Abstract: The piezoelectric device comprises a piezoelectric vibrating piece having a base portion, a pair of vibrating arms extending in a specified direction from the base portion, and a pair of connection portions disposed on the pair of the supporting arms; a package having a bottom surface which accommodates the piezoelectric vibrating piece and side faces surrounding the bottom surface, in which a pair of electrode pads corresponding to the connection portions are formed on the bottom surface; and adhesive for bonding the pair of the electrode pads with the pair of connection portions. One electrode pad and the other electrode pad, with adhesive applied to the electrode pads, are shifted with respect to each other in a predetermined direction.

Abstract: The piezoelectric devices allow outside-in adjustment of their vibration frequency. An exemplary piezoelectric device includes a tuning-fork type piezoelectric vibrating piece mounted inside a package. The vibrating piece has a base fabricated of a piezoelectric material, a pair of vibrating arms extending parallel from the base in a predetermined direction, and a frequency-adjustment unit situated on the distal ends of the vibrating arms. The package includes first metal films on the inner main surface thereof where an external laser beam can be irradiated. The frequency-adjustment unit includes a transparent region extending in a predetermined direction, allowing the laser beam, passing through the lid of the package, to be incident on second metal films by passing through the transparent regions. The laser beam also can be incident on first metal films without also being incident on the second metal films, by passing through the lid but not through the transparent regions.

Abstract: A charged-particle beam lithographic method is implemented by irradiating resist applied on a material surface with successive shots of a variably shaped charged-particle beam. A table is drawn up which indicates the relations of the distances of each shot of interest to adjacent shots to corresponding amounts of correction applied to sides of the shot of interest taking account of the influence of forward scattering. Corrective shot data is found from the table by translating the sides of the shot of interest located opposite to the adjacent shots. Corrective values for a proximity effect produced under the influence of backward scattering are calculated based on the corrective shot data. The shots of the beam are carried out based on the corrective shot data and on the corrective values.

Abstract: Piezoelectric devices are disclosed that allow outside-in adjustment of vibration frequency produced by the devices. I.e., the vibration frequency can be increased or reduced. An exemplary piezoelectric device includes a tuning-fork type piezoelectric vibrating piece mounted inside a package. The vibrating piece has a base fabricated of a piezoelectric material, a pair of vibrating arms extending parallel from the base in a predetermined direction, and a frequency-adjustment unit situated on the distal ends of the vibrating arms. The package includes first metal films disposed on the inner main surface of the package at a location where a beam from an external laser can be irradiated. The frequency adjustment unit includes a transparent region that extends in a predetermined direction for allowing the laser beam, passing through the lid of the package, to be incident on second metal films by passing through the transparent regions.

Abstract: The piezoelectric device comprises a piezoelectric vibrating piece having a base portion, a pair of vibrating arms extending in a specified direction from the base portion, and a pair of connection portions disposed on the pair of the supporting arms; a package having a bottom surface which accommodates the piezoelectric vibrating piece and side faces surrounding the bottom surface, in which a pair of electrode pads corresponding to the connection portions are formed on the bottom surface; and adhesive for bonding the pair of the electrode pads with the pair of connection portions. One electrode pad and the other electrode pad, with adhesive applied to the electrode pads, are shifted with respect to each other in a predetermined direction.

Abstract: A method of delineating a lithographic pattern on a material. A pattern to be delineated is divided according to first and second fields by first and second methods of division. Pattern segments contained in the first fields are divided in the X-direction, and data about the resulting pattern subsegments is obtained. Pattern segments contained in the second fields are divided in the Y-direction, and data about the resulting pattern subsegments is obtained. The two methods are so carried out that a pattern segment located across a field boundary during implementation of one of the two methods of division is located around the center of a field during implementation of the other method. In each field, the pattern segments obtained by the X division and Y division, respectively, are overlapped and written with a half of the dose normally used.

Abstract: Charged-particle beam lithography method and system. The lithography system has a map creation unit and a lithographic data creation unit. The map creation unit creates a proximity effect correction amount map from pattern data supplied from a pattern data file, pattern layout information, a foggy error correction amount map, loading effect correction amount maps, a process error correction amount map, a transfer error correction amount map, proximity effect correction parameters, and a proximity effect correction map. The lithographic data creation unit creates lithographic data based on the pattern data from the pattern data file, creates shot time data based on the proximity effect correction amount map from the map creation unit, and attaches the created shot time data to the lithographic data.

Abstract: A method of delineating a lithographic pattern on a material. A pattern to be delineated is divided according to first and second fields by first and second methods of division. Pattern segments contained in the first fields are divided in the X-direction, and data about the resulting pattern subsegments is obtained. Pattern segments contained in the second fields are divided in the Y-direction, and data about the resulting pattern subsegments is obtained. The two methods are so carried out that a pattern segment located across a field boundary during implementation of one of the two methods of division is located around the center of a field during implementation of the other method. In each field, the pattern segments obtained by the X division and Y division, respectively, are overlapped and written with a half of the dose normally used.

Abstract: The face washing puff of the invention is constructed in the form of a bag body (2) so that it can be used by inserting fingers in its opening (1). A double-faced pile fabric (3) is used on the working surface and this double-faced pile fabric (3) has a dense cut pile (4) on one surface and a loop pile (5) on the other surface. Since the arrangement is such that the cut pile (4) is positioned on the outer side of the bag body (2), the front end of the cut pile (40 is applied to the skin; thus, it can be used conveniently and provides an effective cleaning effect.