Abstract: A plasma processing apparatus, to which process control such as APC is applied, includes: a processing chamber in which plasma processing is performed on a sample; and a plasma processing control device which performs control to optimize a condition for plasma processing which recovers the status inside a processing chamber, in which plasma processing is performed, based on a waiting time from the time when plasma processing for a second lot, which is a lot immediately before a first lot, is completed to the time when plasma processing for the first lot is started, and the content of plasma processing for the second lot.

Abstract: A plasma processing apparatus, to which process control such as APC is applied, includes: a processing chamber in which plasma processing is performed on a sample; and a plasma processing control device which performs control to optimize a condition for plasma processing which recovers the status inside a processing chamber, in which plasma processing is performed, based on a waiting time from the time when plasma processing for a second lot, which is a lot immediately before a first lot, is completed to the time when plasma processing for the first lot is started, and the content of plasma processing for the second lot.

Abstract: A plasma processing apparatus, to which process control such as APC is applied, includes: a processing chamber in which plasma processing is performed on a sample; and a plasma processing control device which performs control to optimize a condition for plasma processing which recovers the status inside a processing chamber, in which plasma processing is performed, based on a waiting time from the time when plasma processing for a second lot, which is a lot immediately before a first lot, is completed to the time when plasma processing for the first lot is started, and the content of plasma processing for the second lot.

Abstract: A plasma processing apparatus including a processing chamber, a radio frequency power source, a monitoring unit, and a calculation unit is provided. In the processing chamber, etching target film is etched by using plasma. The radio frequency power source supplies radio frequency electric power. The monitoring unit monitors light emission of the plasma. The calculation unit estimates an etching amount of plasma etching of the etching target film based on an emission intensity and a correlation between the etching amount of the etching target film and the emission intensity, the emission intensity being obtained when removing, by using the plasma, a deposition film deposited as a result of the plasma etching.

Abstract: A plasma processing apparatus including a processing chamber, a radio frequency power source, a monitoring unit, and a calculation unit is provided. In the processing chamber, etching target film is etched by using plasma. The radio frequency power source supplies radio frequency electric power. The monitoring unit monitors light emission of the plasma. The calculation unit estimates an etching amount of plasma etching of the etching target film based on an emission intensity and a correlation between the etching amount of the etching target film and the emission intensity, the emission intensity being obtained when removing, by using the plasma, a deposition film deposited as a result of the plasma etching.

Abstract: Method for carrying out plasma processing on a wafer under Run-to-Run control by using a plasma processing apparatus having a plasma processing chamber, a process monitor which monitors a condition in the plasma processing chamber, and an actuator which controls parameters which are constituent elements of a plasma processing condition. The method includes the steps of making one of the parameters a (N?1)th manipulated variable, calculating a first difference between a process monitor value in the plasma processing obtained by the process monitor and a desired value of the process monitor value in the plasma processing, calculating a correction amount of the (N?1)th manipulated variable on the basis of the first difference and a previously obtained correlation between the process monitor value in the plasma processing and the (N?1)th manipulated variable, wherein N is a natural number equal to or larger than 2.

Abstract: A data management apparatus according to an embodiment of the present invention includes a data analyzing unit that processes operation data transferred from a data collecting unit that collects the operation data of a semiconductor manufacturing apparatus, and a state monitoring unit that monitors a state of the data analyzing unit based on monitoring time. The monitoring time is the sum of first time that is time required for transferring the operation data to the data analyzing unit and second time that is time required for processing the operation data in the data analyzing unit.

Abstract: A plasma processing apparatus, to which process control such as APC is applied, includes: a processing chamber in which plasma processing is performed on a sample; and a plasma processing control device which performs control to optimize a condition for plasma processing which recovers the status inside a processing chamber, in which plasma processing is performed, based on a waiting time from the time when plasma processing for a second lot, which is a lot immediately before a first lot, is completed to the time when plasma processing for the first lot is started, and the content of plasma processing for the second lot.

Abstract: Method for carrying out plasma processing on a wafer under Run-to-Run control by using a plasma processing apparatus having a plasma processing chamber, a process monitor which monitors a condition in the plasma processing chamber, and an actuator which controls parameters which are constituent elements of a plasma processing condition. The method includes the steps of making one of the parameters a (N?1)th manipulated variable, calculating a first difference between a process monitor value in the plasma processing obtained by the process monitor and a desired value of the process monitor value in the plasma processing, calculating a correction amount of the (N?1)th manipulated variable on the basis of the first difference and a previously obtained correlation between the process monitor value in the plasma processing and the (N?1)th manipulated variable, wherein N is a natural number equal to or larger than 2.

Abstract: A plasma processing apparatus includes a plasma processing chamber, a process monitor which monitors a condition in the plasma processing chamber, an actuator which controls a parameter constituting a plasma processing condition, N+1 correction amount calculating units which calculate a correction amount of a manipulated variable on the basis of a difference between a process monitor value monitored by the process monitor and a desired value of the process monitor and a correlation between the process monitor value and a manipulated variable, which is the parameter, the correlation having been acquired in advance, and N manipulated variable adding units that add a manipulated variable having a priority level next to an N-th manipulated variable. The N-th manipulated variable adding unit defines a correction amount calculated by the N+1-th correction amount calculating unit as the correction amount of an N+1-th manipulated variable.

Abstract: A plasma processing apparatus includes a plasma processing chamber, a process monitor which monitors a condition in the plasma processing chamber, an actuator which controls a parameter constituting a plasma processing condition, N+1 correction amount calculating units which calculate a correction amount of a manipulated variable on the basis of a difference between a process monitor value monitored by the process monitor and a desired value of the process monitor and a correlation between the process monitor value and a manipulated variable, which is the parameter, the correlation having been acquired in advance, and N manipulated variable adding units that add a manipulated variable having a priority level next to an N-th manipulated variable. The N-th manipulated variable adding unit defines a correction amount calculated by the N+1-th correction amount calculating unit as the correction amount of an N+1-th manipulated variable.

Abstract: To provide a fuel cell vehicle capable of reducing power consumption during a time of stopping of the vehicle. The fuel cell vehicle includes a scavenging execution determination unit 411 which determines whether or not to carry out scavenging; an ISU 40 including a microcomputer 41 installed on the scavenging execution determination unit 411. The fuel cell vehicle further includes an electrical supply circuit 43, in which, at a time of start-up by an alarm clock 46, the ISU 40 is booted, and in a case in which it is determined by the scavenging execution determination unit 411 that scavenging is to be carried out, the circuit 43 supplies electricity to the relay unit 36; and in a case in which it is determined by the scavenging execution determination unit 411 that scavenging is not to be carried out, it does not supply electricity to the relay unit 36.

Abstract: To provide a fuel cell vehicle capable of reducing power consumption during a time of stopping of the vehicle. The fuel cell vehicle includes a scavenging execution determination unit 411 which determines whether or not to carry out scavenging; an ISU 40 including a microcomputer 41 installed on the scavenging execution determination unit 411. The fuel cell vehicle further includes an electrical supply circuit 43, in which, at a time of start-up by an alarm clock 46, the ISU 40 is booted, and in a case in which it is determined by the scavenging execution determination unit 411 that scavenging is to be carried out, the circuit 43 supplies electricity to the relay unit 36; and in a case in which it is determined by the scavenging execution determination unit 411 that scavenging is not to be carried out, it does not supply electricity to the relay unit 36.

Abstract: A communication system in which a reception signal can be accurately obtained from a signal transmitted over two-wire type transmission lines without any significant reduction in the communication speed. The communication system utilizing two-wire type transmission lines for transmitting transmission signals in opposite phases has a plurality of nodes connected to the two-wire type transmission lines, and each of the nodes incorporates terminating resistors acting upon the two-wire type transmission lines. A node which includes a reception circuit for receiving a transmission signal has an AC coupling circuit for extracting AC components in a transmission signal input through the transmission lines, a bias circuit for applying a bias voltage to a signal output from the AC coupling circuit and a clip circuit for clipping the level of a signal output from the bias circuit, which are provided at each of the two-wire type transmission lines.

Abstract: The present invention provides a vehicle control system, which easily carries out modifications such as updating and improvement of the system, improving the transmission efficiency of the data and responsiveness of the system, and allowing the redundancy to be effectively used even during normal operation of the network. In the vehicle control system, an electric control device is formed comprising a cooperative control ECU which acts as a server apparatus and a plurality of subsystems which are connected to this cooperative control ECU and act as client apparatuses. The plurality of subsystems comprise, for example, a motor control ECU, a reactive gas supply control ECU, an electrical power distribution control ECU, and a cell voltage detection control ECU.

Abstract: In a network system which sequentially passes a right to transmit in the form of a token and includes a plurality of data processors, at least one of the plurality of data processors is set so as to be able, during each possession of the token, to send messages in greater number than those transmitted by each of the remaining data processors by at least one. The data processor that is allowed to send many messages consecutively sends messages by inserting, into a token address field included in a message format, its own address during transmission. In the case of a server/client network, a server is set so as to consecutively send a number of messages at a time, while in possession of the token.

Abstract: A receiver circuit that can obtain a reception signal with accuracy in high-speed communications using two-wire transmission lines. The receiver circuit receives information signals in a communication system with two-wire transmission lines for transmitting the information signals in opposite phases to each other. The receiver circuit includes an alternating-current coupling arrangement provided for each of the two-wire transmission lines and for extracting alternating-current components of the information signals inputted through the transmission lines. The receiver circuit also includes a reception signal generating arrangement for obtaining a reception signal corresponding to the information signals in accordance with output signals from each of the alternating-current coupling arrangements. Each of the alternating-current coupling arrangements include two time constant circuits having time constants different from each other and connected in parallel to each other between an input and output thereof.

Abstract: A fault-detecting device used in a communication system and capable of judging correctly that a fault exerting an adverse effect with certainty on the transmission/reception operation has occurred in two-wire transmission lines.

Abstract: The present invention provides a vehicle control system, which easily carries out modifications such as updating and improvement of the system, improving the transmission efficiency of the data and responsiveness of the system, and allowing the redundancy to be effectively used even during normal operation of the network. In the vehicle control system, an electric control device is formed comprising a cooperative control ECU which acts as a server apparatus and a plurality of subsystems which are connected to this cooperative control ECU and act as client apparatuses. The plurality of subsystems comprise, for example, a motor control ECU, a reactive gas supply control ECU, an electrical power distribution control ECU, and a cell voltage detection control ECU.

Abstract: A communication controller comprises a storage for storing data of a message being received, a determining unit for determining types of the message being received, and a transmission controller for generating interrupt requests for transferring data to a data processing unit at a different timing responsive to determination by the determining unit. That is, if the message being received requires immediate processing, the transmission controller immediately transmits an interrupt request signal to a CPU. The CPU then reads from the storage not only the data which require urgent processing but also all the data stored in the storage, and stores the data in its memory. If the message does not require immediate processing, the transmission controller transmits the interrupt request signal to the CPU when the data stored in the storage have reached a predetermined amount or when a predetermined time has elapsed from a time that the data began to be stored in the storage.