Patents by Inventor Yuichiro Goto

Yuichiro Goto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10175576
    Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: January 8, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto, Yuichiro Enomoto
  • Publication number: 20180364566
    Abstract: Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (?LWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90° C. or higher; a method for producing a reversal pattern; and a pattern laminate.
    Type: Application
    Filed: August 24, 2018
    Publication date: December 20, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Kazuhiro MARUMO
  • Publication number: 20180037688
    Abstract: Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.
    Type: Application
    Filed: September 13, 2017
    Publication date: February 8, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Kazuhiro MARUMO, Hirotaka KITAGAWA, Tadashi OOMATSU
  • Patent number: 9862847
    Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
    Type: Grant
    Filed: December 23, 2015
    Date of Patent: January 9, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
  • Publication number: 20180002561
    Abstract: Disclosed herein are a resin composition for underlayer film formation which is capable of forming an underlayer film having good adhesiveness to a base material and good surface state, an imprint forming kit, a laminate, a pattern forming method, and a method for producing a device. Provided is a resin composition for underlayer film formation, including a resin, a nucleophilic catalyst, and a solvent, in which the content of the nucleophilic catalyst is 0.01 to 0.3 mass % with respect to the solid content of the resin composition for underlayer film formation.
    Type: Application
    Filed: September 12, 2017
    Publication date: January 4, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170285468
    Abstract: Provided are a photocurable composition for imprints, having good releasability and temporal stability of the releasability, a pattern forming method, and a method for manufacturing a device. This photocurable composition for imprints includes a monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom, a bifunctional or higher polyfunctional (meth)acrylate (A2) not containing a fluorine atom, a monofunctional (meth)acrylate (B) containing a fluorine atom, and a photopolymerization initiator (C), in which the monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa, and the monofunctional (meth)acrylate (B) containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa.
    Type: Application
    Filed: June 14, 2017
    Publication date: October 5, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170200639
    Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure. A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.
    Type: Application
    Filed: March 24, 2017
    Publication date: July 13, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Tadashi OOMATSU
  • Publication number: 20170190820
    Abstract: Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device. The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.
    Type: Application
    Filed: March 21, 2017
    Publication date: July 6, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170158905
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.
    Type: Application
    Filed: February 24, 2017
    Publication date: June 8, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170146907
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent.
    Type: Application
    Filed: February 3, 2017
    Publication date: May 25, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
  • Patent number: 9482950
    Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below.
    Type: Grant
    Filed: October 25, 2013
    Date of Patent: November 1, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Yuichiro Goto
  • Patent number: 9435308
    Abstract: It is an object of the present invention to reduce the penetration of a fuel spray directed toward a certain area in a cylinder, thereby reducing oil dilution that increases sliding resistance in the engine, reducing fuel adhesion or the like onto the cylinder liner, and also reducing the adverse effect of a fuel spray having an increased penetration. A fuel injection valve that has a plurality of injection holes and injects fuel into a cylinder 3 of an internal combustion engine includes: injection holes a2 and a6 having a larger diameter for injecting fuel toward a ring-shaped space T1 including areas A2 and A6 of strong tumble flow T formed in the cylinder; and injection holes a1, a4, a3 and a5 having a smaller diameter for injecting fuel toward a space including areas A1, A4, A3 and A5 of weak tumble flow formed in the cylinder 3.
    Type: Grant
    Filed: July 4, 2012
    Date of Patent: September 6, 2016
    Assignee: Bosch Corporation
    Inventors: Kaoru Maeda, Yuichiro Goto, Wolfram Wiese, Daniel Scherrer
  • Publication number: 20160211143
    Abstract: A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group.
    Type: Application
    Filed: March 29, 2016
    Publication date: July 21, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20160122563
    Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
    Type: Application
    Filed: December 23, 2015
    Publication date: May 5, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
  • Publication number: 20160009945
    Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.
    Type: Application
    Filed: September 25, 2015
    Publication date: January 14, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Hirotaka KITAGAWA, Tadashi OOMATSU, Yuichiro GOTO
  • Publication number: 20150185606
    Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. THe curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
    Type: Application
    Filed: March 10, 2015
    Publication date: July 2, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Hirotaka KITAGAWA, Yuichiro GOTO, Yuichiro ENOMOTO
  • Publication number: 20140130772
    Abstract: It is an object of the present invention to reduce the penetration of a fuel spray directed toward a certain area in a cylinder, thereby reducing oil dilution that increases sliding resistance in the engine, reducing fuel adhesion or the like onto the cylinder liner, and also reducing the adverse effect of a fuel spray having an increased penetration. A fuel injection valve that has a plurality of injection holes and injects fuel into a cylinder 3 of an internal combustion engine includes: injection holes a2 and a6 having a larger diameter for injecting fuel toward a ring-shaped space T1 including areas A2 and A6 of strong tumble flow T formed in the cylinder; and injection holes al, a4, a3 and a5 having a smaller diameter for injecting fuel toward a space including areas A1, A4, A3 and A5 of weak tumble flow formed in the cylinder 3.
    Type: Application
    Filed: July 4, 2012
    Publication date: May 15, 2014
    Applicant: BOSCH CORPORATION
    Inventors: Kaoru Maeda, Yuichiro Goto, Wolfram Wiese, Daniel Scherrer
  • Publication number: 20140050900
    Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below.
    Type: Application
    Filed: October 25, 2013
    Publication date: February 20, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Yuichiro GOTO
  • Publication number: 20120280776
    Abstract: Disclosed is a composite wound element (Tra) which is used in a transformer or a transformation system, and used as a composite wound element for a noise-cut filter, wherein a plurality of coils (1) are enclosed in a magnetic connection member (2a), and are configured by winding belt-like conductive members (11, 12, 13) so that the width direction of the conductive members (11, 12, 13) corresponds to the axial direction of the coils (1). The transformer, the transformation system, and the composite wound element for a noise-cut filter are provided with the composite wound element having the aforementioned structure. Thus, the composite wound element (Tra), the transformer, the transformation system, and the composite wound element for a noise-cut filter can be produced more easily than ever before.
    Type: Application
    Filed: December 9, 2010
    Publication date: November 8, 2012
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd,)
    Inventors: Hiroshi Hashimoto, Takayoshi Miyazaki, Kyoji Zaitsu, Yoshito Fukumoto, Yuichiro Goto, Toshihiro Nogi, Kenichi Inoue, Hiroyuki Mitani, Koji Inoue
  • Patent number: 7344415
    Abstract: There is provided a fuse block 3 having an insertion port 7 into which a dark current fuse 11 is inserted and adapted to hold the dark current fuse 11 in a mount position, and the fuse block includes a guide surface 8 which is formed within the insertion port 7 in such a manner as to continue from the mount position for the dark current fuse 11 for contact with the dark current fuse 11 and arms formed at positions lying at lateral sides of the dark current fuse 11 in such a manner as to face the insertion port 7 so as to be able to hold the dark current fuse 11 therein when the dark current fuse 11 is in contact with the guide surface 8.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: March 18, 2008
    Assignee: Yazaki Corporation
    Inventors: Tatsuya Inaba, Yuichiro Goto, Masahiro Kawazu