Patents by Inventor Yuichi Kawano
Yuichi Kawano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240151166Abstract: A decompression device is attached to an exhaust camshaft, and the exhaust camshaft is supported by a cylinder head. The decompression device includes a decompression camshaft formed with a decompression cam that can protrude and be immersed with respect to a base circle of an exhaust cam of the exhaust camshaft, a decompression arm that moves in an opening direction due to centrifugal force accompanying rotation of the exhaust camshaft to protrude the decompression cam, and a spring that moves the decompression arm in a closing direction by spring force resisting the centrifugal force to immerse the decompression cam. In the decompression device, the opening direction of the decompression arm can be changed in a same direction or in an opposite direction to a rotation direction of the exhaust camshaft for each cylinder.Type: ApplicationFiled: October 6, 2023Publication date: May 9, 2024Applicant: SUZUKI MOTOR CORPORATIONInventors: Yuichi KAWANO, Hidekuni OTA, Shintaro ISHIDA
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Publication number: 20240145929Abstract: A frequency selective reflector including a reflecting member reflecting the electromagnetic waves; and a dielectric layer that: is disposed at an incident side of the electromagnetic waves with respect to the reflecting member; includes a concave and convex structure in which a plurality of a unit structure including a thickness distribution of increasing thickness in a predetermined direction is arranged; and transmits the electromagnetic waves, wherein the unit structure of the dielectric layer includes a plurality of cell regions of which thickness differs from one another; the dielectric layer includes, as the unit structure, at least a first unit structure including three or more of the cell regions of which thickness differs from one another; and a reflection direction of the electromagnetic waves is controlled by controlling a relative reflection phase distribution of the electromagnetic waves by the thickness distribution of the dielectric layer.Type: ApplicationFiled: March 4, 2022Publication date: May 2, 2024Applicant: DAI NIPPON PRINTING CO., LTDInventors: Yuichi MIYAZAKI, Hiroyuki ASAKURA, Atsuo NAKAMURA, Takeshi SEKIGUCHI, Shigeki KAWANO
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Patent number: 10192755Abstract: The present invention makes it possible to improve the reliability of a semiconductor device. The semiconductor device has, over a semiconductor substrate, a pad electrode formed at the uppermost layer of a plurality of wiring layers, a surface protective film having an opening over the pad electrode, a redistribution line being formed over the surface protective film and having an upper surface and a side surface, a sidewall barrier film comprising an insulating film covering the side surface and exposing the upper surface of the redistribution line, and a cap metallic film covering the upper surface of the redistribution line. Then the upper surface and side surface of the redistribution line are covered with the cap metallic film or the sidewall barrier film and the cap metallic film and the sidewall barrier film have an overlapping section.Type: GrantFiled: March 8, 2018Date of Patent: January 29, 2019Assignee: Renesas Electronics CorporationInventors: Masahiro Matsumoto, Kazuyoshi Maekawa, Yuichi Kawano
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Patent number: 10083924Abstract: A semiconductor device includes: a pad electrode 9a formed in an uppermost layer of a plurality of wiring layers; a base insulating film 11 having an opening 11a on the pad electrode 9a; a base metal film UM formed on the base insulating film 11; a redistribution line RM formed on the base metal film UM; and a cap metal film CM formed so as to cover an upper surface and a side surface of the redistribution line RM. In addition, in a region outside the redistribution line RM, the base metal film UM made of a material different from that of the redistribution line RM and the cap metal film CM made of a material different from the redistribution line RM are formed between the cap metal film CM formed on the side surface of the redistribution line RM and the base insulating film 11, and the base metal film UM and the cap metal film CM are in direct contact with each other in the region outside the redistribution line RM.Type: GrantFiled: November 13, 2014Date of Patent: September 25, 2018Assignee: Renesas Electronics CorporationInventors: Kazuyoshi Maekawa, Yuichi Kawano
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Publication number: 20180197753Abstract: The present invention makes it possible to improve the reliability of a semiconductor device. The semiconductor device has, over a semiconductor substrate, a pad electrode formed at the uppermost layer of a plurality of wiring layers, a surface protective film having an opening over the pad electrode, a redistribution line being formed over the surface protective film and having an upper surface and a side surface, a sidewall barrier film comprising an insulating film covering the side surface and exposing the upper surface of the redistribution line, and a cap metallic film covering the upper surface of the redistribution line. Then the upper surface and side surface of the redistribution line are covered with the cap metallic film or the sidewall barrier film and the cap metallic film and the sidewall barrier film have an overlapping section.Type: ApplicationFiled: March 8, 2018Publication date: July 12, 2018Inventors: Masahiro MATSUMOTO, Kazuyoshi MAEKAWA, Yuichi KAWANO
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Patent number: 9972505Abstract: The present invention makes it possible to improve the reliability of a semiconductor device. The semiconductor device has, over a semiconductor substrate, a pad electrode formed at the uppermost layer of a plurality of wiring layers, a surface protective film having an opening over the pad electrode, a redistribution line being formed over the surface protective film and having an upper surface and a side surface, a sidewall barrier film comprising an insulating film covering the side surface and exposing the upper surface of the redistribution line, and a cap metallic film covering the upper surface of the redistribution line. Then the upper surface and side surface of the redistribution line are covered with the cap metallic film or the sidewall barrier film and the cap metallic film and the sidewall barrier film have an overlapping section.Type: GrantFiled: November 17, 2015Date of Patent: May 15, 2018Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Masahiro Matsumoto, Kazuyoshi Maekawa, Yuichi Kawano
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Patent number: 9885400Abstract: There is provided a balancer device of an engine, configured to reduce rotation vibrations of the engine. A crankshaft is provided with a primary drive gear. A countershaft is provided with a primary driven gear meshed with the primary drive gear. A plurality of balancer shafts are provided with balancer driven gears meshed with the primary drive gear.Type: GrantFiled: October 14, 2016Date of Patent: February 6, 2018Assignee: SUZUKI MOTOR CORPORATIONInventors: Hiroki Yamauchi, Yuichi Kawano, Shintaro Yagi
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Publication number: 20170114860Abstract: There is provided a balancer device of an engine, configured to reduce rotation vibrations of the engine. A crankshaft is provided with a primary drive gear. A countershaft is provided with a primary driven gear meshed with the primary drive gear. A plurality of balancer shafts are provided with balancer driven gears meshed with the primary drive gear.Type: ApplicationFiled: October 14, 2016Publication date: April 27, 2017Applicant: SUZUKI MOTOR CORPORATIONInventors: Hiroki YAMAUCHI, Yuichi KAWANO, Shintaro YAGI
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Publication number: 20160379946Abstract: A semiconductor device includes: a pad electrode 9a formed in an uppermost layer of a plurality of wiring layers; a base insulating film 11 having an opening 11a on the pad electrode 9a; a base metal film UM formed on the base insulating film 11; a redistribution line RM formed on the base metal film UM; and a cap metal film CM formed so as to cover an upper surface and a side surface of the redistribution line RM. In addition, in a region outside the redistribution line RM, the base metal film UM made of a material different from that of the redistribution line RM and the cap metal film CM made of a material different from the redistribution line RM are formed between the cap metal film CM formed on the side surface of the redistribution line RM and the base insulating film 11, and the base metal film UM and the cap metal film CM are in direct contact with each other in the region outside the redistribution line RM.Type: ApplicationFiled: November 13, 2014Publication date: December 29, 2016Inventors: Kazuyoshi MAEKAWA, Yuichi KAWANO
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Publication number: 20160181184Abstract: The present invention makes it possible to improve the reliability of a semiconductor device. The semiconductor device has, over a semiconductor substrate, a pad electrode formed at the uppermost layer of a plurality of wiring layers, a surface protective film having an opening over the pad electrode, a redistribution line being formed over the surface protective film and having an upper surface and a side surface, a sidewall barrier film comprising an insulating film covering the side surface and exposing the upper surface of the redistribution line, and a cap metallic film covering the upper surface of the redistribution line. Then the upper surface and side surface of the redistribution line are covered with the cap metallic film or the sidewall barrier film and the cap metallic film and the sidewall barrier film have an overlapping section.Type: ApplicationFiled: November 17, 2015Publication date: June 23, 2016Inventors: Masahiro MATSUMOTO, Kazuyoshi MAEKAWA, Yuichi KAWANO
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Patent number: 8960124Abstract: Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber (11), the inner cylinder (15) composed of a surface-alumited aluminum, disposes a substrate in a plasma diffusion region, and performs plasma processing. A plurality of protruding portions (15a) in point-contact with the vacuum chamber (11) are provided on the lower end portion of the inner cylinder (15), the alumite film (16) on the leading end portion (15b) of each of the protruding portion (15a) is removed, and the inner cylinder and the vacuum chamber (11) are electrically connected to each other.Type: GrantFiled: May 24, 2010Date of Patent: February 24, 2015Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Ryuichi Matsuda, Kazuto Yoshida, Yuichi Kawano
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Patent number: 8686538Abstract: In order to improve the reliability of a semiconductor device having a fuse formed by a Damascene technique, a barrier insulating film and an inter-layer insulating film are deposited over a fourth-layer wiring and a fuse. The barrier insulating film is an insulating film for preventing the diffusion of Cu and composed of a SiCN film deposited by plasma CVD like the underlying barrier insulating film. The thickness of the barrier insulating film covering the fuse is larger than the thickness of the underlying barrier insulating film so as to improve the moisture resistance of the fuse.Type: GrantFiled: August 28, 2012Date of Patent: April 1, 2014Assignee: Renesas Electronics CorporationInventors: Katsuhiko Hotta, Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano
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Patent number: 8337960Abstract: A seasoning method for a film-forming apparatus configured to form a silicon nitride film on a substrate placed in a process chamber. The method is conducted for reducing particles in the apparatus. The method comprises executing the plasma cleaning of the process chamber to remove a film deposited on the inner wall thereof (step S1), subsequently depositing an amorphous silicon film (step S2), depositing thereon a silicon nitride film in which the nitrogen content gradually increases in the thickness direction (step S3), and keeping the inside of the process chamber being filled with a rare-gas plasma until film formation on the substrate is initiated (step S4).Type: GrantFiled: February 19, 2007Date of Patent: December 25, 2012Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Tadashi Shimazu, Yuichi Kawano
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Publication number: 20120319235Abstract: In order to improve the reliability of a semiconductor device having a fuse formed by a Damascene technique, a barrier insulating film and an inter-layer insulating film are deposited over a fourth-layer wiring and a fuse. The barrier insulating film is an insulating film for preventing the diffusion of Cu and composed of a SiCN film deposited by plasma CVD like the underlying barrier insulating film. The thickness of the barrier insulating film covering the fuse is larger than the thickness of the underlying barrier insulating film so as to improve the moisture resistance of the fuse.Type: ApplicationFiled: August 28, 2012Publication date: December 20, 2012Inventors: Katsuhiko Hotta, Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano
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Patent number: 8269309Abstract: In order to improve the reliability of a semiconductor device having a fuse formed by a Damascene technique, a barrier insulating film and an inter-layer insulating film are deposited over a fourth-layer wiring and a fuse. The barrier insulating film is an insulating film for preventing the diffusion of Cu and composed of a SiCN film deposited by plasma CVD like the underlying barrier insulating film. The thickness of the barrier insulating film covering the fuse is larger than the thickness of the underlying barrier insulating film so as to improve the moisture resistance of the fuse.Type: GrantFiled: March 25, 2011Date of Patent: September 18, 2012Assignee: Renesas Electronics CorporationInventors: Katsuhiko Hotta, Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano
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Publication number: 20120125891Abstract: Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber (11), the inner cylinder (15) composed of a surface-alumited aluminum, disposes a substrate in a plasma diffusion region, and performs plasma processing. A plurality of protruding portions (15a) in point-contact with the vacuum chamber (11) are provided on the lower end portion of the inner cylinder (15), the alumite film (16) on the leading end portion (15b) of each of the protruding portion (15a) is removed, and the inner cylinder and the vacuum chamber (11) are electrically connected to each other.Type: ApplicationFiled: May 24, 2010Publication date: May 24, 2012Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Ryuichi Matsuda, Kazuto Yoshida, Yuichi Kawano
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Publication number: 20110169128Abstract: In order to improve the reliability of a semiconductor device having a fuse formed by a Damascene technique, a barrier insulating film and an inter-layer insulating film are deposited over a fourth-layer wiring and a fuse. The barrier insulating film is an insulating film for preventing the diffusion of Cu and composed of a SiCN film deposited by plasma CVD like the underlying barrier insulating film. The thickness of the barrier insulating film covering the fuse is larger than the thickness of the underlying barrier insulating film so as to improve the moisture resistance of the fuse.Type: ApplicationFiled: March 25, 2011Publication date: July 14, 2011Inventors: KATSUHIKO HOTTA, Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano
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Patent number: 7972946Abstract: Provided are a plasma treatment method and a plasma treatment device capable of forming a silicon nitride film having high compressive stress. In the plasma treatment method for depositing the silicon nitride film on a process target substrate by use of plasma of raw material gas containing silicon and hydrogen and of nitrogen gas, ion energy for disconnecting nitrogen-hydrogen bonding representing a state of bonding between the hydrogen in the raw material gas and the nitrogen gas is applied to the process target substrate so as to reduce an amount of nitrogen-hydrogen bonding contained in the silicon nitride film.Type: GrantFiled: July 24, 2007Date of Patent: July 5, 2011Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Tadashi Shimazu, Masahiko Inoue, Toshihiko Nishimori, Yuichi Kawano
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Patent number: 7968966Abstract: In order to improve the reliability of a semiconductor device having a fuse formed by a Damascene technique, a barrier insulating film and an inter-layer insulating film are deposited over a fourth-layer wiring and a fuse. The barrier insulating film is an insulating film for preventing the diffusion of Cu and composed of a SiCN film deposited by plasma CVD like the underlying barrier insulating film. The thickness of the barrier insulating film covering the fuse is larger than the thickness of the underlying barrier insulating film so as to improve the moisture resistance of the fuse.Type: GrantFiled: September 21, 2009Date of Patent: June 28, 2011Assignee: Renesas Electronics CorporationInventors: Katsuhiko Hotta, Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano
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Publication number: 20100323975Abstract: A therapeutic agent for cerebral ischemic injury contains at least one selected from L-alanyl-L-histidine and glycyl-L-histidine as an active ingredient. The therapeutic agent for cerebral ischemic injury preferably has a dosage form as an injection for intravenous administration. The therapeutic agent for cerebral ischemic injury having a dosage form as an aqueous injection contains at least one selected from L-alanyl-L-histidine and glycyl-L-histidine at a concentration of preferably 0.3 to 3.5 mol/L, and more preferably 0.6 to 2.1 mol/L.Type: ApplicationFiled: December 25, 2008Publication date: December 23, 2010Applicant: OTSUKA PHARMACEUTICAL FACTORY, INC.Inventors: Yuichi Kawano, Kazuhisa Doi, Takuya Nii