Patents by Inventor Yuilun Wu

Yuilun Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10752994
    Abstract: An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.
    Type: Grant
    Filed: November 21, 2018
    Date of Patent: August 25, 2020
    Assignee: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
    Inventors: David N. Ruzic, Yuilun Wu, Ivan Shchelkanov, Jungmi Hong, Zihao Ouyang, Tae Seung Cho
  • Publication number: 20190093229
    Abstract: An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.
    Type: Application
    Filed: November 21, 2018
    Publication date: March 28, 2019
    Applicant: The Board of Trustees of the University of Illinois
    Inventors: David N. Ruzic, Yuilun Wu, Ivan Shchelkanov, Jungmi Hong, Zihao Ouyang, Tae Seung Cho
  • Patent number: 10167556
    Abstract: An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: January 1, 2019
    Assignee: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
    Inventors: David N. Ruzic, Yuilun Wu, Ivan Shchelkanov, Jungmi Hong, Zihao Ouyang, Tae Seung Cho
  • Publication number: 20150259802
    Abstract: An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.
    Type: Application
    Filed: March 13, 2015
    Publication date: September 17, 2015
    Inventors: David N. Ruzic, Yuilun Wu, Ivan Shchelkanov, Jungmi Hong, Zihao Ouyang, Tae Seung Cho