Patents by Inventor Yuji AOTA

Yuji AOTA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11581170
    Abstract: A plasma processing apparatus includes: a first electrode on which a substrate is placed; a plasma generation source that generates plasma; a bias power supply that supplies bias power to the first electrode; a source power supply that supplies source power to the plasma generation source; and a controller. The controller performs a control such that a first state and a second state of the source power are alternately applied in synchronization with a high frequency cycle of the bias power, or a phase within one cycle of a reference electrical state indicating any one of a voltage, a current and an electromagnetic field measured in a power feed system of the bias power, and performs a control to turn OFF the source power at least at a negative side peak of the phase within one cycle of the reference electrical state.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: February 14, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shinji Kubota, Yuji Aota, Chishio Koshimizu
  • Publication number: 20220246400
    Abstract: There is provided a radio frequency power filter circuit used in a plasma processing apparatus that includes an electrode and a feeding body connected to a center of a rear surface of the electrode and generates plasma by applying radio frequency power, the filter circuit including a series resonance circuit provided in a wiring line between a conductive member provided in the plasma processing apparatus and a power supply configured to supply DC power or power having a frequency of less than 400 kHz to the conductive member, and including a coil connected in series to the wiring line and a capacitor connected between the wiring line and a ground. A central axis of the coil and a central axis of the feeding body coincide with each other.
    Type: Application
    Filed: January 28, 2022
    Publication date: August 4, 2022
    Inventors: Koji YAMAGISHI, Yuji AOTA, Koichi NAGAMI, Kota ISHIHARADA
  • Publication number: 20210066040
    Abstract: A plasma processing apparatus includes: a first electrode on which a substrate is placed; a plasma generation source that generates plasma; a bias power supply that supplies bias power to the first electrode; a source power supply that supplies source power to the plasma generation source; and a controller. The controller performs a control such that a first state and a second state of the source power are alternately applied in synchronization with a high frequency cycle of the bias power, or a phase within one cycle of a reference electrical state indicating any one of a voltage, a current and an electromagnetic field measured in a power feed system of the bias power, and performs a control to turn OFF the source power at least at a negative side peak of the phase within one cycle of the reference electrical state.
    Type: Application
    Filed: September 2, 2020
    Publication date: March 4, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinji KUBOTA, Yuji AOTA, Chishio KOSHIMIZU