Abstract: An exposure apparatus includes an optical system configured to expose a substrate. The optical system includes an optical member, a holding portion which holds the optical member, a pressing portion which presses the holding portion and the optical member against each other, and a sealed adhesive material which is filled in a space formed by the optical member and the holding portion pressed against each other, and adheres the optical member and the holding portion to each other.

Abstract: An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.

Abstract: The present invention provides a holding apparatus which includes a base having, on a surface thereof, a convex portion for supporting a back surface of a substrate and a containing portion for containing a liquid, and supports the substrate via the convex portion and the liquid, the apparatus including a heat storage structure including a latent heat storage member configured to store heat transferred from the substrate, and arranged in the containing portion, and a member configured to exert, to the heat storage structure, a force in a first direction from the base to the substrate.

Abstract: An exposure apparatus includes an optical system configured to expose a substrate. The optical system includes an optical member, a holding portion which holds the optical member, a pressing portion which presses the holding portion and the optical member against each other, and a sealed adhesive material which is filled in a space formed by the optical member and the holding portion pressed against each other, and adheres the optical member and the holding portion to each other.

Abstract: A holding apparatus includes a base provided with a protrusion for supporting a substrate, and holds the substrate via liquid with which a gap between the substrate supported by the protrusion and the base is filled. The holding apparatus includes a heat storage member arranged on the base to be covered with the liquid. The heat storage member includes a latent heat storage material, and a heat conduction material containing the latent heat storage material to conduct heat to the latent heat storage material.

Abstract: An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.