Patents by Inventor Yuichiro Fujikawa

Yuichiro Fujikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210347981
    Abstract: An object of the present invention is to provide an impact modifier that provides impact resistance to a molded object obtained by molding a resin composition such as polycarbonate at a high temperature, and exhibits more excellent heat stability (preservation of mechanical properties after a wet heat test, discoloration, and flame retardance), and a thermoplastic resin composition including the impact modifier. The polyorganosiloxane-containing-rubber latex, in which a total amount of sulfate ions and sulfonate ions included in 100 g of the solid content is 2.4 mmol or less, a powder thereof, and a resin composition including the powder and a resin. Further, a molded object thereof and a production method therefor are provided.
    Type: Application
    Filed: July 22, 2021
    Publication date: November 11, 2021
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Ayako SHIMONAKA, Hiroshi NIINO, Shinji MATSUOKA, Yuichiro FUJIKAWA
  • Publication number: 20200062946
    Abstract: An object of the present invention is to provide an impact modifier that provides impact resistance to a molded object obtained by molding a resin composition such as polycarbonate at a high temperature, and exhibits more excellent heat stability (preservation of mechanical properties after a wet heat test, discoloration, and flame retardance), and a thermoplastic resin composition including the impact modifier. The polyorganosiloxane-containing-rubber latex, in which a total amount of sulfate ions and sulfonate ions included in 100 g of the solid content is 2.4 mmol or less, a powder thereof, and a resin composition including the powder and a resin. Further, a molded object thereof and a production method therefor are provided.
    Type: Application
    Filed: November 4, 2019
    Publication date: February 27, 2020
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Ayako Shimonaka, Hiroshi Niino, Shinji Matsuoka, Yuichiro Fujikawa
  • Patent number: 9862791
    Abstract: Disclosed is an impact strength modifier (?) for a chlorine-containing resin, comprising a powder of a graft copolymer (A) obtained by graft polymerizing one or more kinds of vinyl monomers (b1) onto a polyorganosiloxane rubber (A1) or a composite rubber (A2) containing a polyorganosiloxane rubber and a polyalkyl(meth)acrylate rubber, wherein the specific surface area of the powder of the graft copolymer (A) measured by a nitrogen gas adsorption method is from 0.6 to 30 m2/g, and the pH of water used for extraction under conditions, in which (1) in an oven at 180° C., 5.0 g of the powder of the graft copolymer (A) is left to stand still and heated for 15 minutes, and (2) after the heating, the powder is dispersed in 100 ml of heated pure water and extracted for 1 hour at 70° C. while stirring, is from 4 to 11.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: January 9, 2018
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yuichiro Fujikawa, Atsushi Kuwahara, Ayaka Wakita, Toshihiro Kasai
  • Publication number: 20170342186
    Abstract: Disclosed is an impact strength modifier (?) for a chlorine-containing resin, comprising a powder of a graft copolymer (A) obtained by graft polymerizing one or more kinds of vinyl monomers (b1) onto a polyorganosiloxane rubber (A1) or a composite rubber (A2) containing a polyorganosiloxane rubber and a polyalkyl (meth)acrylate rubber, wherein the specific surface area of the powder of the graft copolymer (A) measured by a nitrogen gas adsorption method is from 0.6 to 30 m2/g, and the pH of water used for extraction under conditions, in which (1) in an oven at 180° C., 5.0 g of the powder of the graft copolymer (A) is left to stand still and heated for 15 minutes, and (2) after the heating, the powder is dispersed in 100 ml of heated pure water and extracted for 1 hour at 70° C. while stirring, is from 4 to 11.
    Type: Application
    Filed: August 11, 2017
    Publication date: November 30, 2017
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yuichiro Fujikawa, Atsushi Kuwahara, Ayaka Wakita, Toshihiro Kasai
  • Patent number: 9803082
    Abstract: A graft copolymer capable of providing impact resistance, flame retardance, and color rendering properties to a thermoplastic resin is described. The graft copolymer contains a polyorganosiloxane, and is obtained by graft-polymerizing vinyl monomers including a (meth)acrylate ester (b1) having an alkyl group or an aromatic group and an aromatic vinyl monomer (b2) on a polyorganosiloxane-based rubber. The graft copolymer has a volume average particle diameter of 200-2000 nm, and contains 0.1-69 mass % of polyorganosiloxane. A thermoplastic resin composition is also described, containing a thermoplastic resin (A), the graft copolymer, a fluorine resin (C) and a flame retardant (D). A molded article is also described, which is obtained by molding the thermoplastic resin composition.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: October 31, 2017
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Ayaka Wakita, Yuichiro Fujikawa, Sohei Ueki, Shinji Matsuoka
  • Patent number: 9527997
    Abstract: A graft copolymer capable of providing impact resistance, flame retardance, and color rendering properties to a thermoplastic resin is described. The graft copolymer contains a polyorganosiloxane, and is obtained by graft-polymerizing vinyl monomers including a (meth)acrylate ester (b1) having an alkyl group or an aromatic group and an aromatic vinyl monomer (b2) on a polyorganosiloxane-based rubber. The graft copolymer has a volume average particle diameter of 200-2000 nm, and contains 0.1-69 mass % of polyorganosiloxane. A thermoplastic resin composition is also described, containing a thermoplastic resin (A), the graft copolymer, a fluorine resin (C) and a flame retardant (D). A molded article is also described, which is obtained by molding the thermoplastic resin composition.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: December 27, 2016
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Ayaka Wakita, Yuichiro Fujikawa, Sohei Ueki, Shinji Matsuoka
  • Publication number: 20160333130
    Abstract: A graft copolymer capable of providing impact resistance, flame retardance, and color rendering properties to a thermoplastic resin is described. The graft copolymer contains a polyorganosiloxane, and is obtained by graft-polymerizing vinyl monomers including a (meth)acrylate ester (b1) having an alkyl group or an aromatic group and an aromatic vinyl monomer (b2) on a polyorganosiloxane-based rubber. The graft copolymer has a volume average particle diameter of 200-2000 nm, and contains 0.1-69 mass % of polyorganosiloxane. A thermoplastic resin composition is also described, containing a thermoplastic resin (A), the graft copolymer, a fluorine resin (C) and a flame retardant (D). A molded article is also described, which is obtained by molding the thermoplastic resin composition.
    Type: Application
    Filed: July 27, 2016
    Publication date: November 17, 2016
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Ayaka Wakita, Yuichiro Fujikawa, Sohei Ueki, Shinji Matsuoka
  • Publication number: 20160053040
    Abstract: [Object] Provided is a reinforcing agent for resin that is able to impart excellent impact resistance, resistance to thermal coloration, and resistance to moist heat to a polycarbonate resin. [Solving Means] Disclosed is a reinforcing agent for polycarbonate resin which includes a rubber-like graft polymer, in which a quantity of the ?YI value that is increased by a heat treatment at a temperature of 140° C. for 12 hours and measured for a molded article obtained by molding 3 parts by mass of the reinforcing agent for polycarbonate resin and 97 parts by mass of an aromatic polycarbonate resin having a viscosity average molecular weight of 24,000 under a specific condition is 36 or less and a quantity of the ?MFR value increased by a heat treatment for 60 hours under a condition of a temperature of 120° C. and a relative humidity of 100% is 3 or less. Disclosed is also a resin composition including the reinforcing agent for polycarbonate resin.
    Type: Application
    Filed: April 4, 2014
    Publication date: February 25, 2016
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Yuichiro FUJIKAWA, Shinji MATSUOKA, Mitsufumi NODONO, Hiroaki OTONARI, Haruo SASAKI
  • Publication number: 20160039963
    Abstract: Disclosed is an impact strength modifier (?) for a chlorine-containing resin, comprising a powder of a graft copolymer (A) obtained by graft polymerizing one or more kinds of vinyl monomers (b1) onto a polyorganosiloxane rubber (A1) or a composite rubber (A2) containing a polyorganosiloxane rubber and a polyalkyl(meth)acrylate rubber, wherein the specific surface area of the powder of the graft copolymer (A) measured by a nitrogen gas adsorption method is from 0.6 to 30 m2/g, and the pH of water used for extraction under conditions, in which (1) in an oven at 180° C., 5.0 g of the powder of the graft copolymer (A) is left to stand still and heated for 15 minutes, and (2) after the heating, the powder is dispersed in 100 ml of heated pure water and extracted for 1 hour at 70° C. while stirring, is from 4 to 11.
    Type: Application
    Filed: March 15, 2013
    Publication date: February 11, 2016
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Yuichiro FUJIKAWA, Atsushi KUWAHARA, Ayaka WAKITA, Toshihiro KASAI
  • Patent number: 7744965
    Abstract: The present invention provides a method and apparatus for forming a zinc oxide thin film with high transparency and high conductivity on a surface of a flexible substrate such as plastic without the indispensable requirement of doping impurities. In the method of forming a zinc oxide thin film by reacting oxygen radicals and zinc atoms on a surface of a substrate placed in a film-forming chamber evacuated to a vacuum, the density of crystal defects that are defects of the atomic arrangement of the zinc oxide thin film is controlled by the temperature of the substrate, and the zinc oxide thin film is thereby formed. It is suitable to form the film while maintaining the temperature of the substrate at 400° C. or less to intentionally disturb the regularity of the atomic arrangement of the zinc oxide thin film.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: June 29, 2010
    Assignees: Yamanashi University, Yamanashi Prefecture, Nakaya Ltd.
    Inventors: Takashi Matsumoto, Chitake Imazu, Shigeru Hagihara, Kazuhiro Kijima, Osamu Abe, Satoshi Hiraki, Yuichiro Fujikawa
  • Publication number: 20070042216
    Abstract: The present invention provides a method and apparatus for forming a zinc oxide thin film with high transparency and high conductivity on a surface of a flexible substrate such as plastic without the indispensable requirement of doping impurities. In the method of forming a zinc oxide thin film by reacting oxygen radicals and zinc atoms on a surface of a substrate placed in a film-forming chamber evacuated to a vacuum, the density of crystal defects that are defects of the atomic arrangement of the zinc oxide thin film is controlled by the temperature of the substrate, and the zinc oxide thin film is thereby formed. It is suitable to form the film while maintaining the temperature of the substrate at 400° C. or less to intentionally disturb the regularity of the atomic arrangement of the zinc oxide thin film.
    Type: Application
    Filed: March 17, 2006
    Publication date: February 22, 2007
    Applicants: Yamanashi University, YAMANASHI PREFECTURE, NAKAYA ltd.
    Inventors: Takashi Matsumoto, Chitake Imazu, Shigeru Hagihara, Kazuhiro Kijima, Osamu Abe, Satoshi Hiraki, Yuichiro Fujikawa
  • Patent number: 6156107
    Abstract: The trap apparatus of the present invention includes a case provided for a gas exhaust system used for a film forming equipment which carries out a film forming process on an object, a gas supply port, made in the case and connected to an exhaust pipe of the gas exhaust system, for introducing an exhaust gas flowing through the exhaust pipe, into the case, a gas exhaust port, made in the case and connected to an exhaust pipe of the gas exhaust system, for exhausting the exhaust gas flowing through an inner space of the case, to the exhaust pipe, a plurality of partition plates arranged in the case so as to partition the inner space of the case into a plurality of rooms between the gas supply port and the gas exhaust port, a gas distribution port provided in some of the partition plates such that the exhaust gas introduced into the case through the gas supply port, is allowed to flow through the rooms partitioned by the partition plates, in the order, and then exhausted from the gas exhaust port, a trap mechan
    Type: Grant
    Filed: March 26, 1999
    Date of Patent: December 5, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Kazuichi Hayashi, Yuichiro Fujikawa
  • Patent number: 6149729
    Abstract: A film forming apparatus includes a chamber in which a thin film is formed on a semiconductor wafer by supplying a process gas, the interior of which is then cleaned by a cleaning gas, while the gas in the chamber is exhausted by a vacuum system.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: November 21, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Teruo Iwata, Kazuichi Hayashi, Yuichiro Fujikawa, Takashi Horiuchi
  • Patent number: 5904757
    Abstract: The trap apparatus of the present invention includes a case provided for a gas exhaust system used for a film forming equipment which carries out a film forming process on an object, a gas supply port, made in the case and connected to an exhaust pipe of the gas exhaust system, for introducing an exhaust gas flowing through the exhaust pipe, into the case, a gas exhaust port, made in the case and connected to an exhaust pipe of the gas exhaust system, for exhausting the exhaust gas flowing through an inner space of the case, to the exhaust pipe, a plurality of partition plates arranged in the case so as to partition the inner space of the case into a plurality of rooms between the gas supply port and the gas exhaust port, a gas distribution port provided in some of the partition plates such that the exhaust gas introduced into the case through the gas supply port, is allowed to flow through the rooms partitioned by the partition plates, in the order, and then exhausted from the gas exhaust port, and a trap me
    Type: Grant
    Filed: November 12, 1997
    Date of Patent: May 18, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Kazuichi Hayashi, Yuichiro Fujikawa
  • Patent number: 5704214
    Abstract: A trap body is removably attached in the housing inserted in that portion of the exhaust passage which is situated on the upstream side of a vacuum pump, and has cooling fins for cooling the tramp materials in the exhaust gas brought into contact with the cooling means, thereby liquefying the tramp materials. Therefore, the tramp materials, such as unaffected process gases, products of reaction, etc., contained in the exhaust gas flowing through the exhaust passage, are cooled and liquefied when they are touched by the trap body cooled by the cooling unit, and adhere to the surface of the trap body. Thus, the tramp materials in the exhaust gas can be removed lest they damage the vacuum pump on the downstream side or close up the exhaust passage.
    Type: Grant
    Filed: April 18, 1996
    Date of Patent: January 6, 1998
    Assignee: Tokyo Electron Limited
    Inventors: Yuichiro Fujikawa, Seishi Murakami, Tatsuo Hatano
  • Patent number: 5595606
    Abstract: A shower head of a metal CVD apparatus has a raw gas passage and a reduction gas passage for independently and respectively supplying a raw gas and a reduction gas into a process chamber. The shower head includes upper, middle and lower blocks which are formed independently of each other. Each of the raw gas passage and the reduction gas passage is branched from the upper block to the lower block. A coolant passage is formed in the lower block near supply outlets of the raw gas and the reduction gas for cooling the supply outlets. A heater is arranged in the upper and middle blocks for heating the raw gas passage.
    Type: Grant
    Filed: April 18, 1996
    Date of Patent: January 21, 1997
    Assignee: Tokyo Electron Limited
    Inventors: Yuichiro Fujikawa, Tatsuo Hatano, Seishi Murakami
  • Patent number: 5525160
    Abstract: A processing chamber having a heating device for heating the interior thereof to a required temperature, and a holding device with at least three separate holding elements is disclosed. A processing gas feed port and processing gas passages are provided in a cap which is connected to a processing chamber and closes an opening in the upper surface of the processing chamber, and the processing gas feed port and the processing gas passages are connected by a connection pipe. The processing chamber is connected to processing gas sources and has processing gas introduction passages formed in a side wall thereof and communicated with the processing gas passages. Seal members are provided around open ends of either of the processing gas passages or the processing gas introduction passages in the surfaces of the processing chamber and the cap opposed to each other.
    Type: Grant
    Filed: May 3, 1994
    Date of Patent: June 11, 1996
    Assignee: Tokyo Electron Kabushiki Kaisha
    Inventors: Sumi Tanaka, Yuichiro Fujikawa, Tomihiro Yonenaga, Hideki Lee