Abstract: There is provided a catalyst composition for polymerizing a conjugated diene monomer containing a rare earth complex having a specific structure and a specific compound.

Abstract: An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by the stage, a controller configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage to move to scan the substrate along the straight line. The controller is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.

Abstract: An exposure apparatus for exposing a shot region on a substrate includes a movable stage, a projection optical system, a measuring device configured to measure a position of a partial region of a surface of the substrate, and a controller configured to cause the measuring device to measure the position with respect to each of a plurality of measurement points of each of a plurality of shot regions, to determine a global shape of the surface based on the measured positions, to calculate a correction value with respect to each of the plurality of measurement points based on the determined global shape, and to move the stage based on measurement values corrected using the respective correction values corresponding to the respective measurement points.

Abstract: An exposure apparatus includes a projection optical system for projecting light from a reticle onto a substrate, and exposes a shot region of the substrate to radiant energy via the reticle and the projection optical system. The exposure apparatus comprises a substrate stage configured to hold the substrate and to be moved, a console configured to set a valid area inside the shot region, a measuring device configured to measure a position of a surface of the substrate in a direction parallel to an optical axis of the projection optical system, and a controller configured to control a position of the substrate stage based on the position of the surface measured by the measuring device at a measurement point in the valid area set by the console, the measurement point being determined in accordance with a position of the substrate relative to the measuring device.

Abstract: A measuring apparatus for measuring a position of a surface of an object while the object is scanned in a scanning direction in an X-Y plane.

Abstract: An exposure apparatus for exposing a shot region on a substrate includes a stage configured to hold and move the substrate, a projection optical system configured to project light onto the substrate, a measuring unit configured to measure a position of a partial region of a surface of the substrate, and a control unit configured to cause the measuring unit to measure the position with respect to each of a plurality of measurement points of each of a plurality of shot regions on the substrate, to determine a global shape of the surface based on the measured position, to calculate a correction value with respect to each of the plurality of measurement points based on the determined global shape, and to move the stage based on a measurement value corrected using the correction value corresponding to each of the plurality of measurement points.

Abstract: A measuring apparatus for measuring a position of a surface of an object while the object is scanned in a scanning direction in an X-Y plane.

Abstract: A method of measuring a position of a surface of an object while the object is scanned relative to a detection unit in a scanning direction in an X-Y plane. The detection unit is configured to detect the position of the surface in a Z direction perpendicular to the X-Y plane.

Abstract: An exposure apparatus for exposing a shot region on a substrate includes a movable stage, a projection optical system, a measuring device configured to measure a position of a partial region of a surface of the substrate, and a controller configured to cause the measuring device to measure the position with respect to each of a plurality of measurement points of each of a plurality of shot regions, to determine a global shape of the surface based on the measured positions, to calculate a correction value with respect to each of the plurality of measurement points based on the determined global shape, and to move the stage based on measurement values corrected using the respective correction values corresponding to the respective measurement points.

Abstract: An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by the stage, a controller configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage to move to scan the substrate along the straight line. The controller is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.

Abstract: An exposure apparatus for exposing a substrate. A stage holds and moves the substrate, a measuring device measures a position of a surface of the substrate, and a controller defines an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and causes the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions, while the stage moves the substrate along the straight line. A timing at which the measuring device measures a position of the surface is controlled so that a first time interval and a second time interval are different from each other.

Abstract: An exposure apparatus includes a projection optical system for projecting light from a reticle onto a substrate, and exposes a shot region of the substrate to radiant energy via the reticle and the projection optical system. The exposure apparatus comprises a substrate stage configured to hold the substrate and to be moved, a console configured to set a valid area inside the shot region, a measuring device configured to measure a position of a surface of the substrate in a direction parallel to an optical axis of the projection optical system, and a controller configured to control a position of the substrate stage based on the position of the surface measured by the measuring device at a measurement point in the valid area set by the console, the measurement point being determined in accordance with a position of the substrate relative to the measuring device.

Abstract: An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by the stage, a controller configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage to move to scan the substrate along the straight line. The controller is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.

Abstract: An exposure apparatus for exposing a substrate moving in a scan direction to light directed via an original. The apparatus includes a projection optical system configured to image a pattern of the original on the substrate, a substrate stage configured to hold the substrate and to move, and a detector configured to detect a surface position of the substrate, held and moved in the scan direction at a scan speed by the substrate stage, in a direction parallel to an optical axis of the projection optical system over a detection region preset on the substrate.

Abstract: A piezoelectric diaphragm has principal-surface electrodes formed on upper and lower principal surfaces of a multilayer ceramic body. An internal electrode is disposed in an interface between adjacent piezoelectric ceramic layers. The upper and lower principal surfaces of the multilayer ceramic body are substantially entirely covered with a resin layer. A first cutout is formed in a side-edge portion, along the first side surface electrode, of the upper resin layer such that the upper principal-surface electrode is partially exposed in the first cutout. A second cutout is formed in a side-edge portion, along the first side surface electrode, of the lower resin layer such that the lower principal-surface electrode is partially exposed in the second cutout. The locations of the first and second cutouts formed in the upper and lower resin layers, respectively, are selected such that they do not oppose each other.

Abstract: An exposure apparatus for exposing a substrate moving in a scan direction to light directed via an original. The apparatus includes a projection optical system configured to image a pattern of the original on the substrate, a substrate stage configured to hold the substrate and to move, and a detector configured to detect a surface position of the substrate, held and moved in the scan direction at a scan speed by the substrate stage, in a direction parallel to an optical axis of the projection optical system over a detection region preset on the substrate.

Abstract: An exposure apparatus has a surface position detection apparatus for measuring the surface position of a measurement area on the surface of a wafer. The surface position detection apparatus scans a shot area on the wafer having a pattern structure and detects the surface position of a measuring point provided within the shot. Prior to detecting the surface position of the measuring points within the shot, drive parameters for the surface position detection apparatus are determined according to a scanning speed employed for the shot in order that a measurement area of the surface position detection apparatus for the measuring points assumes a preset size. The surface position detection apparatus is then driven according to the parameters so determined, measuring the surface position of the measuring point in the shot. The exposure process is then controlled in accordance with the results of those measurements.

Abstract: Disclosed is a method of measuring a position of a surface of an object while relatively scanning the object and a detecting unit, wherein the method includes (i) a first measuring step for relatively scanning the detecting unit and a first object in a plurality of directions and for measuring, with respect to each of the plurality of directions, a surface position of the first object, (ii) a calculating step for calculating a corrective amount for correcting a surface position to be provided by the detecting unit, on the basis of the surface positions obtained with respect to the plurality of directions at the first measuring step, (iii) a second measuring step for measuring a surface position of a second object while relatively scanning the detecting unit and the second object in any one of the plurality of directions, and (iv) a correcting step for correcting the surface position of the second object obtained by said second measuring step, on the basis of the corrective amount obtained by the calculating s

Abstract: A piezoelectric electroacoustic transducer includes a piezoelectric diaphragm having a substantially rectangular shape which vibrates in the thickness direction when an alternating current is applied between electrodes of the piezoelectric diaphragm, a housing which stores the piezoelectric diaphragm, and a pair of terminals formed in the housing by insert molding. One end of each terminal is inserted inside the housing and includes a body portion fixed to the housing and wing portions which extend from both sides of the body portion toward the corners of the housing. The wing portions are not fixed to the housing, and stress-relieving portions are disposed between the body portion and the wing portions so that the wing portions are able to move toward the inside of the housing. Each electrode of the piezoelectric diaphragm is connected to at least one of the wing portions of the terminals by a conductive adhesive.

Abstract: A piezoelectric diaphragm has principal-surface electrodes formed on upper and lower principal surfaces of a multilayer ceramic body. An internal electrode is disposed in an interface between adjacent piezoelectric ceramic layers. The upper and lower principal surfaces of the multilayer ceramic body are substantially entirely covered with a resin layer. A first cutout is formed in a side-edge portion, along the first side surface electrode, of the upper resin layer such that the upper principal-surface electrode is partially exposed in the first cutout. A second cutout is formed in a side-edge portion, along the first side surface electrode, of the lower resin layer such that the lower principal-surface electrode is partially exposed in the second cutout. The locations of the first and second cutouts formed in the upper and lower resin layers, respectively, are selected such that they do not oppose each other.