Patents by Inventor Yuji Yoshikawa

Yuji Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120259015
    Abstract: A medicament for prophylactic and/or therapeutic treatment of hepatic steatosis or non-alcoholic steatohepatitis, which comprises a polyprenyl compound (e.g., 3,7,11,15-tetramethyl-2,4,6,10,14-hexadecapentaenoic acid) as an active ingredient.
    Type: Application
    Filed: June 15, 2012
    Publication date: October 11, 2012
    Applicant: KOWA COMPANY, LTD.
    Inventors: Yuji YOSHIKAWA, Megumi YAMAMOTO, Naoto ISHIBASHI, Mami SEKI
  • Patent number: 8221878
    Abstract: A photocurable coating composition is provided comprising (1) porous or hollow inorganic oxide fine particles, (2) a hydrolytic condensate of a bissilane compound or a cohydrolytic condensate of a bissilane compound and another hydrolyzable organosilicon compound, and (3) a photoacid generator. Due to the presence of voids in the resin, the cured coating has a low refractive index.
    Type: Grant
    Filed: February 5, 2010
    Date of Patent: July 17, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Kazuharu Sato
  • Publication number: 20120059080
    Abstract: A coating composition is provided comprising (A) a co-hydrolytic condensate of a UV-absorbing alkoxysilane, a UV-curable alkoxysilane, and a tetraalkoxysilane, (B) a polyfunctional poly(meth)acrylate, and (C) a photobleachable photopolymerization initiator. Upon exposure to UV, the composition cures briefly at low temperature to form a cured film having durability, adhesion and transparency.
    Type: Application
    Filed: August 23, 2011
    Publication date: March 8, 2012
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Motoo Fukushima, Yuji Yoshikawa, Kazuharu Sato
  • Publication number: 20110223414
    Abstract: A polycarbonate resin laminate which has excellent scratch resistance and UV shielding property as well as high weatherability and durability sufficient for enduring long term open air exposure without detracting from excellent the transparency is provided. This polycarbonate resin laminate comprises a substrate (1) comprising a polycarbonate resin layer (1-i) and a thermoplastic (meth)acrylic resin layer having a UV absorbing group immobilized thereto (1-ii) on at least one surface of the polycarbonate resin (1-i); and a cured film (2) of a scratch resistant coating composition containing UV absorbing inorganic oxide fine particles and/or an organic UV absorber on the layer of the thermoplastic (meth)acrylic resin having a UV absorbing group immobilized thereto (1-ii). The laminate has a haze of up to 2%.
    Type: Application
    Filed: March 7, 2011
    Publication date: September 15, 2011
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koichi HIGUCHI, Yuji YOSHIKAWA
  • Patent number: 7928179
    Abstract: A photoreactive group-containing siloxane compound is obtained by subjecting a system comprising (a) a photoreactive group-containing alkoxysilane and (b) a hydrolyzable group end-capped dimethylsiloxane to hydrolytic condensation in the presence of a basic catalyst and with an amount of water greater than the amount necessary for hydrolytic condensation of all alkoxy groups. It forms on a substrate a coating having mar resistance, crack resistance, anti-staining effect, and marker ink wipe-off ability.
    Type: Grant
    Filed: April 17, 2007
    Date of Patent: April 19, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Publication number: 20100210862
    Abstract: An organosilicon compound is provided comprising an organic functional radical having a photopolymerizable double bond linked to a hydrolyzable radical-bonded silicon atom via a divalent organic radical containing a urea bond. Due to the inclusion of amide, urethane or urea bond structure and a photopolymerizable functional radical, the organosilicon compound has excellent compatibility with resins. The method is capable of preparing the organosilicon compound having a minimal chlorine content.
    Type: Application
    Filed: February 16, 2010
    Publication date: August 19, 2010
    Inventors: Kazuhiro Tsuchida, Yuji Yoshikawa
  • Publication number: 20100203320
    Abstract: A photocurable coating composition is provided comprising (1) porous or hollow inorganic oxide fine particles, (2) a hydrolytic condensate of a bissilane compound or a cohydrolytic condensate of a bissilane compound and another hydrolyzable organosilicon compound, and (3) a photoacid generator. Due to the presence of voids in the resin, the cured coating has a low refractive index.
    Type: Application
    Filed: February 5, 2010
    Publication date: August 12, 2010
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Kazuharu Sato
  • Publication number: 20100120914
    Abstract: A medicament for prophylactic and/or therapeutic treatment of hepatic steatosis or non-alcoholic steatohepatitis, which comprises a polyprenyl compound (e.g., 3,7,11,15-tetramethyl-2,4,6,10,14-hexadecapentaenoic acid) as an active ingredient.
    Type: Application
    Filed: March 27, 2008
    Publication date: May 13, 2010
    Applicant: KOWA COMPANY, LTD.
    Inventors: Yuji Yoshikawa, Megumi Yamamoto, Naoto Ishibashi, Mami Seki
  • Patent number: 7709549
    Abstract: A thermosetting resin composition which forms a cured coating is provided. This resin composition is capable of providing the supporting substrate with scratch resistance, crack resistance, smudge proof property, removability of oil-base felted markers by wiping, and antistatic property. Also provided is an article having a coating formed from such composition.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: May 4, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Patent number: 7642299
    Abstract: A multi-functional (meth)acrylate compound containing at least three F atoms and at least three Si atoms per molecule is provided. A photocurable resin composition comprising the compound can endow support substrates with antifouling properties with respect to organic stains such as oil mist and fingerprints, without detracting from surface mar resistance.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: January 5, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Koichi Higuchi, Masaaki Yamaya
  • Publication number: 20080124822
    Abstract: A method of encapsulating a photo-semiconductor device using a thermosetting resin composition comprising (A) a silicone compound containing at least two epoxy groups per molecule and having a molecular weight of 500-2, 100, (B) an acid anhydride, and (C) an optional catalyst, which cures into a low-stressed product having improved adhesion, heat resistance and moisture resistance and being free of cure shrinkage.
    Type: Application
    Filed: January 22, 2008
    Publication date: May 29, 2008
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuji Yoshikawa
  • Publication number: 20080014450
    Abstract: A thermosetting resin composition which forms a cured coating is provided. This resin composition is capable of providing the supporting substrate with scratch resistance, crack resistance, smudge proof property, removability of oil-base felted markers by wiping, and antistatic property. Also provided is an article having a coating formed from such composition.
    Type: Application
    Filed: July 12, 2007
    Publication date: January 17, 2008
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Publication number: 20070244250
    Abstract: A photoreactive group-containing siloxane compound is obtained by subjecting a system comprising (a) a photoreactive group-containing alkoxysilane and (b) a hydrolyzable group end-capped dimethylsiloxane to hydrolytic condensation in the presence of a basic catalyst and with an amount of water greater than the amount necessary for hydrolytic condensation of all alkoxy groups. It forms on a substrate a coating having mar resistance, crack resistance, anti-staining effect, and marker ink wipe-off ability.
    Type: Application
    Filed: April 17, 2007
    Publication date: October 18, 2007
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Patent number: 7229686
    Abstract: A high refractive index layer of a cured first coating composition comprising (A) metal oxide fine particles selected from among titanium oxide, aluminum oxide, zirconium oxide, cerium oxide, iron oxide, tin oxide, and compound oxides thereof and (B) a compound having an acrylic, methacrylic, vinyl or styryl group, and a low refractive index layer of a cured second coating composition comprising (D) voided silica-base inorganic oxide fine particles and (C) a compound having at least two epoxy and/or oxetane groups are successively stacked on a substrate to form an antireflection film.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: June 12, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Publication number: 20070116971
    Abstract: A multi-functional (meth)acrylate compound containing at least three F atoms and at least three Si atoms per molecule is provided. A photocurable resin composition comprising the compound can endow support substrates with antifouling properties with respect to organic stains such as oil mist and fingerprints, without detracting from surface mar resistance.
    Type: Application
    Filed: November 22, 2006
    Publication date: May 24, 2007
    Inventors: Yuji Yoshikawa, Koichi Higuchi, Masaaki Yamaya
  • Publication number: 20060079592
    Abstract: A photo-curable coating composition comprising (A) 100 parts by weight of a silicone compound having at least three epoxycyclohexyl-bearing organic groups each directly attached to a silicon atom, but free of alkoxy groups, and having a molecular weight of 500-2,100 and an epoxycyclohexyl-bearing organic group equivalent of 180-230, (B) 0.1-5 parts by weight of a photoacid generator, and optionally, (C) 30-400 parts by weight of inorganic oxide particles having an average particle size of 1-500 nm or (D) 1-400 parts by weight of a curable resin which is shrinkable upon curing forms a hard protective coat.
    Type: Application
    Filed: November 30, 2005
    Publication date: April 13, 2006
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Publication number: 20050123776
    Abstract: A thermosetting resin composition comprising (A) a silicone compound containing at least two epoxy groups per molecule and having a molecular weight of 500-2,100, (B) an acid anhydride, and (C) an optional catalyst cures into a low stressed product having improved adhesion, heat resistance and moisture resistance and free of cure shrinkage.
    Type: Application
    Filed: December 8, 2004
    Publication date: June 9, 2005
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yuji Yoshikawa
  • Publication number: 20040131831
    Abstract: A method for making a raw dielectric ceramic powder having a composition represented by the general formula ABO3 includes the steps of allowing a carbonate powder of the element A to adsorb an organic polymer compound to produce an organic carbonate powder containing the adsorbed organic polymer compound, mixing the organic carbonate powder and an oxide powder of the element B to prepare a mixed powder, and calcining the mixed powder. Also disclosed are a dielectric ceramic produced by molding and firing the raw dielectric ceramic powder produced by the method and a monolithic ceramic capacitor fabricated using the dielectric ceramic.
    Type: Application
    Filed: October 24, 2003
    Publication date: July 8, 2004
    Inventors: Yuji Yoshikawa, Kotaro Hata, Yasunari Nakamura
  • Publication number: 20040058177
    Abstract: A high refractive index layer of a cured first coating composition comprising (A) metal oxide fine particles selected from among titanium oxide, aluminum oxide, zirconium oxide, cerium oxide, iron oxide, tin oxide, and compound oxides thereof and (B) a compound having an acrylic, methacrylic, vinyl or styryl group, and a low refractive index layer of a cured second coating composition comprising (D) voided silica-base inorganic oxide fine particles and (C) a compound having at least two epoxy and/or oxetane groups are successively stacked on a substrate to form an antireflection film.
    Type: Application
    Filed: September 24, 2003
    Publication date: March 25, 2004
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Masaaki Yamaya
  • Publication number: 20030187088
    Abstract: A photo-curable coating composition comprising (A) 100 parts by weight of a silicone compound having at least three epoxycyclohexyl-bearing organic groups each directly attached to a silicon atom, but free of alkoxy groups, and having a molecular weight of 500-2,100 and an epoxycyclohexyl-bearing organic group equivalent of 180-230, (B) 0.1-5 parts by weight of a photoacid generator, and optionally, (C) 30-400 parts by weight of inorganic oxide particles having an average particle size of 1-500 nm or (D) 1-400 parts by weight of a curable resin which is shrinkable upon curing forms a hard protective coat.
    Type: Application
    Filed: March 31, 2003
    Publication date: October 2, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Masaaki Yamaya