Patents by Inventor Yuichi Tsukada

Yuichi Tsukada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250376606
    Abstract: A compound is represented by the general formula (1). General formula (1); (In the formula (1), the A represents an n-valent organic group including a sulfur atom. The n represents an integer of 3 or more. The S represents a sulfur atom. The X represents a single bond or a carbonyl group. The Xs may be the same or different from each other. The R represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or an araliphatic hydrocarbon group. The Rs may be the same or different from each other.
    Type: Application
    Filed: June 20, 2023
    Publication date: December 11, 2025
    Inventors: Yuichi TSUKADA, Shuhei YONEDA
  • Publication number: 20250136738
    Abstract: Provided are a curable composition containing a compound having two or more thio(meth)acrylate groups and a compound represented by Formula (1), a cured product obtained by curing the curable composition, a molded body including the cured product, and an optical material including the molded body.
    Type: Application
    Filed: February 17, 2023
    Publication date: May 1, 2025
    Applicant: MITSUI CHEMICALS, INC.
    Inventor: Yuichi TSUKADA
  • Publication number: 20250115689
    Abstract: Provided are a polyfunctional (meth)acrylate thioester composition containing a polyfunctional (meth)acrylate thioester compound represented by Formula (1), a curable composition containing the polyfunctional (meth)acrylate thioester composition, a cured product obtained by curing the curable composition, a molded body including the cured product, and an optical material including the molded body.
    Type: Application
    Filed: February 17, 2023
    Publication date: April 10, 2025
    Applicant: MITSUI CHEMICALS, INC.
    Inventor: Yuichi TSUKADA
  • Publication number: 20250115705
    Abstract: There is provided a resin composition for a lens, which contains a photocationic polymerization initiator (X) including a salt formed from an anion represented by General Formula (1) and a cation and contains an epoxy compound (Y) containing two or more epoxy groups in a molecule. (In General Formula (1), R1 to R4 each independently represent an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 14 carbon atoms.
    Type: Application
    Filed: December 21, 2022
    Publication date: April 10, 2025
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Yuichi TSUKADA, Yuji MIZOBE
  • Publication number: 20250019582
    Abstract: A polyamic acid varnish according to the present disclosure contains a polyamic acid. The monomers that constitute this polyamic acid include: a monomer (A) that has a C4-12 linear alkylene group but does not have an ester bond, an amide bond, or an ether bond; and a monomer (B) that is a monomer other than the monomer (A). The monomer (A) content is 15 to 70 mol % with respect to the total amount of the monomers that constitute the polyamic acid. The monomer (B) contains at least 90 mol % aromatic monomer.
    Type: Application
    Filed: October 20, 2022
    Publication date: January 16, 2025
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Ko TAKASE, Masaki OKAZAKI, Yuichi TSUKADA
  • Publication number: 20160244802
    Abstract: Post-translational modification, including protein methylation, plays an important role in regulating protein function. The present invention provides a novel assay for evaluating demethylase activity and the discovery of a family of protein demethylases comprising a novel demethylase motif.
    Type: Application
    Filed: February 25, 2016
    Publication date: August 25, 2016
    Inventors: Yi ZHANG, Yuichi Tsukada, Kenichi Yamane, Robert John Klose
  • Patent number: 8390048
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: March 5, 2013
    Assignee: Renesas Electronics Corporation
    Inventors: Takeshi Sakai, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Publication number: 20110024820
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Application
    Filed: October 14, 2010
    Publication date: February 3, 2011
    Inventors: Takeshi SAKAI, Yasushi ISHII, Tsutomu OKAZAKI, Masaru NAKAMICHI, Toshikazu MATSUI, Kyoya NITTA, Satoru MACHIDA, Munekatsu NAKAGAWA, Yuichi TSUKADA
  • Patent number: 7863135
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: January 4, 2011
    Assignee: Renesas Electronics Corporation
    Inventors: Takeshi Sakai, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Publication number: 20100144108
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Application
    Filed: February 16, 2010
    Publication date: June 10, 2010
    Inventors: Takeshi SAKAI, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Patent number: 7663176
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: February 16, 2010
    Assignee: Renesas Technology Corp.
    Inventors: Takeshi Sakai, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Patent number: 7578536
    Abstract: A vehicle seat is provided which includes a seat base detachably mounted on a vehicle floor, a seat cushion detachably provided on the seat base, and a backrest foldably supported on the seat base. The seat cushion is detached from the seat base, and the seat cushion and the seat base with the backrest folded are juxtaposed to be stored in a recess provided in the vehicle floor or an area under another seat. In the case of non-use, the vehicle seat can be removed from the vehicle floor to be efficiently stored inside a vehicle. A vehicle seat storing structure and a vehicle seat structure are also provided.
    Type: Grant
    Filed: March 3, 2008
    Date of Patent: August 25, 2009
    Assignee: Honda Motor Co., Ltd.
    Inventors: Kiyoshi Yajima, Yuichi Tsukada, Koji Kamida, Hidetaka Shinozaki, Tomotsu Oishi
  • Publication number: 20090203057
    Abstract: Post-translational modification, including protein methylation, plays an important role in regulating protein function. The present invention provides a novel assay for evaluating demethylase activity and the discovery of a family of protein demethylases comprising a novel demethylase motif.
    Type: Application
    Filed: October 27, 2006
    Publication date: August 13, 2009
    Inventors: Yi Zhang, Yuichi Tsukada, Kenichi Yamane, Robert John Klose
  • Publication number: 20080206975
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Application
    Filed: May 2, 2008
    Publication date: August 28, 2008
    Inventors: Takeshi SAKAI, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Publication number: 20080203466
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Application
    Filed: May 2, 2008
    Publication date: August 28, 2008
    Inventors: Takeshi SAKAI, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Publication number: 20080157579
    Abstract: A vehicle seat is provided which includes a seat base detachably mounted on a vehicle floor, a seat cushion detachably provided on the seat base, and a backrest foldably supported on the seat base. The seat cushion is detached from the seat base, and the seat cushion and the seat base with the backrest folded are juxtaposed to be stored in a recess provided in the vehicle floor or an area under another seat. In the case of non-use, the vehicle seat can be removed from the vehicle floor to be efficiently stored inside a vehicle. A vehicle seat storing structure and a vehicle seat structure are also provided.
    Type: Application
    Filed: March 3, 2008
    Publication date: July 3, 2008
    Applicant: Honda Motor Co., Ltd.
    Inventors: Kiyoshi Yajima, Yuichi Tsukada, Koji Kamida, Hidetaka Shinozaki, Tamotsu Oishi
  • Patent number: 7393038
    Abstract: A vehicle seat is provided which includes a seat base detachably mounted on a vehicle floor, a seat cushion detachably provided on the seat base, and a backrest foldably supported on the seat base. The seat cushion is detached from the seat base, and the seat cushion and the seat base with the backrest folded are juxtaposed to be stored in a recess provided in the vehicle floor or an area under another seat. In the case of non-use, the vehicle seat can be removed from the vehicle floor to be efficiently stored inside a vehicle. A vehicle seat storing structure and a vehicle seat structure are also provided.
    Type: Grant
    Filed: February 10, 2004
    Date of Patent: July 1, 2008
    Assignee: Honda Motor Co., Ltd.
    Inventors: Kiyoshi Yajima, Yuichi Tsukada, Koji Kamida, Hidetaka Shinozaki, Tamotsu Oishi
  • Patent number: 7371631
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: May 13, 2008
    Assignee: Renesas Technology Corp.
    Inventors: Takeshi Sakai, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada
  • Publication number: 20070013204
    Abstract: A vehicle seat is provided which includes a seat base detachably mounted on a vehicle floor, a seat cushion detachably provided on the seat base, and a backrest foldably supported on the seat base. The seat cushion is detached from the seat base, and the seat cushion and the seat base with the backrest folded are juxtaposed to be stored in a recess provided in the vehicle floor or an area under another seat. In the case of non-use, the vehicle seat can be removed from the vehicle floor to be efficiently stored inside a vehicle. A vehicle seat storing structure and a vehicle seat structure are also provided.
    Type: Application
    Filed: February 10, 2004
    Publication date: January 18, 2007
    Inventors: Kiyoshi Yajima, Yuichi Tsukada, Koji Kamida, Hidetaka Shinozaki, Tatnotsu Oishi
  • Publication number: 20060003508
    Abstract: For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film.
    Type: Application
    Filed: June 29, 2005
    Publication date: January 5, 2006
    Inventors: Takeshi Sakai, Yasushi Ishii, Tsutomu Okazaki, Masaru Nakamichi, Toshikazu Matsui, Kyoya Nitta, Satoru Machida, Munekatsu Nakagawa, Yuichi Tsukada