Patents by Inventor Yuichi Mukai
Yuichi Mukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11681218Abstract: The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition.Type: GrantFiled: February 11, 2019Date of Patent: June 20, 2023Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
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Patent number: 10571805Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.Type: GrantFiled: June 23, 2016Date of Patent: February 25, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yuki Suzuki, Yuichi Mukai, Koji Ichikawa
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Patent number: 10520812Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.Type: GrantFiled: June 23, 2016Date of Patent: December 31, 2019Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yuki Suzuki, Yuichi Mukai, Koji Ichikawa
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Publication number: 20190250508Abstract: The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition.Type: ApplicationFiled: February 11, 2019Publication date: August 15, 2019Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro MASUYAMA, Yuichi MUKAI, Koji ICHIKAWA
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Patent number: 10073343Abstract: A compound which is non-ionic compound, the compound has a group represented by formula (Ia): wherein R2 represents a group having a C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.Type: GrantFiled: November 24, 2015Date of Patent: September 11, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
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Patent number: 9869930Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A3-X1-(A4-X2)a-(A5)b-, * represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, W1 represents a C5 to C18 divalent alicyclic hydrocarbon group, a represents 0 or 1, and b represents 0 or 1.Type: GrantFiled: November 10, 2015Date of Patent: January 16, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
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Patent number: 9791776Abstract: A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.Type: GrantFiled: April 6, 2012Date of Patent: October 17, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Takahiro Yasue, Yuichi Mukai
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Patent number: 9563125Abstract: A non-ionic compound includes a group represented by formula (Ia): wherein R2 represents a group having a C5 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.Type: GrantFiled: November 24, 2015Date of Patent: February 7, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
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Publication number: 20160377978Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.Type: ApplicationFiled: June 23, 2016Publication date: December 29, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yuki SUZUKI, Yuichi MUKAI, Koji ICHIKAWA
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Patent number: 9428485Abstract: A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation.Type: GrantFiled: June 7, 2012Date of Patent: August 30, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Yuichi Mukai
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Publication number: 20160145186Abstract: A compound which is non-ionic compound, the compound has a group represented by formula (Ia): wherein R2 represents a group having a C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.Type: ApplicationFiled: November 24, 2015Publication date: May 26, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro MASUYAMA, Yuichi MUKAI, Koji ICHIKAWA
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Publication number: 20160147146Abstract: A non-ionic compound includes a group represented by formula (Ia): wherein R2 represents a group having a C5 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.Type: ApplicationFiled: November 24, 2015Publication date: May 26, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro MASUYAMA, Yuichi MUKAI, Koji ICHIKAWA
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Publication number: 20160130212Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A3-X1-(A4-X2)a-(A5)b-, * represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, W1 represents a C5 to C18 divalent alicyclic hydrocarbon group, a represents 0 or 1, and b represents 0 or 1.Type: ApplicationFiled: November 10, 2015Publication date: May 12, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro MASUYAMA, Yuichi MUKAI, Koji ICHIKAWA
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Patent number: 9268226Abstract: A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.Type: GrantFiled: October 11, 2013Date of Patent: February 23, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Akira Kamabuchi, Yuichi Mukai
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Patent number: 9051251Abstract: A photoresist composition which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1, R2 and R3 each independently represent a hydrogen atom or a C1-C10 monovalent aliphatic saturated hydrocarbon group, X1 and X2 each independently represent a single bond, a carbonyl group, or a C1-C10 divalent aliphatic saturated hydrocarbon group where a hydrogen atom can be replaced by a hydroxy group and where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, A1 represents a C1-C30 organic group, m1 represents an integer of 1 to 4, and Z+ represents an organic cation, and a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid.Type: GrantFiled: August 8, 2012Date of Patent: June 9, 2015Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Yuichi Mukai
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Patent number: 8940473Abstract: A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to C17 divalent saturated hydrocarbon group; R5 represents a group having cyclic ether structure; and Z1+ represents an organic cation.Type: GrantFiled: February 24, 2012Date of Patent: January 27, 2015Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yuichi Mukai, Satoshi Yamamoto
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Patent number: 8835095Abstract: A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), wherein R1, A1, R2, R6, X1, X2, R3, R4 and R5 are defined in the specification.Type: GrantFiled: February 24, 2012Date of Patent: September 16, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Hiromu Sakamoto, Yuichi Mukai
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Patent number: 8802352Abstract: A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+are defined in the specification.Type: GrantFiled: August 6, 2012Date of Patent: August 12, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yuichi Mukai, Isao Yoshida
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Patent number: 8778594Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, R26, X21 and X22 are defined in the specification.Type: GrantFiled: July 18, 2012Date of Patent: July 15, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Hiromu Sakamoto, Yuichi Mukai
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Patent number: 8753795Abstract: The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.Type: GrantFiled: March 23, 2012Date of Patent: June 17, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Hiromu Sakamoto, Yuichi Mukai