Patents by Inventor Yuji Matsui

Yuji Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5164792
    Abstract: A table carrier system of the present invention has a movable table for carrying an object. A displacement detecting system for detecting the displacement of the table by using an interference of light, and a table driving system positions the table according to the detected displacement. If a scaling amount is set in order to change a predetermined displacement range of the table, a reference value of wavelength set in the detecting system is changed in compliance with the scaling amount.
    Type: Grant
    Filed: July 20, 1990
    Date of Patent: November 17, 1992
    Assignee: Asahi Kogaku Kogyo Kabushiki Kaisha
    Inventors: Yuji Matsui, deceased, by Michiko Matsui, legal representative, Jun Nonaka
  • Patent number: 5117106
    Abstract: A scanning pattern drawing apparatus which scans the surface of a workpiece with a light beam so that a pattern is described on the workpiece with the issued light beam being controlled on the basis of pattern drawing data stored in a pattern memory, wherein the pattern drawing apparatus is able to read many pieces of data in a short period of time even if the frequency of the timing pulses is reduced and which therefore is capable of drawing a precise pattern on a workpiece. A scanning pulse generator produces as scanning pulse in response to a predetermined amount of scanning with the light beam. The scanning pulse is converted to a plurality of resulting timing pulses, and successive parallel outputs of the timing pulses are produced after delaying by a predetermined time. The pattern drawing data is read from the pattern memory in response to the delayed timing pulses.
    Type: Grant
    Filed: June 23, 1991
    Date of Patent: May 26, 1992
    Assignee: Asahi Kogaku Kogyo K.K.
    Inventors: Hiroaki Andon, Michio Ohshima, Yuji Matsui, Takashi Okuyama, Toshitaka Yoshimura, Hidetaka Yamaguchi, Yasushi Ikeda, Jun Nonoka, Tamihiro Miyoshi, Mitsuo Kakimoto, Masatoshi Iwama, Hideyuki Morita, Satoru Tachihara, Akira Morimoto, Akira Ohwaki
  • Patent number: 5093561
    Abstract: A drawing surface adjusting mechanism suitable for use with a large scanning pattern drawing apparatus in which a scanning optical system scans drawing rays of light along scanning lines on a workpiece on a drawing board. A plurality of light-emitting units project rays of light in a wavelength region outside a sensitivity range of the workpiece onto a drawing surface of the workpiece in such a way that the rays substantially converge at more than one point along a scanning line of the drawing rays of light, preferably at center and end points along the scanning line. A plurality of condenser lenses are provided for focusing beams of light from the plural light-emitting units after the beams have been reflected by the drawing surface. A plurality of light-detecting elements are disposed at points of condensation by respective ones of the condenser lenses to produce output signals representing differences in condensation points that occur as the lenses depart from or approach the drawing surface.
    Type: Grant
    Filed: July 18, 1991
    Date of Patent: March 3, 1992
    Assignee: Asahi Kogaku Kogyo K.K.
    Inventors: Hiroaki Andoh, Michio Ohshima, Yuji Matsui, Takashi Okuyama, Toshitaka Yoshimura, Hidetaka Yamaguchi, Yasushi Ikeda, Jun Nonaka, Tamihiro Miyoshi, Mitsuo Kakimoto, Masatoshi Iwama, Hideyuki Morita, Satoru Tachihara, Akira Morimoto, Akira Ohwaki
  • Patent number: 5078474
    Abstract: An exposure apparatus for use in fabricating a printed circuit board. A thermally-written liquid-crystal light valve is provided in which a pattern is formed by opaque portions and transparent portions. A writing optical system directs a heating spot light onto the light valve. The light valve and/or the heating spot light is movable, relative to the other. A projecting optical system is arranged which transmits a luminous flux emitted from a light source, through a liquid-crystal layer within the liquid-crystal light valve. The projecting optical system illuminates a subject with the transmitted luminous flux.
    Type: Grant
    Filed: November 21, 1990
    Date of Patent: January 7, 1992
    Assignee: Asaki Kogaku Kogyo Kabushiki Kaisha
    Inventors: Masatoshi Marui, Tomonori Inage, Yuji Matsui, Tazuko Ishizuka
  • Patent number: 5062692
    Abstract: An exposure apparatus for use in fabricating a printed circuit board. A thermally-written liquid-crystal light valve is provided in which a pattern is formed by opaque portions and transparent portions. A writing optical system directs a heating spot light onto the light valve. The light valve and/or the heating spot light is movable, relative to the other. A projecting optical system is arranged which transmits a luminous flux emitted from a light source, through a liquid-crystal layer within the liquid-crystal light valve. The projecting optical system illuminates a subject with the transmitted luminous flux.
    Type: Grant
    Filed: November 21, 1990
    Date of Patent: November 5, 1991
    Assignee: Asahi Kogaku Kogyo Kabushiki Kaisha
    Inventors: Masatoshi Marui, Tomonori Inage, Yuji Matsui, Tazuko Ishizuka
  • Patent number: 5046796
    Abstract: An apparatus for correcting a scranning beam produced by a polygonal mirror tilting in small surface segments in each mirror surface segment caused by uneven mirror surfaces of the polygonal mirror. Data indicative of the amount of tilting in each of the surface segments is stored in a memory, which is addressed by a data signal indicative of the present scanning position of the polygonal mirror. Output data from the memory is applied to an acousto-optical modulator disposed in the beam path between the light source and the polygonal mirror.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: September 10, 1991
    Assignee: Asahi Kogaku Kogyo K.K.
    Inventors: Hiroaki Andoh, Michio Ohshima, Yuji Matsui, Takashi Okuyama, Toshitaka Yoshimura, Hidetaka Yamaguchi, Yasushi Ikeda, Jun Nonaka, Tamihiro Miyoshi, Mitsuo Kakimoto, Masatoshi Iwama, Hideyuki Morita, Satoru Tachihara, Akira Morimoto, Akira Ohwaki
  • Patent number: 5043566
    Abstract: A monitor mechanism for use with a scanning optical apparatus in which the direction of polarization is utilized to separate a source laser light beam into a pattern drawing and a monitor beamlet and to synthesize them again into a single after passing through a scanning lens and beam deflector. The two beamlets can thus be controlled so as to project towards the deflector and scanning lens in the same direction, which is effective in reducing the offset between the pattern drawing and monitor beams that may occur on account of such factors as variations in lens performance.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: August 27, 1991
    Assignee: Asahi Kogaku Kogyo Kabushiki Kaisha
    Inventors: Hiroaki Andoh, Michio Ohshima, Yuji Matsui, Takashi Okuyama, Toshitaka Yoshimura, Hidetaka Yamaguchi, Yasushi Ikeda, Jun Nonaka, Tamihiro Miyoshi, Mitsuo Kakimoto, Masatoshi Iwama, Hideyuki Morita, Satoru Tachihara, Akira Morimoto, Akira Ohwaki
  • Patent number: 5027137
    Abstract: A drawing surface adjusting mechanism for use with a scanning pattern drawing apparatus capable of not only moving a drawing board in a vertical direction but also tilting it, whereby the chance of bringing the drawing surface within the depth of focus of a scanning lens is increased even if the drawing surface has waviness or other flaws within the width of a single storke of scanning.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: June 25, 1991
    Assignee: Asahi Kogaku Kogyo K.K.
    Inventors: Hiroaki Andoh, Michio Ohshima, Yuji Matsui, Takashi Okuyama, Toshitaka Yoshimura, Hidetaka Yamaguchi, Yasushi Ikeda, Jun Nonaka, Tamihiro Miyoshi, Mitsuo Kakimoto, Masatoshi Iwama, Hideyuki Morita, Satoru Tachihara, Akira Morimoto, Akira Ohwaki
  • Patent number: 5017949
    Abstract: A table assembly that is simple in construction and which yet resists yawing in an effective way and is adapted for use with a scanning pattern drawing apparatus which involves continuous movements of the table. The inventive table assembly includes a master table that is slidable in one direction with respect to a fixed portion of the overall assembly and to which a drive force for causing the table to slide in the one direction is transmitted directly, and a working table that is slidable in the one direction with respect to the fixed portion and which is linked to the master table by connecting means having rigidity in the one direction and elasticity in a direction perpendicular to the one direction.
    Type: Grant
    Filed: December 1, 1989
    Date of Patent: May 21, 1991
    Assignee: Asahi Kogaku Kogyo K.K.
    Inventors: Hiroaki Andoh, Michio Ohshima, Yuji Matsui, Takashi Okuyama, Toshitaka Yoshimura, Hidetaka Yamaguchi, Yasushi Ikeda, Jun Nonaka, Tamihiro Miyoshi, Mitsuo Kakimoto, Masatoshi Iwama, Hideyuki Morita, Satoru Tachihara, Akira Morimoto, Akira Ohwaki
  • Patent number: 4797307
    Abstract: A process for the production of a polyimide film having an increased adhesiveness which includes the steps of: evenly coating a surface treating solution which contains a heat-resistant surface treating agent of aminosilane type, epoxysilane type or titanate type in an amount not less than 0.5 wt. % on a surface of a solid film comprising an aromatic polymer composition which contains 100 parts by weight of an aromatic polyamic acid and 5-150 parts by weight of an organic polar solvent and heating the solid film having the coated surface treating solution at a temperature of 100.degree.-600.degree. C., to imidize the polyamic acid constituting the solid film as well as to dry the film.
    Type: Grant
    Filed: May 14, 1987
    Date of Patent: January 10, 1989
    Assignee: Ube Industries, Ltd.
    Inventors: Akihiro Kunimoto, Seiichiro Takabayashi, Yuji Matsui
  • Patent number: 4725484
    Abstract: A dimensionally stable polyimide film and processes for the preparation thereof. The polyimide film is composed of an aromatic polyimide obtained from a solution of a polymer formed by polymerization of a biphenyl-tetracarboxylic acid and a phenylene diamine, wherein the average linear expansion coefficient of the polyimide film in the temperature range of from 50.degree. C. to 300.degree. C. is 0.1.times.10.sup.-5 to 2.5.times.10.sup.-5 cm/cm..degree.C., the ratio of the linear expansion coefficient in the machine direction of the film to the linear expansion coefficient in the transverse direction of the film is in the range of from 1/5 to 4, and the thermal dimension stability expressed by the ratio of the change of the size of the film at normal temperature after the heat treatment where the temperature is elevated to 400.degree. C. from normal temperature and the film is maintained at 400.degree. C. for 2 hours is less than 0.3%.
    Type: Grant
    Filed: May 16, 1986
    Date of Patent: February 16, 1988
    Assignee: Ube Industries, Ltd.
    Inventors: Kiyoshi Kumagawa, Kenji Kuniyasu, Toshiyuki Nishino, Yuji Matsui