Patents by Inventor Yuji Kobiyama

Yuji Kobiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for analyzing a group of photolithographic masks
    Patent number: 8264535
    Abstract: The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: September 11, 2012
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Oliver Kienzle, Rigo Richter, Norbert Rosenkranz, Yuji Kobiyama, Thomas Scheruebl
  • METHOD AND APPARATUS FOR ANALYZING A GROUP OF PHOTOLITHOGRAPHIC MASKS
    Publication number: 20100157046
    Abstract: The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated.
    Type: Application
    Filed: July 11, 2008
    Publication date: June 24, 2010
    Inventors: Oliver Kienzle, Rigo Richter, Norbert Rosenkranz, Yuji Kobiyama, Thomas Scheruebl