Abstract: A collecting device includes a collecting path for a developer, at least one transport member that is disposed in the collecting path and that transports the developer by rotating, a driving unit that drives, by receiving electric power, the transport member in such a manner that the transport member rotates, a detecting unit that detects a load applied to the driving unit due to transportation of the developer, and a control unit that controls the driving unit based on the load detected by the detecting unit.

Abstract: An imaging system (100) includes an imaging unit (140) configured to capture an image of a target object while the imaging unit (140) being mounted on a movable apparatus (500); and an exposure condition determination unit (161) configured to determine any one of a fixed exposure condition and an automatic exposure (AE) condition, as an exposure condition, based on a distance detected between the movable apparatus (500) and the target object.

Abstract: A charging device includes a charger, a cleaner, and a separator. The charger is configured to charge an image holding unit. The cleaner is configured to clean the charger. The separator is configured, when the charging device has not yet been used, to separate the charger from the image holding unit and separate the cleaner from the charger.

Abstract: A charging device includes a charger, a cleaner, and a separator. The charger is configured to charge an image holding unit. The cleaner is configured to clean the charger. The separator is configured, when the charging device has not yet been used, to separate the charger from the image holding unit and separate the cleaner from the charger.

Abstract: An image forming apparatus includes an image holding body that rotates, an image forming unit, and a return operation controller. The image forming unit includes a charger, an exposure unit, a developing unit, a transfer unit, and a cleaning unit. The return operation controller causes a clean-up step to be executed in which the image holding body is cleaned while rotating the image holding body when returning from an emergency stop. In the clean-up step, the return operation controller reduces or zeroes out a pressing force between the transfer unit and the image holding body at least until a developing operation area on a surface of the image holding body that is stopped upon the emergency stop facing toward a direction in which the developing unit operates passes through a pressing area pressed by the transfer unit.

Abstract: An image forming apparatus includes an image holding body that rotates, an image forming unit, and a return operation controller. The image forming unit includes a charger, an exposure unit, a developing unit, a transfer unit, and a cleaning unit, and these units sequentially operate along a rotating direction of the image holding body. The charger charges the image holding body with electricity. The exposure unit exposes the image holding body to light to form an electrostatic latent image. The developing unit includes a developing roller that feeds, while rotating, a developer including toner and a carrier to a developing area that faces the image holding body. The developing unit develops the electrostatic latent image with the toner and causes the image holding body to hold a toner image. The transfer unit transfers, while pressing a transfer-receiving body against the image holding body, the toner image on the image holding body to the transfer-receiving body.

Abstract: In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed by using mixed gas containing at least CF4 gas and C3H2F4 gas as its components.

Abstract: A method of increasing the yield of product semiconductor substrates includes the step of: (a) providing a monitor wafer over which a laminated film, which is similar to that over a product wafer and includes a conductor film such as an Al film, is formed; (b) etching the laminated film over the monitor wafer in a state where a photoresist film is not formed over the laminated film; and (c) irradiating the monitor wafer, placed over a stage of a foreign matter inspection apparatus, with laser light such that an etch residue (defect) is detected by its scattered light.

Abstract: In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed by using mixed gas containing at least CF4 gas and C3H2F4 gas as its components.

Abstract: A cleaning device includes a rotating brush that supplies lubricant to a surface of an image carrying member on which an end toner image is formed at a first axial end, a cleaning member provided on a downstream side of the rotating brush in a direction of rotation of the image carrying member and that cleans the image carrying member by scraping toner from the surface of the image carrying member, a storing portion that stores the toner scraped by the cleaning member, a transporting member that transports the toner in the storing portion from the first axial end of the image carrying member toward a second axial end of the image carrying member, and a moving member that moves the toner in the storing portion toward the rotating brush.

Abstract: An image forming apparatus includes a photosensitive member having first and second areas at different positions at an axial end of the photosensitive member, the first and second areas not overlapping an image area in an axial direction of the photosensitive member; a detecting unit that detects an image; and a forming unit that forms a transfer-object image in the image area, the transfer-object image being transferred to a transfer area of continuous-form paper, the forming unit further forming first and second images in the first and second areas of the photosensitive member, respectively, the first image not being transferred to the transfer area but being detected by the detecting unit for use in an operation of controlling conditions for image formation, the second image not being transferred to the transfer area and not being used in the operation of controlling the conditions for image formation.

Abstract: In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed by using mixed gas containing at least CF4 gas and C3H2F4 gas as its components.

Abstract: An image forming apparatus includes a photosensitive member that includes a photosensitive layer, the photosensitive layer being thicker at a first axial end of the photosensitive member than at a second axial end of the photosensitive member; and a forming unit that forms a first image and a second image on the photosensitive member, the first image being transferred to each of transfer areas defined on continuous-form paper, the second image being transferred to the first axial end but to neither a position between adjacent ones of the transfer areas that are side by side in a longitudinal direction of the continuous-form paper nor a position in any of the transfer areas.

Abstract: A cleaning device includes a rotating brush that supplies lubricant to a surface of an image carrying member on which an end toner image is formed at a first axial end, a cleaning member provided on a downstream side of the rotating brush in a direction of rotation of the image carrying member and that cleans the image carrying member by scraping toner from the surface of the image carrying member, a storing portion that stores the toner scraped by the cleaning member, a transporting member that transports the toner in the storing portion from the first axial end of the image carrying member toward a second axial end of the image carrying member, and a moving member that moves the toner in the storing portion toward the rotating brush.

Abstract: An image forming apparatus includes a photosensitive member that includes a photosensitive layer, the photosensitive layer being thicker at a first axial end of the photosensitive member than at a second axial end of the photosensitive member; and a forming unit that forms a first image and a second image on the photosensitive member, the first image being transferred to each of transfer areas defined on continuous-form paper, the second image being transferred to the first axial end but to neither a position between adjacent ones of the transfer areas that are side by side in a longitudinal direction of the continuous-form paper nor a position in any of the transfer areas.

Abstract: An image forming apparatus includes a photosensitive member having first and second areas at different positions at an axial end of the photosensitive member, the first and second areas not overlapping an image area in an axial direction of the photosensitive member; a detecting unit that detects an image; and a forming unit that forms a transfer-object image in the image area, the transfer-object image being transferred to a transfer area of continuous-form paper, the forming unit further forming first and second images in the first and second areas of the photosensitive member, respectively, the first image not being transferred to the transfer area but being detected by the detecting unit for use in an operation of controlling conditions for image formation, the second image not being transferred to the transfer area and not being used in the operation of controlling the conditions for image formation.

Abstract: In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed by using mixed gas containing at least CF4 gas and C3H2F4 gas as its components.

Abstract: In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed by using mixed gas containing at least CF4 gas and C3H2F4 gas as its components.

Abstract: In order to provide a semiconductor device with high reliability while manufacturing cost is being suppressed, dry etching for an insulating film is performed by using mixed gas containing at least CF4 gas and C3H2F4 gas as its components.

Abstract: A cell culture plate has a plurality of flow channels, uneven pattern areas and through holes. The flow channels are formed between the uneven pattern areas, and culture solution flows from the flow channels into the uneven pattern areas or from the uneven pattern areas into the flow channels. The uneven pattern area has uneven patterns that create a cell culture space.