Patents by Inventor Yuji TAKANAMI

Yuji TAKANAMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus and substrate processing method
    Patent number: 11694882
    Abstract: A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
    Type: Grant
    Filed: January 21, 2022
    Date of Patent: July 4, 2023
    Assignee: CANON ANELVA CORPORATION
    Inventors: Yuji Takanami, Kento Norota, Naoyuki Okamoto, Yasuo Kato, Yasushi Yasumatsu
  • SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    Publication number: 20220139686
    Abstract: A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
    Type: Application
    Filed: January 21, 2022
    Publication date: May 5, 2022
    Applicant: Canon Anelva Corporation
    Inventors: Yuji TAKANAMI, Kento NOROTA, Naoyuki OKAMOTO, Yasuo KATO, Yasushi YASUMATSU
  • Substrate processing apparatus and substrate processing method
    Patent number: 11270873
    Abstract: A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: March 8, 2022
    Assignee: CANON ANELVA CORPORATION
    Inventors: Yuji Takanami, Kento Norota, Naoyuki Okamoto, Yasuo Kato, Yasushi Yasumatsu
  • SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    Publication number: 20200343080
    Abstract: A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
    Type: Application
    Filed: July 14, 2020
    Publication date: October 29, 2020
    Applicant: Canon Anelva Corporation
    Inventors: Yuji TAKANAMI, Kento NOROTA, Naoyuki OKAMOTO, Yasuo KATO, Yasushi YASUMATSU