Abstract: To provide a solar cell module excellent in processability at the time of production, a method for producing it, and a building exterior wall material using it.

Abstract: To provide a solar cell module excellent in design property and weather resistance, a method for producing it, and a building exterior wall material using it. The solar cell module of the present invention comprises, from the light-receiving surface side of the solar cell module, a cover glass, a first encapsulant layer, a design layer, a second encapsulant layer and solar cells in this order, the first encapsulant layer contains an ultraviolet absorber, the first encapsulant layer has a thickness of from 50 to 2,000 ?m, and the design layer contains a fluororesin.

Abstract: A plasma processing apparatus includes a processing vessel, an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof, a structure holding ring that is fixed around the upper structure, an arm that supports the ring and is movable up and down, a screw (including a bolt) that is fixed to one of the ring and the arm, and has a tip end abutting the other, and a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring.

Abstract: To provide a colored optical layer capable of forming a solar cell module excellent in the design, and the power generation efficiency and the weather resistance, a method for producing an optical layer, an optical layer-provided solar cell module, an outer wall material for building, and a building. An optical layer having a functional layer containing an inorganic pigment and a matrix in which the inorganic pigment is dispersed, to be disposed on the side of plane of incidence of sunlight from solar cells, wherein at least a part of the inorganic pigment is an inorganic pigment having a maximum near infrared reflectance in a near infrared region at a wavelength of from 780 to 1,500 nm of at least 50%, an average particle size of from 5.0 to 280.0 nm and a specific surface area of from 5.0 to 1,000 m2/g.

Abstract: A plasma generation unit according to an exemplary embodiment includes a dielectric window, a slot plate, and a probe group. The slot plate is provided on the dielectric window. The probe group includes a plurality of probes that are electric conductors, is provided in the dielectric window, and is used for detection of a physical quantity around the dielectric window. The dielectric window extends along the slot plate. Each of the plurality of probes is disposed on a circumference of a first circle centered on a reference position of the dielectric window, when viewed from above the dielectric window.

Abstract: A plasma processing apparatus includes a processing vessel, an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof, a structure holding ring that is fixed around the upper structure, an arm that supports the ring and is movable up and down, a screw (including a bolt) that is fixed to one of the ring and the arm, and has a tip end abutting the other, and a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring.

Abstract: A transparent substrate with non-transparent film includes a transparent substrate; and a non-transparent film formed on the transparent substrate. The non-transparent film includes first projections, each having a diameter of greater than 10 ?m, in a cross section, at a height of 0.05 ?m plus a bearing height of a surface shape obtained by measuring a region of (101-111 ?m)×(135-148 ?m); and second projections, each having a diameter of 1-10 ?m or less, in a cross section, at a height of 0.5 ?m plus the bearing height of the surface shape. A maximum height of each of the first projections, with reference to a height at a lowest part in the region, is 8.0-30.0 ?m. A number of the second projections is 0.001-0.05 per 1 ?m2, and an average height of the second projections, with reference to the bearing height, is 1.50-5.00 ?m.

Abstract: The present invention relates to a light diffusion plate including a glass plate having a first main surface and a second main surface opposed to the first main surface, in which the glass plate has a thermal expansion coefficient of ?100×10?7/° C. or more and 500×10?7/° C. or less, and light incident on the first main surface is transmitted from the second main surface while being diffused.

Abstract: To provide a method whereby a low reflective glass member can be produced efficiently at low cost, and a low reflective glass member. The method for producing a low reflective glass member (10) comprises immersing a glass substrate (12) made of borosilicate glass in an aqueous potassium hydrogencarbonate solution, to form a porous layer (14) at the surface of the glass substrate (12), wherein the temperature of the aqueous potassium hydrogencarbonate solution is preferably from 30 to 90° C., the time for immersing the glass substrate (12) in the aqueous potassium hydrogencarbonate solution is preferably from 0.5 to 24 hours, and the thickness of the porous layer (14) is preferably from 10 to 100,000 nm.

Abstract: The invention relates to a process for producing a glass sheet provided with an enamel-based coating, comprising the step of applying to a glass sheet a liquid composition containing (i) a hydrolysate of at least one metal alkoxide, (ii) a solvent which has a boiling point of at least 180° C., and (iii) a glass frit; the temperature of the glass sheet when the liquid composition is applied being of at least 300° C. The process of the invention allows on-line enamelling of a glass sheet, getting a good adhesion of the enamel on the glass sheet. Moreover, the obtained enamelled glass sheet is temperable.

Abstract: A glass substrate for chemical strengthening is formed by a float process. The glass substrate includes at least one layer of a film formed of an inorganic material that contains H atoms in a concentration of 1.0×1015 to 1.0×1019 atom/mm3. The at least one layer is formed on at least one surface of the glass substrate.

Abstract: A process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane having an exothermic peak temperature of at most 500° C. and inorganic fine particles to a glass substrate within a temperature range of from 400 to 650° C., or a process for producing a glass substrate, comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane having an exothermic peak temperature of at most 500° C. and inorganic fine particles is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650° C.

Abstract: A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane and an organic aluminum complex to a glass substrate within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass substrate, and a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane and an organic aluminum complex is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650° C. to form an aluminum oxide-containing silicon oxide film on the glass ribbon.

Abstract: To provide a process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, wherein inorganic fine particles having a desired particle size may be used depending on intended optical properties, and the range of selection of the inorganic fine particles is wide.

Abstract: A glass substrate for chemical strengthening is formed by a float process. The glass substrate includes at least one layer of a film formed of an inorganic material that contains H atoms in a concentration of 1.0×1015 to 1.0×1019 atom/mm3. The at least one layer is formed on at least one surface of the glass substrate.