Patents by Inventor Yuji Ueki

Yuji Ueki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8476188
    Abstract: A renewable adsorbent enabling to adsorb cesium selectively and efficiently, and to reuse cesium by eluting adsorbed cesium, and its manufacturing method are provided. Polyethylene (PE)/polypropylene (PP) based non-woven fabric may be exposed with electron beam, PE/PP based non-woven fabric to which electron beam was exposed is contacted to the monomer solution containing acrylonitrile (AN), dimethyl sulfoxide (DMSO), Tween80 (polyoxyethylene sorbitan monooleate) as a surfactant, and AMP (ammonium molybdophosphate n-hydrate) as an inorganic ion exchanger, and then the inorganic ion exchanger (AMP) is supported directly by the non-ionic graft chain.
    Type: Grant
    Filed: June 4, 2012
    Date of Patent: July 2, 2013
    Assignee: Japan Atomic Energy Agency
    Inventors: Akio Iwanade, Noriaki Seko, Hiroyuki Hoshina, Yuji Ueki, Seiichi Saiki
  • Publication number: 20120329637
    Abstract: A renewable adsorbent enabling to adsorb cesium selectively and efficiently, and to reuse cesium by eluting adsorbed cesium, and its manufacturing method are provided. Polyethylene (PE)/polypropylene (PP) based non-woven fabric may be exposed with electron beam, PE/PP based non-woven fabric to which electron beam was exposed is contacted to the monomer solution containing acrylonitrile (AN), dimethyl sulfoxide (DMSO), Tween80 (polyoxyethylene sorbitan monooleate) as a surfactant, and AMP (ammonium molybdophosphate n-hydrate) as an inorganic ion exchanger, and then the inorganic ion exchanger (AMP) is supported directly by the non-ionic graft chain.
    Type: Application
    Filed: June 4, 2012
    Publication date: December 27, 2012
    Applicant: JAPAN ATOMIC ENERGY AGENCY
    Inventors: Akio IWANADE, Noriaki SEKO, Hiroyuki HOSHINA, Yuji UEKI, Seiichi SAIKI
  • Publication number: 20110259818
    Abstract: Filter media for liquid purification, which can remove metal compounds or metal ions containing in polishing or washing liquids such as alkali, acid solution or ultra-pure water used for silicon wafers of semiconductors. Removal of metals from various kind of liquid such as inorganic chemicals, organic solvent, or industrial waste water are also the subject of the present invention. The Filter media made of melt-blown nonwoven substrate comprising of aethylene/norbornene copolymer represented by the following formula [1] and/or a polycyclic norbornene polymer represented by the following formulae [2](a),(b),(c) as raw material, wherein said ethylene/norbornene copolymer and said polycyclic norbornene polymer have a glass transition temperature (Tg) selected in a range from 80 to 180° C. and melt volume rate (MVR) (ISO 1133, measuring conditions: 260° C., 2.
    Type: Application
    Filed: April 22, 2011
    Publication date: October 27, 2011
    Applicants: JAPAN ATOMIC ENERGY AGENCY, NOMURA MICRO SCIENCE CO., LTD., KURASHIKI TEXTILE MANUFACTURING CO. LTD.
    Inventors: Masao Tamada, Noriaki Seko, Yuji Ueki, Toshihide Takeda, Masanori Nakano, Shin-ichi Kawano, Mitsugu Abe, Kiyokazu Miyagawa
  • Publication number: 20100170145
    Abstract: A fibrous catalyst for production of biodiesel by transesterification of oil/fat and alcohol, in which a graft chain is introduced into a polymer fiber substrate through graft polymerization, and the graft chain has one or more functional groups selected from amino groups and quaternary ammonium groups, and a hydroxide ion.
    Type: Application
    Filed: December 23, 2009
    Publication date: July 8, 2010
    Inventors: Yuji Ueki, Masao Tamada
  • Publication number: 20080230471
    Abstract: This invention relates to functional nonwoven filter media provided by radiation-induced graft copolymerization and its production method. Meltblown type of nonwoven (Meltblown) comprised of fine fibers, less than 8 micron in diameter, of polyolefin or polyamide is chosen as the suitable grafting trunk polymer. The production methods are composed of following steps, 1) irradiation less than 30 kGy dose to the Meltblown with electron beam or gamma ray; 2) graft copolymerization of emulsified vinyl monomer onto the Meltblown; and 3) chemical conversion of ion exchange group onto the grafted vinyl monomer. These steps are independently conducted in their suitable operation conditions.
    Type: Application
    Filed: March 21, 2008
    Publication date: September 25, 2008
    Applicant: KURASHIKI TEXTILE MANUFACTURING CO. LTD.
    Inventors: Masao TAMADA, Noriaki SEKO, Yuji UEKI, Toshihide TAKEDA
  • Publication number: 20050210215
    Abstract: In a read operation, a memory circuit successively performs precharge, sense operation and data output operation, each in 0.5 cycle of a clock signal. A write detection circuit, in response to switching from a write operation to a read operation, sends a signal to the memory circuit to make it delay the read operation. The memory circuit delays the read operation by one cycle of the clock signal to prevent destruction of write data. Further, the write detection circuit sends to a processor a signal for switching whether to access the data bus or not, and causes the processor to stop access to the data bus while the read operation is being delayed. Thus, a semiconductor device that can increase data read speed while guaranteeing sufficient data read time from the memory circuit to the data bus is provided.
    Type: Application
    Filed: March 17, 2005
    Publication date: September 22, 2005
    Applicant: Renesas Technology Corp.
    Inventors: Toshihiro Sezaki, Yuji Ueki, Yoshikazu Masao
  • Patent number: 5416482
    Abstract: A resistance ladder of a small size and a decoding method thereof, wherein in-series circuits of MOS transistors using a contact hole in common are connected in parallel between the adjacent two connection nodes of a resistance element, and an output line is wired to cross the resistance element, thereby reducing the layout pattern area of the resistance ladder.
    Type: Grant
    Filed: March 15, 1993
    Date of Patent: May 16, 1995
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Yuji Ueki