Abstract: A radiation detector includes a radiation detection element, a circuit element, and a housing accommodating the radiation detection element and the circuit element, in which a closed space is provided. The housing has an unblocked opening portion, the closed space is disposed inside the housing, the circuit element is disposed in the closed space, and the closed space is decompressed or filled with an inert gas or a dry gas.

Abstract: A vector is provided that includes a nucleotide sequence selected from any one of (a) to (d). The selection of (a) to (d) includes: (a) the nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21, (b) the nucleotide sequence complementary to the nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21, where (a) and (b) hybridize under stringent conditions, (c) the nucleotide sequence having 90% or more sequence identity with the nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21, and (d) the nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21 in which a total of 1 to 50 nucleotides are substituted, deleted, or inserted.

Abstract: A load port including: a tabular portion which constitutes a part of a wall surface of a wafer carrying chamber and has an opening through which the wafer carrying chamber is opened; a mounting table on which a wafer storage container is mounted; a door section which can open and close the opening; a sucking tool which can suck and hold a lid; a latch which can fix and unfix a container main body and lid; and a latch driving mechanism storage section which stores a latch driving mechanism therein, load port being configured to enable setting an air pressure in latch driving mechanism storage section to be equal to the air pressure in a clean room or lower than the air pressure in clean room. Consequently, it is possible to provide the load port and a method for carrying wafers which can prevent dust from adhering to the wafers.

Abstract: A silicon drift detector includes a housing and a silicon drift detection element that is disposed inside the housing. The housing includes an opening that is not closed. The silicon drift detection element includes a top surface facing the opening, and a light shielding film is provided on the top surface.

Abstract: A load port including: a tabular portion which constitutes a part of a wall surface of a wafer carrying chamber and has an opening through which the wafer carrying chamber is opened; a mounting table on which a wafer storage container is mounted; a door section which can open and close the opening; a sucking tool which can suck and hold a lid; a latch which can fix and unfix a container main body and lid; and a latch driving mechanism storage section which stores a latch driving mechanism therein, load port being configured to enable setting an air pressure in latch driving mechanism storage section to be equal to the air pressure in a clean room or lower than the air pressure in clean room. Consequently, it is possible to provide the load port and a method for carrying wafers which can prevent dust from adhering to the wafers.

Abstract: A vector includes a nucleotide sequence according to any one of the following (a) to (d): (a) a nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21; (b) a nucleotide sequence of a nucleic acid that hybridizes with a nucleic acid consisting of a nucleotide sequence complementary to the nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21, under stringent conditions; (c) a nucleotide sequence having 85% or more sequence identity with the nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21; (d) a nucleotide sequence set forth in SEQ ID NO: 12, 15, 18, or 21 in which one or more nucleotides are substituted, deleted, inserted, and/or added.

Abstract: The invention provides a reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-produce at the time of producing a bonded wafer is subjected to reclaiming polishing and is again available as a bond wafer or a base wafer, wherein, in the reclaiming polishing, the delaminate wafer is polished with use of a double-side polisher in a state that oxide film is not formed on a delaminated surface of the delaminated wafer and oxide film is formed on a back side which is the opposite side of the delaminated surface. As a result, the reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-product at the time of manufacturing a bonded wafer based on an ion implantation delamination method is subjected to the reclaiming polishing, which enables sufficiently improving quality.

Abstract: The invention provides a reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-produce at the time of producing a bonded wafer is subjected to reclaiming polishing and is again available as a bond wafer or a base wafer, wherein, in the reclaiming polishing, the delaminate wafer is polished with use of a double-side polisher in a state that oxide film is not formed on a delaminated surface of the delaminated wafer and oxide film is formed on a back side which is the opposite side of the delaminated surface. As a result, the reclaiming processing method for a delaminated wafer, by which the delaminated wafer obtained as a by-product at the time of manufacturing a bonded wafer based on an ion implantation delamination method is subjected to the reclaiming polishing, which enables sufficiently improving quality.

Abstract: In the radiation detector, a capacitor is connected between a connecting wire which is connected with a preamplifier (amplifier) and another connecting wire. Specifically, the capacitor is connected between the connecting wire and another connecting wire which has the lowest electric resistance with respect to a signal wire among connecting wires connected with a radiation detecting element. This prevents electric current produced by static electricity from flowing to the signal wire and prevents the signal wire or the preamplifier from being damaged by static electricity. A circuit element for a countermeasure against static electricity is not provided at the signal wire, and therefore input capacitance of the preamplifier is kept low. Accordingly, the radiation detector is improved by a sufficient countermeasure against static electricity while input capacitance of the preamplifier is kept low.

Abstract: In the radiation detector, a capacitor is connected between a connecting wire which is connected with a preamplifier (amplifier) and another connecting wire. Specifically, the capacitor is connected between the connecting wire and another connecting wire which has the lowest electric resistance with respect to a signal wire among connecting wires connected with a radiation detecting element. This prevents electric current produced by static electricity from flowing to the signal wire and prevents the signal wire or the preamplifier from being damaged by static electricity. A circuit element for a countermeasure against static electricity is not provided at the signal wire, and therefore input capacitance of the preamplifier is kept low. Accordingly, the radiation detector is improved by a sufficient countermeasure against static electricity while input capacitance of the preamplifier is kept low.

Abstract: The present invention provides a process for producing yeast excellent in cell productivity and gene manipulation of which is easy, being added with nutritional requirement by disrupting only a specific gene, and a transformant thereof. Moreover, the present invention also provides a process for producing a gene expression product, particularly a polyhydroxyalkanoic acid. In the present invention, yeast in which a plurality of genes is disrupted is produced using the homologous recombination. Moreover, a transformant is obtained by introducing a plurality of enzyme genes involved with polyhydroxyalkanoic acid synthesis such as a polyhydroxyalkanoic acid synthase gene and an acetoacetyl CoA reductase gene into said gene-disrupted yeast. Furthermore, said transformant is cultured, copolyesters comprising a polyhydroxyalkanoic acid are efficiently accumulated within the cells, and a polymer is harvested from the cultured product.

Abstract: A gene expression cassette comprising an Aeromonas caviae-origin polyhydroxyalkanoic acid (PHA) synthase gene having a mutation introduced thereinto and a promoter and a terminator acting in a yeast; a transformant constructed by transferring the above gene expression cassette into a yeast; and a process for producing a polyester using the above transformant. Thus, it becomes possible to efficiently produce a copolymerized polyester having a high biodegradability and excellent properties by copolymerizing 3-hydroxyalkanoic acids in a yeast.

Abstract: It is intended to provide a process for industrially safely and/or economically and efficiently producing a polyester by using gene manipulation techniques. A vector applicable to hosts over a wide range which is characterized by having improved industrial safety; a polyester synthase-expressing plasmid wherein at least a polyester synthase gene is transferred into said vector; a transformant capable of synthesizing a polyester which contains the plasmid; and a process for producing a polyester with the use of the plasmid or the transformant.

Abstract: By forming a silicon single-crystal thin film direct on a chemically etched substrate, a time required for all the process can be effectively shortened, which largely contributes to reduction in production cost of a silicon epitaxial wafer and improvement on production efficiency thereof, with the result that a reduced wafer price at a user's end and a short delivery time are ensured. In a technical aspect, an etching removal in a chemical etching treatment is set to be 60 &mgr;m or more and thereby, a glossiness of a front main surface of a chemically etched substrate can be ensured to be 95% or higher. With such a glossiness of the front main surface of the substrate employed, a surface glossiness of a silicon single-crystal thin film formed on the front main surface of the chemically etched substrate can be increased to 95% or higher, thereby, enabling an auto-alignment treatment in a lithographic step coming later with no trouble.

Abstract: A vapor-phase growth plant which has a dopant gas supplying apparatus comprising a plurality of dopant gas supplying containers, and a multiple stage gas flow subsystem with a plurality of dopant gas supply conduits therein, of which said dopant gas supply conduits form a tournament-style network with a plurality of confluences on which the dopant gas supply conduits are united and the gas flows therein are merged for subjection to even mixing which results in gradual decreasing of the number of the dopant gas supply conduits as the dopant gas flows proceed in the multiple stage gas flow subsystem. Together with the equipped pressure reducing valves, the dopant gas which is highly evened in its pressure and its concentration can be supplied to the vapor-phase growth apparatus, thereby affording stable production of vapor-phase growth products with extremely lessened quality variance.

Abstract: The present invention relates to an adsorbent being capable of efficiently adsorbing and removing interleukins in a body fluid and to a method for adsorbing and removing, if necessary, and recovering interleukins in a body fluid with the above-mentioned adsorbent. According to the present invention, there are provided an adsorbent of interleukins which comprises a water-insoluble carrier having an anionic functional group, a method for adsorbing, removing and recovering interleukins using the same and an adsorber using the same.

Abstract: An automatic exposure control apparatus for a camera has the shutter release button and the memory shutter release button as switches with slidable contacts, a photodetector for detecting brightness of an object, a capacitor for holding the detected photometric value of the photodetector, and a bias circuit. When the shutter release button is depressed by a first stroke, power is turned on. After framing for a memory lock, the first stroke depression of the shutter release button is released, and the memory lock button is depressed. An exposure memory lock is completed. After framing for photography, the memory lock button is depressed again. Thereafter, the shutter release button is depressed by the first stroke, and a picture is taken. When the shutter release button is released and the memory clock button is released, the exposure memory lock is maintained.

Abstract: A camera includes an exposing device for exposing a photosensitive member with light from an object through an aperture, a detecting device for detecting an object brightness, a controlling device for controlling the exposing device and the aperture so as to obtain a proper exposure of the photosensitive member, a first signal producing device for producing a first signal, a second signal producing device for producing a second signal, a third signal producing device for producing a third signal, and a signal selecting device for selecting one of the first, second and third signals. The controlling device sets an aperture diameter and an exposure time to have a first, second or third relation in accordance with the first, second or third signal when the signal selecting device selects the first, second or third signal, in the order named.

Abstract: A camera in which exposure is controlled by the supply of power from a power source includes a first control device for electrically controlling the time of the exposure, a second control device for mechanically controlling the time of the exposure, a member for selecting one of the first and second control devices, the member being operable to set the time of the exposure, a device for making a binary code in response to the operating member, the binary code including information indicative of one of the first and second control devices selected by the operating member and information indicative of the time of the exposure set by the operating member, and a device for supplying a power from the power source to the first control device when the binary code indicates that the first control device has been selected by the operating member, the first control device being capable of controlling the time of the exposure when the power supply device supplies a power to the first control device.

Abstract: A camera in which light-sensing means is exposed to the light from an object to be photographed passed through stop means includes means for setting the aperture value of the stop means, means for driving the stop means in a direction in which the aperture value of the stop means is coincident with the aperture value by the setting means, prior to the exposure of the light-sensing means, metering means including a light-receiving element adapted to receive the light from the object passed through the stop means and produce an output corresponding to the intensity of the received light, the metering means producing a metering output corresponding to the brightness of the object on the basis of the output of the light-receiving element, means for controlling the exposure time of the light-sensing means in order that the light-sensing means may obtain a proper exposure, on the basis of the metering output after the stop means has been driven by the driving means, and discriminating means for discriminating, prio