Abstract: A substrate etching apparatus for etching a substrate, the substrate etching apparatus includes a treatment container configured to accommodate a substrate, a stage on which the substrate is placed, the stage being disposed in the treatment container, a gas supply configured to supply a treatment gas from an upper space above the stage toward the stage, and a gas exhauster configured to evacuate an interior of the treatment container. The gas supply includes a central region facing a central part of the stage and an outer peripheral region having a same central axis as the central region and configured to surround the central region. The gas supply is capable of supplying the treatment gas to each of the central region and the outer peripheral region.

Abstract: A substrate processing device for processing a substrate is provided. The substrate processing device includes: a processing container configured to accommodate a substrate; a placement stage on which the substrate is mounted in the processing container; an exhauster configured to exhaust a processing gas in the processing container; and a partition wall disposed in the processing container and surrounding the placement stage, wherein, inside the partition wall, an exhaust flow path, which communicates with the exhauster, is formed to extend in a vertical direction over an entire circumference of the partition wall, and a plurality of openings, which communicates with a substrate processing space formed inside the partition wall above the placement stage and communicates with the exhaust flow path, is formed at regular intervals in an inner circumferential direction of the partition wall.

Abstract: A substrate etching apparatus for etching a substrate, the substrate etching apparatus includes a treatment container configured to accommodate a substrate, a stage on which the substrate is placed, the stage being disposed in the treatment container, a gas supply configured to supply a treatment gas from an upper space above the stage toward the stage, and a gas exhauster configured to evacuate an interior of the treatment container. The gas supply includes a central region facing a central part of the stage and an outer peripheral region having a same central axis as the central region and configured to surround the central region. The gas supply is capable of supplying the treatment gas to each of the central region and the outer peripheral region.

Abstract: A cylindrical inner wall used in a substrate processing apparatus and surrounding a stage on which a substrate is placed, with a gap between the inner wall and an outer periphery of the stage. The inner wall includes a plurality of slits formed in a lower end of the inner wall, and a plurality of grooves formed in the inner surface of the inner wall to extend from an upper end to the lower end of the inner wall so as to communicate with the slits.

Abstract: Provided is an electrodeionization apparatus for producing deionized water, capable of removing or reducing a biased flow of electric current in a deionization chamber. In the electrodeionization apparatus for producing deionized water, at least one deionization treatment unit including the deionization chamber and a pair of concentration chambers adjacent to both sides of the deionization chamber is disposed between a cathode and an anode. In the deionization chamber, anion exchanger layers and cation exchanger layers are stacked in an order in which a last ion exchanger layer through which water to be treated passes is an anion exchanger layer. A bipolar membrane is formed on the cathode side of the anion exchanger layer in the deionization chamber. The anion exchange membrane of the bipolar membrane is in contact with the anion exchanger layer.

Abstract: A substrate processing apparatus performs a predetermined process on a substrate by using a processing gas under a vacuum atmosphere. The substrate processing apparatus includes a chamber configured to accommodate the substrate and to be kept in the vacuum atmosphere; a substrate mounting table configured to mount the substrate thereon in the chamber; a gas introduction member configured to introduce a gas including the processing gas in the chamber; a partition wall member provided to be movable up and down in the chamber and configured to form a partition wall that defines a processing space in a region including the substrate above the substrate mounting table; and an elevating mechanism configured to move the partition wall member up and down.

Abstract: A substrate processing apparatus performs a predetermined process on a substrate by using a processing gas under a vacuum atmosphere. The substrate processing apparatus includes a chamber configured to accommodate the substrate and to be kept in the vacuum atmosphere; a substrate mounting table configured to mount the substrate thereon in the chamber; a gas introduction member configured to introduce a gas including the processing gas in the chamber; a partition wall member provided to be movable up and down in the chamber and configured to form a partition wall that defines a processing space in a region including the substrate above the substrate mounting table; and an elevating mechanism configured to move the partition wall member up and down.

Abstract: An electrodeionization apparatus for producing deionized water comprises a deionization treatment unit including deionization chamber D and a pair of concentration chambers C1 and C2 placed adjacent to deionization chamber D on opposite sides thereof and those concentration chambers are filled with anion exchangers. The deionization chamber D is partitioned by an ion exchange membrane into first small deionization chamber D-1 adjacent to concentration chamber C1 and second small deionization chamber D-2 adjacent to concentration chamber C2. First small deionization chamber D-1 is filled with an anion exchanger. Second small deionization chamber D-2 is filled with an anion exchanger and a cation exchanger in a sequence such that the ion exchanger, through which water that is to be treated finally passes, is the anion exchanger.

Abstract: Provided is an electrodeionization apparatus for producing deionized water, capable of removing or reducing a biased flow of electric current in a deionization chamber. In the electrodeionization apparatus for producing deionized water, at least one deionization treatment unit including the deionization chamber and a pair of concentration chambers adjacent to both sides of the deionization chamber is disposed between a cathode and an anode. In the deionization chamber, anion exchanger layers and cation exchanger layers are stacked in an order in which a last ion exchanger layer through which water to be treated passes is an anion exchanger layer. A bipolar membrane is formed on the cathode side of the anion exchanger layer in the deionization chamber. The anion exchange membrane of the bipolar membrane is in contact with the anion exchanger layer.

Abstract: An electrodeionization apparatus for producing deionized water comprises a deionization treatment unit including deionization chamber D and a pair of concentration chambers C1 and C2 placed adjacent to deionization chamber D on opposite sides thereof and those concentration chambers are filled with anion exchangers. The deionization chamber D is partitioned by an ion exchange membrane into first small deionization chamber D-1 adjacent to concentration chamber C1 and second small deionization chamber D-2 adjacent to concentration chamber C2. First small deionization chamber D-1 is filled with an anion exchanger. Second small deionization chamber D-2 is filled with an anion exchanger and a cation exchanger in a sequence such that the ion exchanger, through which water that is to be treated finally passes, is the anion exchanger.

Abstract: A prove apparatus includes a first and a second loading port for mounting therein two carriers facing each other, a wafer transfer mechanism having a rotation center between the loading ports, and a first and a second inspection unit being symmetrical to each other and disposed in accordance with the arrangement of the loading ports. In this configuration, wafers are directly transferred between the carrier and a wafer chuck of the inspection unit by the wafer transfer mechanism. The wafer transfer mechanism has three arms for unloading two wafers from the carrier. The prove apparatus has a compact size and achieves a high throughput.

Abstract: A prove apparatus includes a first and a second loading port for mounting therein two carriers facing each other, a wafer transfer mechanism having a rotation center between the loading ports, and a first and a second inspection unit being symmetrical to each other and disposed in accordance with the arrangement of the loading ports. In this configuration, wafers are directly transferred between the carrier and a wafer chuck of the inspection unit by the wafer transfer mechanism. The wafer transfer mechanism has three arms for unloading two wafers from the carrier. The prove apparatus has a compact size and achieves a high throughput.

Abstract: After passing alcoholic liquors 20 through an HSO3 type strongly basic anion exchange resin layer 14, or after adding an HSO3 salt to alcoholic liquors; the alcoholic liquors are passed through a mixed bed layer 18 containing of an H type strongly acidic cation exchange resin and a free base type weakly basic anion exchange resin, or the alcoholic liquors are successively passed through an H type strongly acidic cation exchange resin layer and a free base type weakly basic anion exchange resin layer. According to this way, it is possible to remove aldehydes and inorganic salts from alcoholic liquors such as brewed alcoholic liquors and distilled alcoholic liquors, while strongly retaining a peculiar fragrance or retaining a manneristic flavor.

Abstract: After passing alcoholic liquors 20 through an HSO3 type strongly basic anion exchange resin layer 14, or after adding an HSO3 salt to alcoholic liquors; the alcoholic liquors are passed through a mixed bed layer 18 containing of an H type strongly acidic cation exchange resin and a free base type weakly basic anion exchange resin, or the alcoholic liquors are successively passed through an H type strongly acidic cation exchange resin layer and a free base type weakly basic anion exchange resin layer. According to this way, it is possible to remove aldehydes and inorganic salts from alcoholic liquors such as brewed alcoholic liquors and distilled alcoholic liquors, while strongly retaining a peculiar fragrance or retaining a manneristic flavor.

Abstract: A container made of, e.g., polyethylene terephthalate is pulverized and decomposed in the presence of a catalyst by the use of a solvent such as an alcohol or glycol to obtain crude bishydroxyalkyl terephthalate. This crude bishydroxyalkyl terephthalate is then purified by filtration, a treatment with activated carbon, and a treatment with ion-exchange resins. The bishydroxyalkyl terephthalate thus obtained is condensed to produce a container or the like made of polyethylene terephthalate.

Abstract: By passing an alkali regenerating agent A through a basic anion exchange resin (3), and through a strongly acidic cation exchange resin (4), the basic anion exchange resin can be regenerated while amphoteric organic materials such as the amino acids captured at the strongly acidic cation exchange resin can be desorbed. Then, an acid regenerating agent B is passed through the strongly acidic cation exchange resin to regenerate the strongly acidic cation exchange resin.

Abstract: By passing an alkali regenerating agent A through a basic anion exchange resin (3), and through a strongly acidic cation exchange resin (4), the basic anion exchange resin can be regenerated while amphoteric organic materials such as the amino acids captured at the strongly acidic cation exchange resin can be desorbed. Then, an acid regenerating agent B is passed through the strongly acidic cation exchange resin to regenerate the strongly acidic cation exchange resin.

Abstract: By passing an alkali regenerating agent A through a basic anion exchange resin (3), and through a strongly acidic cation exchange resin (4), the basic anion exchange resin can be regenerated while amphoteric organic materials such as the amino acids captured at the strongly acidic cation exchange resin can be desorbed. Then, an acid regenerating agent B is passed through the strongly acidic cation exchange resin to regenerate the strongly acidic cation exchange resin.

Abstract: By passing an alkali regenerating agent A through a basic anion exchange resin (3), and through a strongly acidic cation exchange resin (4), the basic anion exchange resin can be regenerated while amphoteric organic materials such as the amino acids captured at the strongly acidic cation exchange resin can be desorbed. Then, an acid regenerating agent B is passed through the strongly acidic cation exchange resin to regenerate the strongly acidic cation exchange resin.