Abstract: An exposure apparatus configured to expose a substrate to radiant energy via an original plate while scanning of the original plate and the substrate are performed including a projection optical system configured to project light from the original plate onto the substrate, an original plate configured to hold the original plate and to be moved a substrate stage configured to hold the substrate and to be moved a measurement device configured to measure a position of a surface of a substrate facing the projection optical system in a direction of an optical axis of the projection optical system a processor configured to control a movement of the original plate stage, a movement of the substrate stage, and an operation of the measurement device, and an input device configured to input information about a measurement portion in the surface to be measured by the measurement device.

Abstract: An exposure apparatus configured to expose a substrate to radiant energy via an original plate while scanning of the original plate and the substrate are performed including a projection optical system configured to project light from the original plate onto the substrate, an original plate configured to hold the original plate and to be moved a substrate stage configured to hold the substrate and to be moved a measurement device configured to measure a position of a surface of a substrate facing the projection optical system in a direction of an optical axis of the projection optical system a processor configured to control a movement of the original plate stage, a movement of the substrate stage, and an operation of the measurement device, and an input device configured to input information about a measurement portion in the surface to be measured by the measurement device.

Abstract: An information processing apparatus used for an exposure system. The apparatus includes a generation unit which generates a parameter file described in a markup language based on a parameter used in the exposure system, the parameter file including information for displaying an image concerning at least one of a shot layout and a sample shot for an exposure process to be performed by the exposure system, and a program for editing the image, and a providing unit which provides the parameter file to another information processing apparatus out of the exposure system.

Abstract: An information processing apparatus which is used for an exposure system has a generation unit which generates format information required to inform a user with respect to a control parameter used in the exposure system, based on the control parameter, and an output unit which outputs the parameter information and the format information out of the apparatus.

Abstract: A method of detecting a position of a wafer, including memorizing a pattern of a part of the wafer, comparing a pattern of another part of the wafer at a position which is in a predetermined positional relationship with the first part, with the memorized pattern, and detecting a rotational position of the wafer on the basis of the comparison.