Patents by Inventor Yuji Kakazu

Yuji Kakazu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090256066
    Abstract: In a mass spectrometry system designed so as to feed a solution to an interface 20 between a separation analysis instrument (10) and amass spectrometer 50, an internal standard for mass calibration is mixed with the solution (an electrophoresis buffer solution 16 of capillary electrophoresis apparatus 10, a mobile phase of liquid chromatograph or a sheath solution for obtaining an electrical contact of the separation analysis instrument with the mass spectrometer), and a detected mass is calibrated. Thereby, it is possible to simply and conveniently calibrate the mass of a substance to be measured without using a calibration spray device or employing a post column introduction method.
    Type: Application
    Filed: July 31, 2006
    Publication date: October 15, 2009
    Applicant: Human Metabolme Technologies, Inc.
    Inventors: Tomoyoshi Soga, Yuji Kakazu, Masaru Tomita, Takamasa Ishikawa
  • Patent number: 6097469
    Abstract: A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold
    Type: Grant
    Filed: March 29, 1999
    Date of Patent: August 1, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Hidetami Yaegashi, Yasunori Kawakami, Jae Hoon Park, Keiko Kanzawa, Takayuki Katano, Takayuki Toshima, Yuji Kakazu
  • Patent number: 6017663
    Abstract: A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold
    Type: Grant
    Filed: March 29, 1999
    Date of Patent: January 25, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Hidetami Yaegashi, Yasunori Kawakami, Jae Hoon Park, Keiko Kanzawa, Takayuki Katano, Takayuki Toshima, Yuji Kakazu
  • Patent number: 5932380
    Abstract: A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold
    Type: Grant
    Filed: March 24, 1997
    Date of Patent: August 3, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Hidetami Yaegashi, Yasunori Kawakami, Jae Hoon Park, Keiko Kanzawa, Takayuki Katano, Takayuki Toshima, Yuji Kakazu
  • Patent number: 5434644
    Abstract: A filter device for a resist-treatment system, comprising a frame having an aperture through which the outside air is introduced into the resist-treatment system, a fan unit for sucking the outside air into the aperture, and a filter element supported by means of the frame so as to be situated at least on one side the fan unit, the filter element including a porous body containing an acid component capable of adsorbing an alkali component by reaction.
    Type: Grant
    Filed: May 18, 1994
    Date of Patent: July 18, 1995
    Assignee: Tokyo Electron Limited
    Inventors: Junichi Kitano, Misako Saitou, Yuji Kakazu