Patents by Inventor Yuji Kimura

Yuji Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260168074
    Abstract: The film is formed using one of two film-forming materials. The first film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; particles containing a crystal phase of a rare earth element oxide; and particles containing a crystal phase of a rare earth element ammonium fluoride double salt. The second film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; and particles containing a crystal phase of a rare earth element oxide and a crystal phase of a rare earth element ammonium fluoride double salt. If a spray coated film is to be formed by means of thermal spraying using this film-forming material or film-forming slurry in particular, it is possible to form a rare earth element oxyfluoride spray coated film without the need for excessive heat.
    Type: Application
    Filed: February 10, 2026
    Publication date: June 18, 2026
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryo Iwasaki, Yuji Kimura, Shigeyuki Nakamura, Hajime Nakano, Kohei Maruko
  • Publication number: 20260159935
    Abstract: A sprayed film including a film surface in which a value of an area ratio S/A obtained by dividing a surface area S (?m2) of a portion of the measurement surface (S-L surface) of the film surface within one evaluation region by an area A (?m2) of a portion of a reference surface forming a plane located at an arithmetic average height of the measurement surface (S-L surface), which is within the evaluation region is 1.75 or more and 3 or less, and a surface roughness Sa of a portion of the measurement surface (S-L surface) within the evaluation region is 0.4 ?m or more and 8 ?m or less. Generation of particles which is caused by cracks of the sprayed film can be reduced when dry etching using gas plasma is performed with a semiconductor manufacturing apparatus or the like using the sprayed film as a corrosion-resistant film.
    Type: Application
    Filed: December 2, 2025
    Publication date: June 11, 2026
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryo IWASAKI, Ryusei NISHIMURA, Noboru YAMAMOTO, Yugo TANIGUCHI, Yukimi IWAMOTO, Toshihiko TSUKATANI, Yuji KIMURA, Shigeyuki NAKAMURA, Kouhei MARUKO
  • Patent number: 12614823
    Abstract: A protection element includes: an insulating substrate; a fuse element provided on the insulating substrate; a heating element to blow the fuse element; a heating element power supply electrode; a first extraction electrode leading from the heating element power supply electrode and connected to a first end of the heating element; an intermediate electrode connected to the fuse element; a heating element connecting electrode connecting the heating element and the intermediate electrode; a second extraction electrode leading from the heating element connection electrode and connected to a second end of the heating element; and an insulating layer that covers the heating element, the first extraction electrode, and the second extraction electrode, and on which the intermediate electrode is laminated. The intermediate electrode does not overlap with the first extraction electrode and overlaps with the second extraction electrode with the insulating layer interposed therebetween.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: April 28, 2026
    Assignee: Dexerials Corporation
    Inventors: Yuji Kimura, Chisato Komori
  • Patent number: 12595374
    Abstract: This thermal spray material including composite particles containing an yttrium oxide and an ammonium yttrium fluoride complex salt is used to form a thermal spray film comprising yttrium oxyfluoride formed by thermal-spraying in the air. When the thermal spray film is formed through thermal-spraying in the air by using the thermal spray material of the present invention, the loss of fluorine from the thermal spraying material during thermal-spraying is reduced, and a thermal spray film containing yttrium oxyfluoride can be formed by controlling a composition, so that a thermal spray film having a desired composition, particularly a desired F/Y, can be easily formed.
    Type: Grant
    Filed: January 13, 2021
    Date of Patent: April 7, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuji Kimura, Yasushi Takai, Shigeyuki Nakamura
  • Patent number: 12586823
    Abstract: Provided are a protecting device and a battery pack capable of preventing floating of a blowout member, preventing deformation of a meltable conductor, and maintaining predetermined current capacity and blowout properties. The protecting device 1 includes: a meltable conductor 2; and a blowout member 4 connected to one surface of the meltable conductor 2, wherein the blowout member 4 includes: an insulating substrate 3; and a deformation suppressing electrode 5 formed on a front surface 3a connected to the meltable conductor 2 of the insulating substrate 3 and connected to the meltable conductor 2 to suppress deformation of the meltable conductor 2.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: March 24, 2026
    Assignee: DEXERIALS CORPORATION
    Inventors: Yuji Kimura, Chisato Komori, Koichi Mukai
  • Patent number: 12577647
    Abstract: The film is formed using one of two film-forming materials. The first film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; particles containing a crystal phase of a rare earth element oxide; and particles containing a crystal phase of a rare earth element ammonium fluoride double salt. The second film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; and particles containing a crystal phase of a rare earth element oxide and a crystal phase of a rare earth element ammonium fluoride double salt. If a spray coated film is to be formed by means of thermal spraying using this film-forming material or film-forming slurry in particular, it is possible to form a rare earth element oxyfluoride spray coated film without the need for excessive heat.
    Type: Grant
    Filed: December 22, 2021
    Date of Patent: March 17, 2026
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryo Iwasaki, Yuji Kimura, Shigeyuki Nakamura, Hajime Nakano, Kohei Maruko
  • Patent number: 12561401
    Abstract: The invention provides a method which can contribute to an improvement in KPIs even in the entire time series range through an input stage to an AI engine and its output stage. As a preferred embodiment of the invention, an information processing device using an AI engine is provided, which includes an arithmetic section and a storage section. In the information processing device, the arithmetic section executes an important KPI reception unit which receives important KPI information designated by a user, and a variable selection unit which selects an input variable input to the AI engine, on the basis of the important KPI information.
    Type: Grant
    Filed: October 27, 2022
    Date of Patent: February 24, 2026
    Assignee: HITACHI, LTD.
    Inventors: Hiroyuki Takahira, Yuji Kimura
  • Publication number: 20260018433
    Abstract: A substrate processing method includes: receiving, by a transfer arm, a substrate from a batch processing section in which a plurality of substrates is collectively processed in a state where each of the plurality of substrates stands upright; disposing the substrate on a disposing unit including a pin, a first liquid film being formed on an upper surface of the substrate from a process in the batch processing section; supplying a pure water toward the upper surface of the substrate, thereby forming a second liquid film of the pure water on the upper surface of the substrate; stop supplying the pure water and maintaining the second liquid film on the upper surface of the substrate for a predetermined time, and transporting the substrate to a single wafer processing section in which the plurality of substrates are processed one by one in a horizontal state.
    Type: Application
    Filed: September 22, 2025
    Publication date: January 15, 2026
    Inventors: Keita HIRASE, Yukiyoshi SAITO, Akihiro TERAMOTO, Koji TANAKA, Shota TAKEI, Masataka GOSHO, Kazuaki KITAMURA, Shinichi IKEDA, Shunsuke KURIZAKI, Yuji KIMURA
  • Patent number: 12474297
    Abstract: A microparticle trapping device includes: a fluid channel configured to be injected with a fluid including a microparticle; first and second electrodes configured to generate an electric field in the fluid channel; and an electrical insulator formed with at least one opening between the first and second electrodes in the fluid channel. The electrical insulator is disposed between the first and second electrodes so that an inhomogeneous electric field is made through the at least one opening between the first and second electrodes in the fluid channel, and the still other aspect is configured to trap the microparticle through dielectrophoresis.
    Type: Grant
    Filed: December 10, 2021
    Date of Patent: November 18, 2025
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yuji Kimura, Kazuya Suzuki, Ryo Makino, Hiroyasu Itoh
  • Patent number: 12444623
    Abstract: A substrate processing system includes: a carry-in/out section in which a cassette accommodating a plurality of substrates is carried in/out; a batch processing section in which a wafer lot including the plurality of substrates is collectively processed in a state where each of the plurality of substrates stand upright; a single-wafer processing section in which the plurality of substrates included in the wafer lot are processed one by one in a horizontal state; and an interface section that delivers the plurality of substrates from the batch processing section to the single-wafer processing section. The interface section includes: a standby table that horizontally holds a substrate in a state of being in contact with pure water; and a transfer mechanism that delivers the substrate from the batch processing section to the standby table.
    Type: Grant
    Filed: February 28, 2023
    Date of Patent: October 14, 2025
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Keita Hirase, Yukiyoshi Saito, Akihiro Teramoto, Koji Tanaka, Shota Takei, Masataka Gosho, Kazuaki Kitamura, Shinichi Ikeda, Shunsuke Kurizaki, Yuji Kimura
  • Publication number: 20250310687
    Abstract: A drive circuit includes an amplifier configured to amplify an input signal, and supply the amplified input signal as a drive signal to a piezoelectric element of a MEMS (Miro-Electro-Mechanical Systems) speaker driven by a piezoelectric element; and an offset generator configured to generate an offset such that a minimum absolute value of a voltage of the drive signal is greater than or equal to a positive predetermined voltage.
    Type: Application
    Filed: March 5, 2025
    Publication date: October 2, 2025
    Applicant: MITSUMI ELECTRIC CO., LTD.
    Inventors: Yuji KIMURA, Maiko NAGAWATARI, Motoki KOMATSU
  • Publication number: 20250266271
    Abstract: A processing liquid supply system includes a processing liquid supply for supplying a processing liquid into a processing tub in which a substrate is immersed to be processed; a circulation path for allowing the processing liquid to flow out from the processing tub and return back into the processing tub; a pump and a flowmeter provided in the circulation path; and a controller. The controller performs: storing the processing liquid in the processing tub; filling the circulation path with the processing liquid; circulating the processing liquid through the circulation path by operating, after the filling of the circulation path, the pump such that the processing liquid reaches a predetermined initial set flow rate; and operating, after a timepoint when a measurement value of the flowmeter has reached the initial set flow rate, the pump to achieve a predetermined processing set flow rate at which the substrate is processed.
    Type: Application
    Filed: February 14, 2025
    Publication date: August 21, 2025
    Applicant: Tokyo Electron Limited
    Inventors: Hisashi MORITA, Yuji KIMURA, Yusuke YAMAMOTO
  • Publication number: 20250259861
    Abstract: A processing liquid supply system includes a processing liquid supply path, a pump, a pressure gauge and a flowmeter, and a controller. Through the processing liquid supply path, a processing liquid is supplied to a substrate processing device configured to process a substrate. The pump is provided in the processing liquid supply path. The pressure gauge and the flowmeter are provided downstream of the pump in the processing liquid supply path. The controller controls individual components. The controller detects abnormality in supply of the processing liquid based on a measurement value of the pressure gauge and a measurement value of the flowmeter.
    Type: Application
    Filed: February 7, 2025
    Publication date: August 14, 2025
    Applicant: Tokyo Electron Limited
    Inventors: Hisashi MORITA, Yuji KIMURA, Yusuke YAMAMOTO, Takashi NAGAI
  • Publication number: 20250244740
    Abstract: A processing method is a processing method for processing a processing target object held by a holding tool, and acquires holding tool information related to a position of a reference part of the holding tool placed in the processing apparatus, in a processing coordinate system; sets the holding tool in a measurement apparatus; acquires, by using the measurement apparatus, measurement information including information related to a three-dimensional shape of the processing target object in a measurement coordinate system and information related to a position of the reference part in the measurement coordinate system; generates processing path information based on the measurement information and the holding tool information; places the holding tool, which has been taken out of the measurement apparatus, in the processing apparatus; and processes the processing target object on the holding tool placed in the processing apparatus based on the processing path information.
    Type: Application
    Filed: April 6, 2022
    Publication date: July 31, 2025
    Applicant: NIKON CORPORATION
    Inventors: Norihito TAKIGUCHI, Yusuke NAKAUNE, Shun WATANABE, Yu ENDO, Yuji KIMURA, Tomoya NAKAGAWA
  • Publication number: 20250167022
    Abstract: A substrate standby device configured to allow a substrate to standby is provided. The substrate has a first liquid film adhering to a top surface and a bottom surface thereof. The substrate standby device includes a processing liquid supply configured to supply a processing liquid to the top surface of the substrate; a mass measuring device configured to measure a mass of the substrate; a first imaging device configured to acquire a top surface image; and a controller. The controller performs: forming a second liquid film by supplying a first amount of the processing liquid to the top surface of the substrate; measuring a mass of the second liquid film; acquiring the top surface image; and determining a state of the second liquid film based on the top surface image when the mass of the second liquid film is equal to or greater than a first threshold.
    Type: Application
    Filed: November 15, 2024
    Publication date: May 22, 2025
    Inventors: Keita Hirase, Koji Tanaka, Yuji Kimura, Shota Takei, Masataka Gosho, Seiji Togawa, Kazuaki Kitamura, Yuji Hagishima, Tomoaki Ohara, Atsushi Egashira
  • Publication number: 20250157765
    Abstract: Provided is a protecting device with a built-in heat generator that can handle higher voltages and higher currents and blows the current path more safely and quickly without causing damage inside the device.
    Type: Application
    Filed: December 26, 2022
    Publication date: May 15, 2025
    Applicant: DEXERIALS CORPORATION
    Inventors: Yuji KIMURA, Chisato KOMORI, Atsuya YOSHINARI
  • Patent number: 12283723
    Abstract: To provide a protecting device and a battery pack using the same, which are less likely to cause a spark even when a high voltage is applied and can safely and quickly interrupt the current path.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: April 22, 2025
    Assignee: DEXERIALS CORPORATION
    Inventors: Yuji Kimura, Chisato Komori
  • Publication number: 20250095934
    Abstract: Even when the blowing member generates heat over a long period of time, the fixing state of the blowing member is stabilized and the current path is interrupted safely and quickly. A protecting device 1 includes a case 28, a fuse element 2, a blowing member 3 connected to at least one side of the fuse element 2 to blow the fuse element 2,a fixing member 8 provided on an inner surface of the case 28 and in contact with the blowing member 3 to suppress the wobbling of the blowing member 3, the blowing member 3 has an insulating substrate 4 and a heat generator 5 formed on the insulating 10 substrate 4, and the insulating substrate 4 is connected to the fuse element 2 by a bonding material 9 that is softened by the heat generated by the heat generator 5.
    Type: Application
    Filed: December 26, 2022
    Publication date: March 20, 2025
    Applicant: DEXERIALS CORPORATION
    Inventor: Yuji KIMURA
  • Patent number: 12228126
    Abstract: In a liquid supply device, the pump unit has a discharge port for discharging a fluid. The connecting portion is connected to the discharge port. The first and second pipe portions and branch off from the connecting portion. The first introduction unit is connected to the first pipe portion and introduces a first liquid into the first flow channel at a flow rate corresponding to a flow rate of the fluid flowing through the first pipe portion. The second introduction unit is connected to the second pipe portion and introduces a second liquid into the first flow channel at a flow rate corresponding to a flow rate of the fluid flowing through the second pipe portion. The stopping portion stops the flow of the fluid in the second pipe portion.
    Type: Grant
    Filed: February 19, 2020
    Date of Patent: February 18, 2025
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yuji Kimura, Hiroyasu Itoh
  • Publication number: 20240301540
    Abstract: The film is formed using one of two film-forming materials. The first film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; particles containing a crystal phase of a rare earth element oxide; and particles containing a crystal phase of a rare earth element ammonium fluoride double salt. The second film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; and particles containing a crystal phase of a rare earth element oxide and a crystal phase of a rare earth element ammonium fluoride double salt. If a spray coated film is to be formed by means of thermal spraying using this film-forming material or film-forming slurry in particular, it is possible to form a rare earth element oxyfluoride spray coated film without the need for excessive heat.
    Type: Application
    Filed: December 22, 2021
    Publication date: September 12, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryo Iwasaki, Yuji Kimura, Shigeyuki Nakamura, Hajime Nakano, Kohei Maruko