Abstract: A projection area (exposure area) on a wafer W, in which a mask pattern is transferred, is divided into, for example, four quadrants. A slit or X-shaped pattern is projected by a light-transmitting optical system so that a plurality of images are formed at a regular interval in the projection area on the wafer W. Luminous flux reflected from the images on the wafer W is received by a light-receiver and converted into photoelectric signals. A master controller calculates the focal values of the first through fourth quadrants along the optical axis based on the photoelectric signals. An optimum focal position and a leveling amount are determined based on the focal values of the first through fourth quadrants. Even if there are level differences in the wafer surface, the optimum focal position and the leveling amount can be accurately determined.

Abstract: A camera uses a film cartridge, which has an information recording disk which is rotatable integrally with a cartridge spool shaft and represents information inherent to a film, and feeds the film leading end portion from the cartridge by using a driver. A data detector reads the film information from the disk of the cartridge loaded in the camera. A nonvolatile memory stores the film information read from the disk. When the cartridge is loaded into the camera, the camera feeds the film leading end portion from the cartridge, reads the film information, and writes the read information in the memory. Another camera uses a film having two perforations per frame. The moving amount of the film fed by a motor controller is detected by a film driven roller rotation detector. A perforation on the film is detected by the perforation detector. Prior to at least the driving operation of the motor controller, information indicating the film feeding operation is stored in an EEPROM.

Abstract: A focusing operation is performed so that the center of an exposure region on a photosensitive substrate coincides with a focal point of a projection optical system, based on setting information of a variable field stop, which sets the exposure region. Even in a case where only a portion of an exposable region of the projection optical system PL is set as the exposure region using the variable field stop, and only the set portion is subjected to exposure, exposure is performed while the set exposure region is brought into accurate focus, thereby improving resolution. Accordingly, an appropriate focusing operation can be always performed so as to achieve high accuracy exposure, irrespective of variations in the shape of the exposure region.

Abstract: Disclosed is an exposure apparatus comprising a substrate holder washing unit and a substrate holder storing unit. While a substrate holder exported from an exposure stage is washed in the washing unit, a clean holder previously stored in the storing unit is transported to an X stage by using a robot hand and a transport arm, and it is installed to the X stage by using an attaching/detaching mechanism. The holder can be always maintained in a clean state without stopping the apparatus for a long period of time, resulting in improvement in throughput. Also disclosed is an exposure apparatus comprising a mechanism for cleaning a substrate holder by transporting a whetstone onto the holder, engaging the whetstone with an engaging member, and rotating the whetstone by using a rotary driving unit. The exposure apparatus is provided with a unit for drawing dust emerged upon cleaning with the whetstone.

Abstract: When a client sends an RPC request that requests a server for a service, the client adds identification information to the RPC request. When an active server receives an RPC request, it stores the identification information thereof in a stable area that is not destroyed even if a defect takes place in the client or the server, and executes the requested service. When a defect takes place in the active server, the backup server takes over the process of the active server. A PALIB of the backup server compares the identification information of the RPC request re-sent from the client with the identification information in the stable area. When they match, the PALIB determines that the RPC request is redundant. The backup server performs a redundant process and sends back the correct result to the client.

Abstract: A projection exposure method is provided for transferring a pattern formed on a mask through a projection optical system onto a plurality of shot areas on a photosensitive substrate respectively. Correction for inclination of the entire photosensitive substrate (global leveling) is performed during movement of the substrate for positioning for a first exposure shot (step 110). Leveling at each exposure position (chip leveling) is performed after positioning for each exposure shot (step 112), and then exposure is performed. Therefore, the leveling operation is divided, the correction amount for leveling at each exposure position is small, and the leveling is completed in a short period of time at the exposure position. Positional adjustment for the substrate in a direction of an optical axis is performed during movement of the substrate to a shot to be subsequently exposed. The leveling and the focusing can be accurately performed at each exposure shot position without extremely lowering the throughput.

Abstract: A substrate holding apparatus is provided with a plate-shaped substrated holding unit including a first surface having plural protruding portions coming into contact with a plate-shaped substrate. The apparatus is a substantially flat second surface and adapted to support the substrate on the substrate holding unit by suction and comprises a temperature regulating unit which is composed of a material of a high thermal conductivity and positioned as to contact the second surface, a heat discharging the heat from the substrate holding unit, and a heat discharge control unit for controlling the heat discharging property of the heat discharging unit.

Abstract: A measuring method comprises a first step to expose by the irradiation of a predetermined energy ray onto the resist layer of a photosensitive board a first mask pattern having at least two linear pattern portions arranged substantially in axial symmetry with respect to a straight line in a predetermined first direction and inclined at a predetermined angle to the straight line in the first direction, a second step to overlap with the first mask pattern image exposed on the resist layer a second mask pattern formed by the linear patterns which extend in a second direction substantially perpendicular to the first direction by relatively driving the second mask pattern in a predetermined amount in the first direction for exposure, and a third step to measure an interval in the second direction between at least two wedge-shaped resist images formed by the overlapped portions of the first mask pattern and the second mask pattern.

Abstract: In a stage slit type focus position detecting system, an opening pattern unit (11A) on a reticle (10) is illuminated with exposure light (IL1) from a light source system (1), and light passing through the opening pattern unit (11A) is received through a projection optical system (13) and a reference pattern plate (23). In a stage emission type focus position detecting system, the reference pattern plate (23) is illuminated with illuminating light from a light source (35), and light passing through the reference pattern plate (23) and further going and returning through the projection optical system (13) is received by a photoelectric detector (42). An oblique incidence type AF sensor has a light-transmitting system (24) and a converging optical system (28).

Abstract: A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system o

Abstract: An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.

Abstract: An exposure mask formed with a predetermined pattern for exposure on a substrate to be subjected to exposure comprises a glass substrate and a heat conductive film having a thermal conductivity higher than that of the glass substrate, wherein the heat conductive film is so formed as to cover substantially an entire surface of the glass substrate, and the pattern is so formed as to be in contact with the heat conductive film.

Abstract: A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive substrate, and images the image of the pattern on the photosensitive substrate in a predetermined imaging state. The apparatus also includes a temperature measurement sensor for measuring a change in temperature of the mask, a control system for calculating the change amount of the imaging state caused by the change in temperature, and a correction system for correcting the change in imaging state.

Abstract: A camera which reduces camera shake by adjusting the shutter timing is characterized in that it has a mode for displaying a camera shake amount to allow a photographer to recognize a camera shake. A shutter timing determining section permits shutter release at a timing at which the camera shake amount becomes a predetermined amount or less during a shutter release operation on the basis of the camera shake amount detected by a camera shake detecting section. When a camera shake learning mode is set through an input section, a camera shake amount is converted into a display amount by a display data converting section through a camera shake mode selecting section. This display amount is displayed on a display section in real time while a shutter release button is depressed.

Abstract: A one-chip microcomputer system includes a one-chip microcomputer, a nonvolatile memory which can electrically rewritably store changing data of a program stored in a mask ROM of the one-chip microcomputer, an input unit (connection unit) for receiving data to be written in the nonvolatile memory from an external device, and an object to be controlled by the one-chip microcomputer. In one aspect, the nonvolatile memory has first and second correction data areas, and first and second memories for respectively designating these areas. Upon reception of an initialization signal from the external device connected to the input unit, only the second memory for designating the second correction data area is initialized. In another aspect, the mask ROM stores ROM version data, and the nonvolatile memory stores board version data.

Abstract: To detect the height position of a substrate, a stop-plate having a plurality of slits applies light beams of elongated cross-section to the substrate obliquely. A sensor having a plurality of sensor elements receives light beams reflected from the substrate and outputs signals for controlling the height of the substrate. Additional light beams and sensor elements may be provided to output information regarding the direction of height deviation and the amount of height deviation.

Abstract: An inclination detecting apparatus is for detecting an inclination of a front surface of a transparent wafer placed on a perpendicular to an optical axis of a projection objective in an exposure apparatus. The inclination detecting apparatus includes an illumination optical system and a condenser optical system. The illumination optical system obliquely supplies a collimated beam onto the front surface of the wafer. The condenser optical system can condense the collimated beam supplied from the illumination optical system and reflected by the wafer, and it has a quartered photodetector for receiving the reflected beam and generating a position signal corresponding to a light receiving position. The apparatus further includes a first slit plate and a second slit plate located in the illumination optical system and the condenser optical system respectively.

Abstract: A plane positioning apparatus comprises a projector for projecting beams to a given portion on the surface of a substrate in a diagonal direction, a light receiving device to receive beams reflected from the substrate surface and output photoelectric signals in accordance with variation of the light receiving position, a calculating circuit to output deviation signals in accordance with the deviation amount of the substrate surface with respect to a predetermined fiducial plane based on the deviation signals, a substrate shifting device to shift and set the substrate at a given position in a direction perpendicular to the fiducial plane in accordance with the deviation signals, a level variation detecting device to detect level variation of the deviation signals generated when the substrate surface and the fiducial plane are displaced interrelatedly, an inclination calculating device to calculate, in accordance with the level variation characteristics, the value of the inclination of the level variation chara

Abstract: A method of projection exposure of a shot area on a substrate to a mask pattern by detecting, by a focus detection mechanism, an amount of defocus, in the axial direction of a projection optical system, of a measuring point on the substrate with reference to the focal plane of the projection optical system, then loading the substrate, and moving the substrate to a predetermined height by a Z-stage movable in the axial direction of the projection optical system, based on the value detected by the focus detection mechanism; thereby exposing a shot area of the substrate to the mask pattern.

Abstract: An inclination detecting device has a light emitting system for emitting a parallel light flux to a substrate; a light receiving system for condensing the light reflected from the substrate, detecting the reflected light photoelectrically and outputting a photoelectric signal in accordance with the intensity of the reflected light; a stop member for changing at least one of the shape and the size of an illumination area of the parallel light flux on the substrate; an adjusting unit for changing the intensity of the photoelectric signal in accordance with the change of at least one of the shape and the size of the illumination area defined by the stop member; and a unit for detecting an inclination of the substrate with respect to a predetermined reference plane based on the photoelectric signal from the light receiving system.