Patents by Inventor Yuichiro Fujisawa

Yuichiro Fujisawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing pad and surface polishing method
    Patent number: 6439965
    Abstract: A workpiece is pinched from above and below by polishing pads attached to the inner surfaces of a pair of upper and lower rotary platens. A slurry is dropped between the workpiece and the polishing pads to polish the workpiece. The polishing pad is comprised of a base layer, and a sheet-shaped nap layer, which is laminated on the base layer and is made of a soft plastic foam. The nap layer is formed of closed pores, whose surface is covered with non-foaming skin layers and which involves pores (air bubble) in the nap layer without opening the pores in the surface. The polishing pad is used in combination with a colloidal slurry whose abrasive grains are colloidal silica in order to polish a surface of the workpiece.
    Type: Grant
    Filed: August 30, 2000
    Date of Patent: August 27, 2002
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Mitsuyoshi Ichino, Koji Nakamura, Yoshiaki Ishizawa, Yasushi Ito, Takahiro Shimobayashi, Gosuke Ikemori, Yuichiro Fujisawa