Patents by Inventor Yuichi Mimura
Yuichi Mimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12077196Abstract: A variable-gauge train control apparatus includes an inverter that collectively controls the torque of main motors; and a voltage control unit that controls an output voltage of the inverter. When at least one of axles to be driven by the main motors is within the gauge conversion section and at least one of the axles is located outside the gauge conversion section, the voltage control unit treats, as a reference frequency, a value obtained by conversion of an average value of rotational frequencies of the axles located outside the gauge conversion section into the electric angular frequencies of the main motors, and adds up a slip frequency command and the reference frequency to provide the frequency of the output voltage of the inverter.Type: GrantFiled: September 11, 2018Date of Patent: September 3, 2024Assignees: MITSUBISHI ELECTRIC CORPORATION, KYUSHU RAILWAY COMPANYInventors: Kohei Fujitani, Shinsuke Kadoi, Tsuyoshi Morimitsu, Yuichi Mimura, Soichiro Watanabe
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Patent number: 11975613Abstract: A variable-gauge train control apparatus for a variable-gauge train having a gauge variable in a gauge conversion section includes: a plurality of main motors that transmits driving force to axles and wheels; a plurality of inverters that outputs voltage to at least one of the main motors; and voltage control units that control the individual output voltages of the plurality of inverters. Each of the voltage control units corresponds to one of the inverters and, when at least one of the axles to be subjected to the driving force controlled by the corresponding one inverter is within the gauge conversion section, controls the speed of the associated main motors by using, as a speed command value, a train speed converted into a rotational frequency.Type: GrantFiled: September 11, 2018Date of Patent: May 7, 2024Assignees: MITSUBISHI ELECTRIC CORPORATION, KYUSHU RAILWAY COMPANYInventors: Kohei Fujitani, Shinsuke Kadoi, Tsuyoshi Morimitsu, Yuichi Mimura, Soichiro Watanabe
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Publication number: 20220048544Abstract: A variable-gauge train control apparatus includes an inverter that collectively controls the torque of main motors; and a voltage control unit that controls an output voltage of the inverter. When at least one of axles to be driven by the main motors is within the gauge conversion section and at least one of the axles is located outside the gauge conversion section, the voltage control unit treats, as a reference frequency, a value obtained by conversion of an average value of rotational frequencies of the axles located outside the gauge conversion section into the electric angular frequencies of the main motors, and adds up a slip frequency command and the reference frequency to provide the frequency of the output voltage of the inverter.Type: ApplicationFiled: September 11, 2018Publication date: February 17, 2022Applicants: Mitsubishi Electric Corporation, Kyushu Railway CompanyInventors: Kohei FUJITANI, Shinsuke KADOI, Tsuyoshi MORIMITSU, Yuichi MIMURA, Soichiro WATANABE
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Publication number: 20210339633Abstract: A variable-gauge train control apparatus for a variable-gauge train having a gauge variable in a gauge conversion section includes: a plurality of main motors that transmits driving force to axles and wheels; a plurality of inverters that outputs voltage to at least one of the main motors; and voltage control units that control the individual output voltages of the plurality of inverters. Each of the voltage control units corresponds to one of the inverters and, when at least one of the axles to be subjected to the driving force controlled by the corresponding one inverter is within the gauge conversion section, controls the speed of the associated main motors by using, as a speed command value, a train speed converted into a rotational frequency.Type: ApplicationFiled: September 11, 2018Publication date: November 4, 2021Applicants: Mitsubishi Electric Corporation, KYUSHU RAILWAY COMPANYInventors: Kohei FUJITANI, Shinsuke KADOI, Tsuyoshi MORIMITSU, Yuichi MIMURA, Soichiro WATANABE
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Patent number: 10688878Abstract: A variable gauge train control device comprises an inverter, a location detector, and a torque calculator. The inverter collectively controls torques of main electric motors. The location detector detects an entry into a gauge changeover section. The torque calculator, upon detection by the location detector of the entry into the gauge changeover section, suspends idling control that otherwise restricts the torques of the main electric motors and calculates a first torque pattern for making the inverter operate in accordance with the torques of the main electric motors.Type: GrantFiled: July 6, 2018Date of Patent: June 23, 2020Assignees: MITSUBISHI ELECTRIC CORPORATION, KYUSHU RAILWAY COMPANYInventors: Kazuki Konishi, Hidetoshi Kitanaka, Tsuyoshi Morimitsu, Yuichi Mimura, Soichiro Watanabe
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Publication number: 20180312079Abstract: A variable gauge train control device comprises an inverter, a location detector, and a torque calculator. The inverter collectively controls torques of main electric motors. The location detector detects an entry into a gauge changeover section. The torque calculator, upon detection by the location detector of the entry into the gauge changeover section, suspends idling control that otherwise restricts the torques of the main electric motors and calculates a first torque pattern for making the inverter operate in accordance with the torques of the main electric motors.Type: ApplicationFiled: July 6, 2018Publication date: November 1, 2018Applicants: MITSUBISHI ELECTRIC CORPORATION, KYUSHU RAILWAY COMPANYInventors: Kazuki KONISHI, Hidetoshi KITANAKA, Tsuyoshi MORIMITSU, Yuichi MIMURA, Soichiro WATANABE
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Patent number: 7101458Abstract: In a plasma processing method and apparatus for monitoring an operating status of a plasma processing apparatus and/or a processing status of an object being processed, emission spectra emitted from a plasma is obtained as optical data when the plasma process is performed on the object. Quantitative data of each emission source is obtained from the obtained optical data by using reference data in a database storing therein emission spectra of a plurality of emission source as the reference data. The operating status of the plasma processing apparatus and/or the processing status of the object being processed is estimated based on changes in the quantitative data of each emission source.Type: GrantFiled: December 5, 2003Date of Patent: September 5, 2006Assignee: Tokyo Electron LimitedInventors: Hin Oh, Yuichi Mimura
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Patent number: 6985215Abstract: In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.Type: GrantFiled: February 11, 2005Date of Patent: January 10, 2006Assignee: Tokyo Electron LimitedInventors: Hin Oh, Hideaki Sato, Naoki Takayama, Hisanori Sakai, Yuichi Mimura
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Publication number: 20050146709Abstract: In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.Type: ApplicationFiled: February 11, 2005Publication date: July 7, 2005Applicant: TOKYO ELECTRON LIMITEDInventors: Hin Oh, Hideaki Sato, Naoki Takayama, Hisanori Sakai, Yuichi Mimura
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Publication number: 20040200718Abstract: In a plasma processing method and apparatus for monitoring an operating status of a plasma processing apparatus and/or a processing status of an object being processed, emission spectra emitted from a plasma is obtained as optical data when the plasma process is performed on the object. Quantitative data of each emission source is obtained from the obtained optical data by using reference data in a database storing therein emission spectra of a plurality of emission source as the reference data. The operating status of the plasma processing apparatus and/or the processing status of the object being processed is estimated based on changes in the quantitative data of each emission source.Type: ApplicationFiled: December 5, 2003Publication date: October 14, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Hin Oh, Yuichi Mimura