Patents by Inventor Yuji Uesugi

Yuji Uesugi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10622563
    Abstract: The present technology relates to a semiconductor device, a solid-state imaging device, an electronic apparatus, and a manufacturing method of the semiconductor device which can suppress generation of residual carriers within an organic film. The semiconductor device includes: a first electrode; a second electrode; and an organic film that is disposed between the first electrode and the second electrode. At least one of the first electrode and the second electrode is discontinuous. The organic film includes an inter-electrode region, which is a region interposed between the first electrode and the second electrode, and a non-inter-electrode region, which is a region not interposed between the first electrode and the second electrode, and the non-inter-electrode region is disposed between the adjacent inter-electrode regions. A suppression region, which is a region in which at least one of generation and movement of a carrier is suppressed, is present within the non-inter-electrode region.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: April 14, 2020
    Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Toshihiko Hayashi, Takayoshi Honda, Yuji Uesugi, Katsunori Hiramatsu
  • Publication number: 20200029038
    Abstract: The present technology relates to a solid-state imaging device and an electronic apparatus which make it possible to improve the pixel property. Provided is a solid-state imaging device, including a first electrode formed on a semiconductor layer, a photoelectric conversion layer formed on the first electrode, a second electrode formed on the photoelectric conversion layer, and a third electrode disposed between the first electrode and an adjacent first electrode, and electrically insulated. A voltage of the third electrode is controlled to a voltage corresponding to a detection result which can contribute to control of discharge of charges or assist for transfer of charges. The present technology can be applied to, for example, a CMOS image sensor.
    Type: Application
    Filed: March 28, 2018
    Publication date: January 23, 2020
    Inventors: YUJI UESUGI, FUMIHIKO KOGA, KEISUKE HATANO
  • Publication number: 20200021763
    Abstract: Imaging devices and electronic apparatuses incorporating imaging devices are provided. An imaging device as disclosed can include a first pixel of a first pixel and a second pixel of a second pixel. The first and second pixels each have a first electrode, a portion of a photoelectric conversion film, and a portion of a second electrode, where the photoelectric conversion film is between the first electrode and the second electrode. The first electrode of the first pixel has a first area, while the first electrode of the second pixel has a second area that is smaller than the first area. The first pixel can include a light shielding film. Alternatively or in addition, the first pixel can be divided into first and second portions.
    Type: Application
    Filed: September 27, 2019
    Publication date: January 16, 2020
    Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Keisuke HATANO, Ryosuke NAKAMURA, Yuji UESUGI, Fumihiko KOGA, Tetsuji YAMAGUCHI
  • Patent number: 10469780
    Abstract: Imaging devices and electronic apparatuses incorporating imaging devices are provided. An imaging device as disclosed can include a first pixel (2PA, 2PB) and a second pixel (2X). The first and second pixels each have a first electrode (51A, 51B, 51C), a portion of a photoelectric conversion film (81), and a portion of a second electrode (82), where the photoelectric conversion film is between the first electrode and the second electrode. The first electrode (51A, 51B) of the first pixel has a first area, while the first electrode (51C) of the second pixel has a second area that is smaller than the first area. The first pixel can include a light shielding film (52A, 52B). Alternatively or in addition, the first pixel can be divided into first and second portions.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: November 5, 2019
    Assignee: Sony Semiconductor Solutions Corporation
    Inventors: Keisuke Hatano, Ryosuke Nakamura, Yuji Uesugi, Fumihiko Koga, Tetsuji Yamaguchi
  • Publication number: 20180309947
    Abstract: Imaging devices and electronic apparatuses incorporating imaging devices are provided. An imaging device as dis closed can include a first pixel (2PA, 2PB) and a second pixel (2X). The first and second pixels each have a first electrode (51A, 51B, 51C), a portion of a photoelectric conversion film (81), and a portion of a second electrode (82), where the photoelectric conversion film is between the first electrode and the second electrode. The first electrode (51A, 51B) of the first pixel has a first area, while the first electrode (51C) of the second pixel has a second area that is smaller than the first area. The first pixel can include a light shielding film (52A, 52B). Alternatively or in addition, the first pixel can be divided into first and second portions.
    Type: Application
    Filed: October 25, 2016
    Publication date: October 25, 2018
    Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Keisuke HATANO, Ryosuke NAKAMURA, Yuji UESUGI, Fumihiko KOGA, Tetsuji YAMAGUCHI
  • Publication number: 20180114909
    Abstract: The present technology relates to a semiconductor device, a solid-state imaging device, an electronic apparatus, and a manufacturing method of the semiconductor device which can suppress generation of residual carriers within an organic film. The semiconductor device includes: a first electrode; a second electrode; and an organic film that is disposed between the first electrode and the second electrode. At least one of the first electrode and the second electrode is discontinuous. The organic film includes an inter-electrode region, which is a region interposed between the first electrode and the second electrode, and a non-inter-electrode region, which is a region not interposed between the first electrode and the second electrode, and the non-inter-electrode region is disposed between the adjacent inter-electrode regions. A suppression region, which is a region in which at least one of generation and movement of a carrier is suppressed, is present within the non-inter-electrode region.
    Type: Application
    Filed: May 6, 2016
    Publication date: April 26, 2018
    Inventors: TOSHIHIKO HAYASHI, TAKAYOSHI HONDA, YUJI UESUGI, KATSUNORI HIRAMATSU
  • Patent number: 6890237
    Abstract: A method of manufacturing a shadow mask assembly, in which a shadow mask is fastened to a support frame in a tensioned state, includes applying a preliminary tension force with a magnitude of 9.8 to 490 N to the four corners of the shadow mask outwardly aslant with respect to sides of the shadow mask. A main tension force is then applied to each of at least a pair of mutually opposite sides of the shadow mask outwardly perpendicularly to the sides. Thereafter, the shadow mask to which the main tension forces have been applied is fastened to the frame side of the support frame.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: May 10, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Naomi Nishiki, Tosinobu Yokoyama, Yuji Uesugi, Kiyotaka Ihara, Ayumu Takakuwa, Kiyohito Miwa, Yoshikazu Iwai
  • Publication number: 20010018309
    Abstract: A shadow mask can be attached to a support frame in an accurate planer state without unevenness. Provided is a method for manufacturing a shadow mask assembly in which a shadow mask is fastened to a support frame in a tensioned state, the method including applying a preliminary tension force of an strength of 9.8 to 490 N to the four corners of the shadow mask outwardly aslant with respect to sides of the shadow mask, applying a main tension force to each of at least a pair of mutually opposite sides of the shadow mask outwardly perpendicularly to the sides, and thereafter fastening the shadow mask to which the main tension forces has been applied when the main tension forces are applied to the frame side of the support frame.
    Type: Application
    Filed: December 22, 2000
    Publication date: August 30, 2001
    Inventors: Naomi Nishiki, Tosinobu Yokoyama, Yuji Uesugi, Kiyotaka Ihara, Ayumu Takakuwa, Kiyohito Miwa, Yoshikazu Iwai
  • Patent number: 5690846
    Abstract: A laser processing method is to be executed by a pair of turning mirrors of which axes of rotation are arranged in mutually twisted positions, a flat field lens for converging a laser beam reflected on the pair of turning mirrors on a specified plane, and an X-Y stage which carries and moves thereon an object to be processed to which the laser beam is applied, the object having a plurality of rectangular planar areas of the same shape as each other in a matrix form and adjoining the rectangular planar areas while not overlapping the rectangular planer area nor leaving any space therebetween.
    Type: Grant
    Filed: December 21, 1995
    Date of Patent: November 25, 1997
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Toshiharu Okada, Izuru Nakai, Yuji Uesugi
  • Patent number: 5670069
    Abstract: A laser processing method is carried out by a laser apparatus comprising: an oscillator; a spatial filter comprising a first convex lens, a member having a pinhole portion, and a second convex lens on an optical axis of the laser beam from an oscillator; two galvano-mirrors; and an f.theta. lens. The method includes: emitting a laser beam from the oscillator, focusing the laser beam by the first convex lens, removing non-focusing components in a peripheral portion of a focusing spot performed by the first convex lens by passing the laser beam which has passed through the first convex lens through the pinhole portion, a focal distance of the first convex lens being set so that a focusing diameter of the laser beam at the pinhole portion of the member is equal to or smaller than a focusing diameter of the laser beam which has passed through the f.theta.
    Type: Grant
    Filed: December 21, 1995
    Date of Patent: September 23, 1997
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Izuru Nakai, Toshiharu Okada, Yuji Uesugi
  • Patent number: 5670068
    Abstract: A laser processing apparatus includes a laser beam source, a focusing optical system for focusing a laser beam from the source as a processing laser beam to a surface of an article, an illuminating optical system using a laser beam of the same frequency as that of the processing laser beam as an illumination laser beam for illuminating the surface of the article, and a photographing device for detecting the illumination laser beam reflected from the article through the focusing optical system to thereby monitor a position to be processed. Since the laser beam of the illuminating optical system is of the same frequency as that of the processing beam chromatic aberration is prevented. This allows increased monitoring accuracy so that an article such as copper foil can be processed by a laser beam with an accuracy of 10 microns to monitor and correct a processing position.
    Type: Grant
    Filed: April 26, 1995
    Date of Patent: September 23, 1997
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Katsuhiro Kuriyama, Toshiharu Okada, Yuji Uesugi, Shoro Mochida, Kazuyoshi Yamaguchi
  • Patent number: 5477384
    Abstract: A laser optical device includes a laser oscillator, a beam shaping optical device for shaping a laser beam emitted from the oscillator to form a shaped laser beam, and a plurality of incidence lenses arranged to make the portions of the shaped laser beam incident on the incidence lenses equal. The device further includes beam transmitting optical fibers for receiving laser beams into which the laser beam passed through the incidence lenses is divided.
    Type: Grant
    Filed: July 7, 1994
    Date of Patent: December 19, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yukio Nishikawa, Yuji Uesugi
  • Patent number: 5461505
    Abstract: A polygon mirror includes a polygon base having a plurality of attaching surfaces, a plurality of base plates each of which is fixed to each of the attaching surfaces of the base and has a reflecting surface for reflecting a laser beam, a plurality of total reflection mirrors each of which is fixed onto each of the base plates, and a reflecting direction adjusting mechanism. The reflecting direction adjusting mechanism connects the base to the base plate for the adjustment of a direction along which the laser beam is reflected by the reflecting surface of the total reflection mirror with respect to the attaching surface of the base.
    Type: Grant
    Filed: December 7, 1993
    Date of Patent: October 24, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yukio Nishikawa, Yuji Uesugi
  • Patent number: 5365374
    Abstract: A laser optical device includes a laser oscillator, a beam shaping optical device for shaping a laser beam emitted from the oscillator to form a shaped laser beam, and a plurality of incidence lenses arranged to make the portions of the shaped laser beam incident on the incidence lenses equal. The device further includes beam transmitting optical fibers for receiving laser beams into which the laser beam passed through the incidence lenses is divided.
    Type: Grant
    Filed: September 4, 1992
    Date of Patent: November 15, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yukio Nishikawa, Yuji Uesugi
  • Patent number: 5312064
    Abstract: A method of winding a long sheet continuously around the plate bobbin comprises the steps of repeatedly moving in one direction on an approximately circular locus a rotary shaft for winding, rotating the plate bobbin, repeating on a certain moving locus, repeatedly moving in the same direction or reciprocatingly the rotary shaft of the nip roll so that a nip roll disposed in an approximately parallel to the rotary shaft of the plate bobbin continuously move in one direction along the surface of the plate bobbin rotating from above the above described long sheet, depressing the long sheet against the above described plate bobbin so as to continuously wind it, thereby to wind a long sheet around a plate bobbin with better accuracy, higher speed without the air swallowing operation.
    Type: Grant
    Filed: April 22, 1992
    Date of Patent: May 17, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuji Uesugi, Koji Kunami, Noriyuki Inagaki, Junichi Hikino, Shinichi Suzawa
  • Patent number: 5200010
    Abstract: A method is disclosed for manufacturing a lens array optical system including a flat glass plate and lenses each of which has a flat surface and a curved surface. The method includes the steps of removably fixing each lens with a first adhesive agent to a lens holder having lens holding portions corresponding to the curved surfaces of the lenses, polishing the flat surface of the lenses and the lens holder so that the polished flat surface of the lenses are flush with a polished flat surface of the lens holder, fixing the lenses to said flat glass plate with a second adhesive agent by pressing the lenses against the flat glass plate and hardening the second adhesive agent, and removing the lens holder from the lenses.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: April 6, 1993
    Assignee: Matsushita Electric Industrial co., Ltd.
    Inventors: Koji Funami, Yuji Uesugi, Yukio Nishikawa
  • Patent number: 5153707
    Abstract: A film material for manufacturing film carriers and its manufacturing method wherein the film material common in all may be applied with respect to the various semiconductor chips which are different in the electrode layout, because the inner lead portions for bump connection use which are required to be changed each time the electrode layout of the semiconductor chip changes are not pattern formed, and are kept as the inner lead forming portion with the whole remaining covered with the conductive metallic layer, and, the manufacturing apparatus for etching mask and model and so on have only to be one in type.
    Type: Grant
    Filed: November 6, 1990
    Date of Patent: October 6, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yutaka Makino, Kazumi Ishimoto, Yasuo Izumi, Yuji Uesugi
  • Patent number: 5138131
    Abstract: A laser cutting method for a glass material, includes steps of forming a continuous scribing line at least on one side face of the glass material, and projecting a laser beam onto the scribing line. A laser cutting apparatus for effecting the laser cutting method, includes a laser oscillating source for emitting the laser beam, a light condensing device for condensing the laser beam onto a surface of the glass material, a scribing device for forming the scribing line on the surface of the glass material, and a displacing device for displacing the laser beam on the scribing line following movement of the scribing point.
    Type: Grant
    Filed: March 5, 1991
    Date of Patent: August 11, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yukio Nishikawa, Yuji Uesugi, Katsuhiro Kuriyama, Tadao Shioyama
  • Patent number: 5055653
    Abstract: A laser beam machining device having aspherical lenses for uniformity of the cross section intensity of a laser beam emitted from a laser oscillator, and converging optical unit composed of a plurality of converging lenses disposed to be aligned in single or plural rows on a plane in the optical path of the uniform laser beam, whereby uniform machining can be performed in the middle and at the edges of the machining area and the allowable machining area can be made wider.
    Type: Grant
    Filed: April 30, 1990
    Date of Patent: October 8, 1991
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Koji Funami, Yuji Uesugi, Yukio Nishikawa
  • Patent number: 5035202
    Abstract: Piezo-electric oscillators are widely used in reference clocks for various apparatus. Prior to use, the oscillation frequency of the piezo-electric oscillators is generally finely adjusted. For this purpose, a frequency fine-adjusting apparatus includes a laser beam generator for emitting a laser beam having a wavelength of 2 .mu.m or less, a target material having a metallic layer, a set of rollers for feeding the target material in the condition in which the metallic layer confronts the main electrode of the piezo-electric oscillator and is spaced a predetermined length from the main electrode, and an optical system for applying the laser beam to the metallic layer. When the laser beam is applied to the metallic layer, part of the metallic layer is vaporized and adheres to the surface of the main electrode, thereby finely adjusting an oscillation frequency of the piezo-electric oscillator.
    Type: Grant
    Filed: April 11, 1990
    Date of Patent: July 30, 1991
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yukio Nishikawa, Yuji Uesugi