent number: 6274789
    Abstract: A blast disease-resistance gene (Pi-b), a functionally equivalent gene thereof and proteins encoded by the genes are provided. The gene is useful for creating a plant resistant to the blast disease and can confer a resistance to a broad range of the rice blast fungi on plants. Therefore, it is useful for controlling the disease and increasing crop yields.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: August 14, 2001
    Assignee: Society for Techno-Innovation of Agriculture, Forestry and Fisheries
    Inventors: Masahiro Yano, Masao Iwamoto, Yuichi Katayose, Takuji Sasaki, Zi-Xuan Wang, Utako Yamanouchi, Lisa Ishimaru